The Fourier transform infrared (FT-IR) spectroscopy analysis of CNC-PU, TA-CNC-PU and Ag/TA-CNC-PU was carried out on a Perkin Elmmer Spectrum GX model (Perkin Elmer Inc., Waltham, MA, USA), and the detection range was from 400 to 4000 cm−1. X-ray photoelectron spectroscopy (XPS) measurements were carried out on a Thermo ESCALAB 250Xi electron spectrometer (Thermo Fisher Scientific, Waltham, MA, USA)to analysis the binding energy spectrum of C1s, O1s, N1s and Ag3d on the surface of CNCs-based PUs films, and the detection range was from 0~1200 eV. Moreover, the auger spectrum was also chosen to determine the valence state of Ag in Ag/TA-CNC-PU. The structure of CNCs was investigated using a JEM 1200EX transmission electron microscopy (JEOL Ltd., Japan). The CNCs suspension was dispersed evenly with an ultrasonic cell grinder and then observed under the TEM after negative staining with phosphotungstic acid. Ag/TA-CNC-PU was first dissolved thoroughly in the mixture of chloroform and DMF (VCHCl3:VDMF = 9:1) and then cast as films. The surfaces of the films were investigated using an SU8020 scanning electron microscopy (HITACHI Ltd., Tokyo, Japan) after drying and gold spraying.
Su8020 scanning electron microscopy
Manufactured by Hitachi
Sourced in Japan
The Hitachi SU8020 is a scanning electron microscope (SEM) designed for high-resolution imaging and analysis of a wide range of materials. The SU8020 features a field emission electron gun, providing a high-brightness, narrow electron beam for detailed observation and characterization of surface features at the nanometer scale. The SEM column and advanced electron optics enable high-resolution imaging with a wide range of magnifications. The SU8020 is a versatile tool for materials science, nanotechnology, and other applications requiring detailed surface analysis.
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2 protocols using su8020 scanning electron microscopy
1
FT-IR and XPS Analysis of CNC-PU Composites
2
Characterization of MoS2 Nanosheets
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The X-ray diffractometer (XRD) was performed on a D8 advance diffractometer (Bruker/AXS, Germany) with Cu-Kα radiation (1.5406 Å) under 40 kV and 30 mA in the range of 3° to 80° with a scan step of 0.02°. The morphologies of the MoS2 membranes were observed by SU8020 scanning electron microscopy (SEM) (Hitachi, Japan). The pore size distribution of MoS2 nanosheets was tested and analyzed by Autosorb IQ N2 adsorption desorption instrument (Beijing Jinaipu Technology Co. Ltd.). The measured aperture range is full hole. Weigh the prepared MoS2 nano sheet sample at about 0.2 g, put it into the sample tube, and degas at 80 °C for 9 h.
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