Talos f200s transmission electron microscope
The Talos F200S is a transmission electron microscope designed for high-resolution imaging and analysis of materials at the nanoscale. It features a field-emission electron source, advanced optics, and a high-quality detector system to provide exceptional imaging performance and analytical capabilities.
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8 protocols using talos f200s transmission electron microscope
Comprehensive Characterization of Materials
Advanced Material Characterization Techniques
The X-ray diffraction data were taken using an X-ray diffractometer with CuK radiation and a measurement range of 20–80°, (XRD, Miniflex 600, Akishima, Rigaku, Tokyo, Japan).
The transmission electron microscopy and selected area electron diffraction images were obtained from an FEI Talos F200s transmission electron microscope, operated at 200 kV (TEM, SAED, Thermo Fisher Scientific, Waltham, MA, USA).
High-resolution transmission electron microscopy was carried out on an FEI Titan Themis Z G3 30–300 spherical aberration-corrected transmission electron microscope, operated at 300 kV, equipped with both image and probe aberration (HRTEM, Thermo Fisher Scientific, Waltham, MA, USA).
X-ray photoelectron spectroscopy was used to characterize the atomic composition and state at the surface of the samples, using Al Ka rays as the excitation source (XPS, Thermo Scientific K-Alpha, Waltham, MA, USA).
The UV-Vis absorbance spectra were collected by a Cary 5000 spectrophotometer, (UV-Vis, Agilent, Santa Clara, CA, USA).
The photoluminescence spectra were acquired using a fluorescence spectroscopy test system (PL, FLS980, Edinburgh Instruments Ltd., Livingston, UK).
Comprehensive Characterization of Optoelectronic Materials
Characterization of CuO Nanostructures
Comprehensive Material Characterization for Photocatalysis
Comprehensive Material Characterization Protocol
Purification and Visualization of Baculoviruses
Structural Characterization of Fe(OH)3/Fe2O3@Au Nanocomposites
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