The SVPC prototype is fabricated on a glass substrate with a negative tone photoresist (IP-Dip, Nanoscribe GmbH & Co. KG) using a commercially available 3D laser writing lithography system equipped with a femtosecond laser at λ = 780 nm (Photonic Professional GT, Nanoscribe GmbH & Co. KG). IP-Dip is a photoresist specially designed for Nanoscribe’s Dip-in Laser Lithography (DiLL) technology31 (link). This technique is capable, in principle, of ~ 300 nm lateral resolution and ~ 500 nm vertical resolution. The objective of the microscope is immersed directly into the liquid photoresist. IP-Dip acts as a photosensitive material and also as an immersion medium, providing ideal focusing and a high resolution (down to approximately 200 nm) because of its refractive index matching with the focusing optics32 (link). After the writing step, the sample is immersed in a bath of a developer (Propylene Glycol Monomethyl Ether Acetate, Sigma-Aldrich) and subsequently rinsed with isopropyl alcohol to remove the unpolymerized photoresist; it is then allowed to dry in air. The features of the prototype SVPC are inspected from a SEM image to assess and compare their structural forms to the designed structures.
Ip dip
Manufactured by Nanoscribe
Sourced in Germany
IP-Dip is a high-resolution 3D printing system designed for the micro- and nanoscale fabrication of complex structures. It utilizes a two-photon polymerization process to enable the creation of intricate, high-precision parts with feature sizes down to the submicron scale.
Automatically generated - may contain errors
Lab products found in correlation
Photonic professional gt, by Nanoscribe (6 mentions)
Describe software, by Nanoscribe (2 mentions)
Solidworks, by Dassault Systèmes (2 mentions)
S 4700 sem, by Hitachi (1 mentions)
Sp tl, by Caisson (1 mentions)
Na pyruvate, by Thermo Fisher Scientific (1 mentions)
Bovine serum albumin (bsa), by Merck Group (1 mentions)
Photonic professional gt2, by Nanoscribe (1 mentions)
Propylene glycol monomethyl ether acetate, by Merck Group (1 mentions)
Bpada, by Merck Group (1 mentions)
Isopropanol, by Merck Group (1 mentions)
Fe3o4 nanoparticles, by US Research Nanomaterials (1 mentions)
Photonic professional, by Nanoscribe (1 mentions)
Photonics professional gt, by Nanoscribe (1 mentions)
Fusion 360, by Autodesk (1 mentions)
Nitromethane, by Merck Group (1 mentions)
Novec 7100, by 3M (1 mentions)
Fg200lea, by Thorlabs (1 mentions)
Photonic professional gt system, by Nanoscribe (1 mentions)
Stereo discovery v20, by Zeiss (1 mentions)
19 protocols using ip dip
1
Fabrication of SVPC Prototype via 3D Laser Lithography
2
Nanoscribe Fabrication Protocol
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We fabricated all devices in the Washington Nanofabrication Facility at the University of Washington, Seattle. We used the Nanoscribe GT and IP-Dip with the 63× objective for the fabrication of all samples. We converted the devices from .stl files using Nanoscribe’s proprietary DeScribe software and then fabricated them on high-resolution glass substrates provided by Nanoscribe. In general, exposure took around 20 to 30 min for each device measuring about 144 by 144 μm2. Following exposure, we developed the samples for 20 min using the MicroChem SU-8 developer. We then rinsed them in isopropyl alcohol and deionized water.
3
Two-Photon Polymerization Nanolithography for Engineering Prototypes
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We used two-photon polymerization (TPP) nanolithography to fabricate the designed engineering prototypes (flat, prism and foil) for experimental investigations. The 3D laser lithography system (Photonic Professional GT, Nanoscribe GmbH, Germany) utilized a dip-in configuration with a 63×, 1.4 N.A. oil immersion objective lens (Zeiss, Germany) to focus the laser beam. An acrylic-based monomer liquid photoresist optimized for TPP applications (nr = 1.52, IP-Dip, Nanoscribe GmbH) was drop-casted on a silicon wafer (500 μm thick with an oxidation layer of 3000 Å) and the objective lens immersed directly in the photoresist. A femtosecond laser (centre wavelength of 780 nm, pulse width of 100 fs, repetition rate of 80 MHz, and maximum power of 150 mW) was used as the irradiation source. A laser power of 25 mW was used in the TPP process and was controlled by an acousto-optic modulator. 50 mm/s writing speed was controlled by a galvo-mirror scanner43 (link). Each design was fabricated to a 135 × 135 μm2 area. The fabricated structures were then characterized using a Hitachi S-4700 SEM (Hitachi High-Technologies Corp., Tokyo, Japan), sputter-coated with 5 nm of chromium. The imaging voltage was kept low (<10 kV) to avoid damaging the structures.
4
2-Photon Polymerization and Sperm Cryopreservation
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The photoresist IP-Dip for 2-photon-polymerization was obtained from Nanoscribe GmbH. The sperm medium SP-TALP was prepared by dissolving 300 mg bovine serum albumin (Sigma) in 47.5 ml SP-TL (Caisson Labs). 2.5 ml of Na-pyruvate (Gibco) and of gentamycin were added and the solution was filtered sterile before storage at . Cryopreserved bovine semen samples were obtained from Masterrind GmbH.
5
Fabrication of Microscopic Pillars
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Microscopic pillars were
made from a negative tone photoresist (IP-Dip, Nanoscribe) using a
two-photon lithography system (Professional GT, Nanoscribe). The nominal
pillar height hp and diameter 2rp were 1 and 7 μm, respectively. The pillars
were arranged in a square array with center-to-center distance dp varied between 10 and 50 μm. Fused silica
slides with a coating of 3-methacryloxypropyl trichlorosilane (product
number AB109004, abcr) were used as substrates. The structures were
generated using the so-called “dip-in mode”, where the
objective was dipped directly into the resist. Exposure parameters
were a power scaling of 0.86, a laser power of 25 mW, and a scan speed
of 10 mm/s. After exposure, the micropillars were developed using
propylene glycol monomethyl ether acetate (product number 484431,
Sigma Aldrich) for 20 min and post-cured to enhance the mechanical
stability.40 (link) For post-curing, the micropillars
were exposed to 365 nm ultraviolet light (OmniCure S1500A, 200 W,
igb-tech) in a nitrogen atmosphere. The elastic modulus of the micropillars
is approximately 1 GPa.41 (link)
made from a negative tone photoresist (IP-Dip, Nanoscribe) using a
two-photon lithography system (Professional GT, Nanoscribe). The nominal
pillar height hp and diameter 2rp were 1 and 7 μm, respectively. The pillars
were arranged in a square array with center-to-center distance dp varied between 10 and 50 μm. Fused silica
slides with a coating of 3-methacryloxypropyl trichlorosilane (product
number AB109004, abcr) were used as substrates. The structures were
generated using the so-called “dip-in mode”, where the
objective was dipped directly into the resist. Exposure parameters
were a power scaling of 0.86, a laser power of 25 mW, and a scan speed
of 10 mm/s. After exposure, the micropillars were developed using
propylene glycol monomethyl ether acetate (product number 484431,
Sigma Aldrich) for 20 min and post-cured to enhance the mechanical
stability.40 (link) For post-curing, the micropillars
were exposed to 365 nm ultraviolet light (OmniCure S1500A, 200 W,
igb-tech) in a nitrogen atmosphere. The elastic modulus of the micropillars
is approximately 1 GPa.41 (link)
6
Calibration Wedges for 2PP Printing
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The
calibration wedges38 (link) were designed in AutoCAD
2022 and exported as a .stl-file. They are 100 μm long with
a slope of 10, 15, 20, and 25°. Their widths are 40, 45, 50,
and 55 μm, respectively, to distinguish them. The length of
the base is 40 μm and the top is 20 μm. A fused silica
substrate (Multi-Dill, NanoScribe GmbH, Germany) was cleaned with
the standard procedure from NanoScribe (EtOH rinse, plasma-treated
for 20 s using normal pressure plasma in ambient air with a Piezobrush
PZ2 (relyon plasma GmbH, Germany)). A commercial 2PP DLW setup (Photonic
Professional GT2, NanoScribe GmbH, Germany) with a 63× NA = 1.5
objective and commercial Dip-in resin (IP-Dip, NanoScribe GmbH, Germany)
was used to print all calibration wedges on a single substrate. The
prints were developed with the standard procedure (20 min PGMEA, 5
min IPA, dried with nitrogen) and postcured with UV light (365 nm)
for 1 h.
calibration wedges38 (link) were designed in AutoCAD
2022 and exported as a .stl-file. They are 100 μm long with
a slope of 10, 15, 20, and 25°. Their widths are 40, 45, 50,
and 55 μm, respectively, to distinguish them. The length of
the base is 40 μm and the top is 20 μm. A fused silica
substrate (Multi-Dill, NanoScribe GmbH, Germany) was cleaned with
the standard procedure from NanoScribe (EtOH rinse, plasma-treated
for 20 s using normal pressure plasma in ambient air with a Piezobrush
PZ2 (relyon plasma GmbH, Germany)). A commercial 2PP DLW setup (Photonic
Professional GT2, NanoScribe GmbH, Germany) with a 63× NA = 1.5
objective and commercial Dip-in resin (IP-Dip, NanoScribe GmbH, Germany)
was used to print all calibration wedges on a single substrate. The
prints were developed with the standard procedure (20 min PGMEA, 5
min IPA, dried with nitrogen) and postcured with UV light (365 nm)
for 1 h.
7
Depth-Controlled Vectorial Hologram Printing
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Our vectorial hologram with eight-level depth-controlled phase modulation was experimentally printed using the Nanoscribe. Specifically, a pair of phase patterns used for the generation of the MANN-derived 2D vector fields and a digital phase hologram embedded with a large-angle FT holographic lens with an NA of 0.8 was printed in an IP-Dip photoresist (IP-Dip, Nanoscribe). The printed phase patterns feature 4000 pixel by 4000 pixel and a physical size of 2 mm by 2 mm. In our experiment, the IP-Dip with the low proximity effect was drop-casted onto a cover glass substrate.
8
Direct 3D Printing of Acoustic Microrobots
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The acoustics-driven helical microrobots were directly mass-fabricated according to a standard procedure by Nanoscribe (Nanoscribe Photonic Professional GT, Nanoscribe GmbH) based on two-photon 3D laser lithography (24 (link)). This technique allowed the direct and precise printing of complex 3D micro/nanostructures at an enhanced resolution. A drop of photoresist (IP-Dip, Nanoscribe GmbH) was placed on an indium tin oxide–coated standard glass slide (25 mm by 25 mm by 1 mm), which was precisely inserted into a microscope system for laser writing through a 63× objective. The printing system could expose and cure the photoresist programmatically layer by layer, as shown in Fig. 2B . After writing, the glass slide with microrobots was carefully developed in 1-methoxy-2-propanol acetate developer for 10 min and rinsed using isopropyl alcohol (IPA) for 2 min.
9
Fabrication of MLA Geometries via 2PP 3D Printing
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The designed MLA geometries were fabricated into master molds using 3D direct laser writing based on two-photon polymerization via a commercial 2PP 3D printing system (Photonic Professional GT, Nanoscribe GmbH, Eggenstein-Leopoldshafen, Germany). As a substrate, fused silica glass was cleaned with acetone, isopropyl alcohol, and deionized water, followed by oxygen plasma treatment for enhanced adhesion with photocurable resin. Negative-type photocurable resin (IP-Dip, Nanoscribe GmbH) was applied onto the prepared substrate, which was then cured by femtosecond pulse laser (780 nm center wavelength, 120 mW average laser power, 100 fs pulse length, and 80 MHz repetition rate) through an objective lens (63×, NA 1.4). The fabricated master mold was passivated with C4F8 gas for low surface energy to ensure the defect-free release in the following replication process.
10
3D Biocage Fabrication via Laser Lithography
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Biocages were printed using the Nanoscribe Photonic Professional GT 3D Laser Lithography system (Nanoscribe GmbH, Eggenstein-Leopoldshafen, Germany). Printing file was prepared using DeScribe software (Nanoscribe GmbH), and printing was done using Nanowrite software (Nanoscribe GmbH). Photoresists used were IP-Dip printed on fused silica glass substrate (for the 63x objective) and IP-S on ITO-coated soda-lime glass (for the 25x objective) (Nanoscribe GmbH). Photoresist was drop-coated on substrates cleaned with 99% acetone, 99% isopropyl alcohol, and ddH2O, and was placed directly in contact with the objective using Dipin Laser Lithography (DiLL) printing mode. Printing was done with a printing speed of 20,000 µm/s at a laser power of 35 mW. After printing, the samples were post-processed in propylene glycol monomethyl ether acetate (PGMEA) for 30 min to remove excess uncured photoresist, washed with 99% isopropyl alcohol, and air-dried.
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