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7 protocols using quantum 2000 scanning esca microprobe

1

Comprehensive Characterization of Porous Catalysts

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The Micromeritics ASAP 2010 instrument (Tristar II 3020, Norcross, GA) was used to test BET surface areas of the as-prepared porous catalysts by nitrogen physisorption measurements at 77 K. An aberration-corrected FEI Tecnai G2 F20 S-TWIN (S) TEM (Hillsboro, OR) operating at 300 kV with the energy dispersive X-ray (EDX) spectra were used to get STEM-HAADF imaging. The Physical Electronics Quantum 2000 Scanning ESCA Microprobe (Physical Electronics Inc., PHI, MN) equipped with a monochromatic Al Kα anode was used to measure the XPS (X-ray photoelectron spectroscopy) of the as-prepared catalysts. D/max-TTR III X-ray powder diffractometer (Rigaku International Corp., Tokyo) using Cu Kα radiation source was utilized to test the XRD (X-ray diffraction) patterns of different catalysts. The Renishaw RM2000 was employed to collect Raman spectra at room temperature from 100 to 3,000 cm−1 with 532 nm argon ion laser. Inductively coupled plasma optical emission spectroscopy (ICP-OES) analysis was conducted using a PerkinElmer Optima 8000 instrument. The thermal gravimetric (TG) measurements were conducted by Shimadzu DTG-60AH differential thermal analyzer.
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2

Characterization of Multielement Compounds

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The existence of the Na, K, Mn/Ti/Ge, P, O and F atoms in the title compounds was confirmed by the use of an Energy Dispersive X-ray Spectrometer (Oxford Instruments) (Fig. S4-6 †). The powder samples checked by PXRD were used for thermal investigations, FTIR and XPS analyses and magnetic measurements. Thermal investigations were performed on a TG-209F1 thermogravimetric/differential thermal analyzer (TG-DTA) in a N 2 atmosphere with a heating rate of 10 K min -1 . The FTIR spectra recorded were of powder samples mixed with KBr in pressed pellets on a Nicolet 330 FTIR spectrometer in the range of 400-4000 cm -1 . XPS analyses were performed using a Physical Electronics Quantum 2000 scanning ESCA microprobe equipped with a standard focused monochromatic Al Kα (1486.7 eV) X-ray source. Magnetic susceptibility was measured in the temperature range from 2 to 300 K, using a Quantum Design MPMS XL-7 SQUID magnetometer.
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3

X-ray Photoelectron Spectroscopy Characterization

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The XPS characterizations were performed on a Physical Electronics Quantum 2000 Scanning ESCA microprobe with monochromatized Al Kα radiation (hν=1486.7 eV). The background pressure was 6.7 × 10 -8 Pa (5 × 10 -10 Torr). All spectra were referenced to Au 4f 7/2 (84eV).
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4

Characterization of Photocatalytic Nanostructures

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The powder X-ray
diffraction (XRD) patterns were recorded on a Rigaku D/max-2500 X-ray
diffractometer using Cu Kα radiation (40 kV and 150 mA) at a
scanning rate of 10°/min. The morphologies of the prepared samples
were observed by field emission scanning electron microscopy (SEM,
JSM-6700F) and high-resolution transmission electron microscopy (TEM,
JEOL JEM-2010) at 200 kV. UV–vis diffuse reflectance spectra
(DRS) were obtained on a Model c spectrophotometer furnished with
an integrating sphere with a reflectance standard of BaSO4. Electron paramagnetic resonance (EPR) signal of oxygen vacancy
was recorded on a Bruker ESP 300 EPR spectrometer at 77 K, and the
signals of 5,5-dimethyl-1-pyrroline N-oxide (DMPO)–O2– and DMPO–OH were recorded in DMPO solution at 273 K. The photoluminescence
spectrum (PL) was obtained on a PerkinElmer LS-55 spectrophotometer
with an excitation wavelength of 325 nm. X-ray photoelectron spectroscopy
(XPS) were performed on a Quantum 2000 Scanning ESCA Microprobe (Physical
Electronics) using Al Kα radiation (1846.6 eV) as the X-ray
source. The binding energy of the C 1s line at 284.6 eV was used as
an internal standard reference. The concentration of Ag+ in the reaction solution was measured using an inductively coupled
plasma optical emission spectrometer (ICP-OES) (Ultima 2, HORIBA Jobin
Yvon Co., France).
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5

Comprehensive Materials Characterization Protocol

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FT-IR (Fourier transform infrared) spectra were recorded on a PerkinElmer 1710 spectrometer (KBr disc) in the wavenumber range of 400–4000 cm−1. XRD (X-ray diffraction) patterns were recorded on a Bruker D8 Advance system using Cu Kα radiation with 2θ = 5°–80°. XPS (X-ray photoelectron spectroscopy) analysis was conducted on a Physical Electronics Quantum 2000 Scanning ESCA Microprobe (Mono Al-Kα, = 1486.6 eV). The pass energy of the full-spectrum scan was 100 eV, and the pass energy of the narrow-spectrum scan was 60 eV. The XPS spectra were calibrated based on the surface contamination C 1s (284.8 eV). The residual Hf in the reaction liquid was tested by ICP-OES (inductively coupled plasma optical emission spectroscopy, Agilent 720). SEM (scanning electron microscopy) images were obtained using a ZEISS SIGMA300 system. The powder samples were bonded on conductive adhesive for the SEM measurements. HR-TEM (high-resolution transmission electron microscopy) images were obtained using an FEI TALOS F200C system, with a resolution of 0.16 nm. The TEM samples were dispersed in absolute ethanol after ultrasonic vibration and deposited on a carbon-coated copper grid.
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6

Comprehensive Characterization of Nanomaterials

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Transmission electron microscopy (TEM) images were obtained on a JEOL-2100 microscope or a JEOL2100F microscope, with both instruments operated at an accelerating voltage of 200 kV. Field emission scanning electron microscopy (FESEM) images were obtained on a Hitachi S-4800 instrument. Fourier-transform infrared (FTIR) spectra were collected on Excalibur 3100 (Varian, USA) spectrophotometer using an attenuated total reflection mode over the range 4000–600 cm−1 at a resolution of 4 cm−1. X-ray photoelectron spectroscopic (XPS) data were obtained on a Quantum 2000 Scanning ESCA Microprobe (Physical Electronics) using monochromatic Al-Kα radiation ( = 1486.6 eV) as the excitation source. X-ray absorption fine structure (XAFS) data were collected at the Beijing Synchrotron Radiation Facility (BSRF), with the raw fluorescence mode data processed via background-subtraction, normalization and Fourier transformations using the standard procedures within the ATHENA program. Fluorescence spectra were recorded on F-4600 (Hitachi, Japan) luminescence spectrometer.
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7

Characterization of MoS2 Nanoflakes

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The size and morphology of MoS2 nanoflakes were observed using a JEOL 200FX transmission electron microscopy (TEM). The thickness of MoS2 nanoflake was examined using a DI dimension 3100 atomic force microscopy (AFM). The surface morphology of [MoS2 nanoflake]1–4 films was analyzed with a FEI Magellan 400 field emission scanning electron microscopy (FE-SEM). UV-vis spectra of MoS2 nanoflake and [MoS2 nanoflake]1–4 films were recorded with SpectraMax M2 (Molecular Devices, USA). Contact angle measurements of water on 3-APTES treated substrates and [MoS2 nanoflake]1–4 films were performed by Phoenix300 (S.E.O., Korea). X-ray photoelectron spectroscopy (XPS) analysis of MoS2 nanoflake was carried out by using a Quantum 2000 scanning ESCA microprobe (Physical Electronics, USA). All LDI-MS analyses of small molecules with MoS2 nanoflake and [MoS2 nanoflake]1–4 films were performed by using a Bruker Autoflex III (Bruker Daltonics, Germany) equipped with a Smartbeam laser (Nd:YAG, 355 nm, 120 μJ, 100 Hz, 50 μm of spot diameter at target plate) in both positive and negative reflection mode. The accelerating voltage was 19 kV, and all spectra were obtained by averaging 500 laser shots with 48 μJ laser power unless otherwise indicated.
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