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Veresprobe 2

Manufactured by Physical Electronics
Sourced in Japan

The Veresprobe II is a lab equipment product designed for surface analysis. It is a tool used to measure and characterize the physical and chemical properties of surfaces. The Veresprobe II provides high-resolution data on the composition and structure of materials at the nanoscale level.

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4 protocols using veresprobe 2

1

Comprehensive Characterization of Nanomaterials

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X-ray diffraction (XRD, Ultima IV, Rigaku, Tokyo, Japan) using Cu Kα radiation from 20° to 80° in the 2θ range at room temperature, transmission electron microscopy (TEM, JEM-F200, JEOL Ltd., Tokyo, Japan), X-ray photoelectron spectroscopy (XPS, Veresprobe II, ULVAC-PHI, Chigasaki, Japan) within a range of 0–1200 eV, UV-Vis diffuse reflectance spectrophotometry (UV-Vis DRS, SolidSpec-3700, Shimadzu, Kyoto, Japan) within a range of 200–800 nm, scanning electron microscopy (SEM, model S-4800, Hitachi, Tokyo, Japan) with an energy dispersive spectrometer (EDS, model S-4800, Hitachi, Tokyo, Japan), photoluminescence spectroscopy (PL, LabRAM HR-800, Horiba Ltd., Kyoto, Japan) within a range of 400–800 nm, and Fourier-transform infrared spectroscopy (FT-IR, Spectrum Two, Perkin Elmer, Waltham, MA, USA) within a range of 500–4000 cm−1 were employed to characterize the obtained products and membranes. The average crystallite size was calculated from the full width at half maximum of the diffraction peaks by using the Debye–Scherrer equation [27 (link)]. The Brunauer–Emmet–Teller (BET) method was used to quantify the specific surface area using N2 adsorption–desorption measurements at 77 K (ASAP2020, Micromeritics, Atlanta, GA, USA). Further details are reported in our previous study [26 (link)].
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2

Structural and Chemical Characterization of Hybrid Nanostructures

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The morphological characterization and elemental analysis of the as-synthesized hybrid nanostructures fabricated on SiO2/Si substrates was performed using a field emission scanning electron microscope (FE-SEM, Hitachi S-7400, Tokyo, Japan), coupled with the energy-dispersive x-ray spectroscopy (EDS) analysis. Moreover, the crystalline information was examined by X-ray diffraction (XRD, Rigaku Ultima IV diffractometer, Tokyo, Japan) with Cu-Kα radiation, whereas the chemical states were evaluated using X-ray photoelectron spectroscopy (XPS, Veresprobe II, Ulvac-phi, Chigasaki, Japan).
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3

Comprehensive Characterization of Photocatalysts

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X-ray diffraction (XRD, Ultima IV, Rigaku, Tokyo, Japan), an accelerated surface area and porosimetry analyzer (ASAP 2010 Instrument, Micromeritics Instrument Corporation, Atlanta, GA, USA), a transmission electron microscope (TEM, JEM-F200, JEOL Ltd., Tokyo, Japan), X-ray photoelectron spectroscopy (XPS, Veresprobe II, ULVAC-PHI, Chigasaki, Japan), scanning electron microscopy (SEM, model S-4800, Hitachi, Tokyo, Japan) with an energy dispersive spectrometer (EDS, model S-4800, Hitachi, Tokyo, Japan), a UV-Vis diffuse reflectance spectrophotometer (UV-Vis DRS, SolidSpec-3700, Shimadzu, Kyoto, Japan), and photoluminescence spectroscopy (PL, LabRAM HR-800, Horiba. Ltd., Kyoto, Japan) were employed to characterize not only the undoped TiO2 and N-TiO2 photocatalyst powders but also the Al2O3-based hollow fiber membranes functionalized by undoped TiO2 and N-TiO2 photocatalysts.
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4

Characterization of CNF–HZ Nanocomposites

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The synthesized HZ and the nanocomposites of CNF–HZ were characterized using different microscopic and spectroscopic techniques. XRD patterns were acquired on a diffractometer (Bruker D8 Advance, Billerica, Germany) with a Cu target (40 kV, 40 mA) from 10° to 80° at a scan rate of 3° min−1 with a step size of 0.02°. The surface morphologies of the samples were observed using SEM (JEM-3010, JEOL Ltd., Tokyo, Japan) 15 kV in a high vacuum. N2 adsorption–desorption measurement was carried out using a Micromeritics ASAP 2460 (Norcross, GA, USA) analyzer at −196 °C. X-ray photoelectron spectroscopy (XPS) analysis was conducted on a Veresprobe II (ULVAC-PHI, Kanagawa, Japan) equipped with a monochromatic Al-Kα X-ray source.
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