SEM images were taken using a SIGMA system (Zeiss, Oberkochen, Germany). To obtain transmission electron microscopy (TEM) images, a JEM-3000F system (JEOL, Tokyo, Japan) was used. A J-815 spectropolarimeter (JASCO, Tokyo, Japan) was used for extinction and CD measurements. Kuhn’s dissymmetry factor (g-factor), which shows the degree of chirality, was calculated from the extinction and CD values by the following equation.
Sigma system
Manufactured by Zeiss
Sourced in Germany
The Sigma system is a high-performance laboratory equipment designed for precision analysis and measurement. It features advanced optics and sensors to capture detailed data with exceptional accuracy. The core function of the Sigma system is to provide reliable and consistent results for a wide range of scientific applications.
Automatically generated - may contain errors
Lab products found in correlation
4 protocols using sigma system
1
Chirality Analysis of Nanomaterials
2
Synthesis and Characterization of Magnetic Nanoparticles
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All chemicals were purchased from Merck Chemical Company. Melting points were determined using ElectroThermal 9100 apparatus. The progress of the reaction was followed by thin-layer chromatography (TLC) on UV active aluminum backed plates of silica gel (TLC Silica gel 60 F254). 1H and 13C NMR spectra were recorded on a Bruker Advance spectrometer at 300 and 75 MHz, respectively in DMSO-d6 with TMS as an internal standard. IR spectra were reported using a Bruker Alpha using KBr pellets in the range of 400–4000 cm−1. X-ray diffraction (XRD) was carried out on an X Pert Pro Cu-Kα radiation (λ = 0.15406 nm) in the range of Bragg angle 10–80°. The field emission-scanning electron microscopy (FE-SEM) and energy-dispersive X-ray spectroscopy (EDS) analyses were performed on a Sigma system, Zeiss Company, Germany. Thermal stability of Fe3O4@SiO2@Mn-complex (Fe3O4@SiO2@Mn-complex) MNPs was studied by thermogravimetric analysis (TGA) on a TGA2 system, Mettler Toledo Company under an N2 atmosphere at a heating rate of 10 °C min−1. The magnetic properties of MNPs were studied using a vibration sample magnetometer (VSM) with the model of an LBKFB instrument (Meghnatis Daghigh Kavir).
3
Imaging Sex Comb Melanization in Drosophila
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Sex comb images highlighting different melanization states (Figure 3I,J,O ; Figure 4B ) were taken using a Zeiss Axio Cam ERc 5 s mounted on a Zeiss Axio Observer A1 Inverted Microscope. Front legs were cut and placed sex comb side down on a microscope slide (Fisher brand 12-550-123) and imaged through a 40x objective. Images were processed using AxioVision LE software. Abdomens and genitalia images highlighting different melanization states of the aedeagus and female genital bristles were captured using a Canon EOS Rebel T6 camera mounted with a Canon MP-E 65 mm macro lens. Genitalia images were processed in Adobe Photoshop (version 19.1.5) (Adobe Systems Inc, San Jose, CA).
Focus Ion Beam Scanning Electron Microscope (FIB-SEM) images (Figure 4D ) were taken by placing individual, dissected legs on carbon tape adhered to a scanning electron microscope pin stud mount with sex combs facing up. The samples were then coated with a 20 nm Au layer using a Gatan 682 Precision Etching and Coating System, and imaged by scanning electron microscopy in a Zeiss Sigma system. The samples were imaged using a 3-nA electron beam with 1.5 kV landing energy at 2.5MHz.
Focus Ion Beam Scanning Electron Microscope (FIB-SEM) images (
4
Fabrication of Nanowire Stripes from FeRh Films
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Nanowire stripes were subtractively patterned from continuous-films which had been structurally and magnetically characterised prior to fabrication. A negative-tone electron beam resist (Micro Resist Technology ma-N 2403) was spun onto the substrate and subsequently baked at 90 °C for 1 minute giving an approximate layer thickness of 300 nm. Electron beam lithography was performed using a Carl-Zeiss Sigma system with exposure conditions tailored to the widths of the wires to be produced. An aperture of 30 μm and an accelerating voltage of 10 kV were used for all samples. The exposed resist was removed using Rohm and Hass Megaposit MF-26A developer. The resist pattern was transferred to the FeRh film using ion-beam milling in an AJA International ATC Orion Series Evaporator [269] fitted with a 4 cm Kaufman and Robinson KDC 40 DC ion source. The etch was performed with an ion source voltage and current of 400 V and 23 mA respectively and an Ar pressure of 6.1 ×10−4 Torr. During the mill process the sample was rotated to promote etch uniformity and minimise redeposition of milled material. The remaining resist was dissolved in MICROPOSIT Remover 1165 heated to 110 oC for approximately 2 days.
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