X-ray reflectivity (XRR) analysis was performed using a PANalytical X'Pert PRO diffractometer. A Cu anode with Kα radiation of 1.54 Å wavelength was used with a filament current of 40 mA and a voltage of 45 kV. ω-2θ scans were acquired from 0.01°to 1.5°with a step size of 0.01°. The resultant data were analyzed using PANalytical's X'Pert Reflectivity software to extract the thicknesses and densities of the films. Although the exposure of the films to the ambiance was limited to less than 5 min before the start of the measurements, sample alignment and the measurements themselves were performed in an ambient atmosphere and the thicknesses and compositions of the measured films could have continuously changed during the measurements. In order to minimize the impact, we have only involved the first 4-5 fringes in the fitting during which the relative degradation in the films is believed to be minimal.
X pert reflectivity software
Manufactured by Malvern Panalytical
Sourced in United Kingdom
The X'Pert Reflectivity software is a powerful tool for analyzing and interpreting reflectivity data. The software provides a comprehensive set of features and functionalities to assist in the characterization of thin film materials and structures.
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4 protocols using x pert reflectivity software
1
X-ray Reflectivity Analysis of Thin Films
2
Structural Analysis via X-ray Techniques
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GI X-ray diffraction and XRR analyses were performed using a PANalytical Empyrean diffractometer, equipped with a Cu Kα source powered at 45 kV/40 mA (λ=1.5406 Å), a parallel beam X-ray mirror and a proportional point detector (PW 3011/20). For GI X-ray diffraction the incident angle was ω=0.30°, while for XRR analysis 2θ was scanned from 0.08° to 6°. The XRR results were analysed using the X'Pert Reflectivity software provided by PANalytical. X-ray fluorescence was performed on a PANalytical Axios mAX minerals instrument, and analysed using the Stratos software.
3
Structural and Magnetic Characterization of Magnetic Thin Films
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X-ray measurements are performed using the Malvern Panalytical X’Pert Pro equipped with a CuKα source. A calibration of the growth rates is inferred from fitting x-ray reflectivity measurements of single layers of each material or Ru(2)∣X∣Ru(2) (X = Co, Fe, Ta, and RuFe) multilayers with X’Pert reflectivity software from Malvern Panalytical. Large angle x-ray diffraction measurements show that multilayer structures have strong texture along the 〈0001〉 crystallographic orientations with a c-axis full-width-at-half-maximum distribution under 5∘. The single Ru100−xFex(18) films have hexagonal close-packed crystal structure and weak texture along the 〈0001〉 crystal directions.
The field dependence of the magnetization, M(H), is measured using a superconducting quantum interference device (SQUID) made by Quantum Design and a vibration sample magnetometer (VSM) made by Cryogenic Limited in magnetic fields up to 7 T. A magneto-optical Kerr microscope (Evico) is used to image magnetic domain structure in our magnetic films.
The field dependence of the magnetization, M(H), is measured using a superconducting quantum interference device (SQUID) made by Quantum Design and a vibration sample magnetometer (VSM) made by Cryogenic Limited in magnetic fields up to 7 T. A magneto-optical Kerr microscope (Evico) is used to image magnetic domain structure in our magnetic films.
4
DLC Coatings Thickness Characterization
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The thicknesses of the DLC coatings were determined only on the reference substrates, which were 513 µm thick <100> silicon wafers. Before the modification processes, each time, in addition to the PDMS substrate, a fragment of a silicon wafer with one half covered was inserted into the reactor chamber. In this way, after the DLC coatings production processes, it was possible to determine the thickness of the coatings using a profilometer and XRR measurements. In the case of testing the thickness profiles, the Hommel Tester T-1000 profilometer (JENOPTIK Industrial metrology, Villingen-Schwenningen, Germany) was used. Additionally, the coatings obtained on the silicon samples were tested by the X-ray reflectivity method, in which the thickness of the coatings was determined based on periodicity of the registered XRR fringes. The Empyrean diffractometer (Malvern Panalytical, Malvern, Worcestershire, UK) working with Cu Kα radiation (λ = 0.15418 nm) was used to obtain the reflectometric curves. The obtained data were processed using X’Pert Reflectivity software (version 4.7, Malvern Panalytical, Malvern, UK).
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