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Asylum research cypher es atomic force microscope

Manufactured by Oxford Instruments

The Asylum Research Cypher ES is an atomic force microscope (AFM) designed for high-resolution surface imaging and characterization. It features a compact, modular design and supports a range of imaging modes, including contact mode, tapping mode, and non-contact mode. The Cypher ES is capable of nanoscale resolution and can be used to study a variety of materials, including polymers, semiconductors, and biological samples.

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2 protocols using asylum research cypher es atomic force microscope

1

Atomic Force Microscopy of OFM Samples

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Terminally sterilized samples of OFM samples were imaged using an Asylum Research Cypher ES atomic force microscope (AFM) (Oxford Instruments, Goleta, CA). The samples were epoxied to mild steel pucks, followed by sectioning by hand using a scalpel to expose the matrix interior. The images were acquired in air, using tapping mode with a Tap 300 probe (Budget Sensors, Sofia, Bulgaria). The amplitude was tuned to 1 V and the images were acquired at a setpoint of 570 mV using a scan speed of 1 Hz and a resolution of 512 points and lines. Height, phase and amplitude were recorded, with an amplitude representing the feedback channel. Presented height images have been subjected to an XY planefit using the AR16 plugin in IgorPro and 3D rendering of the images was performed using the same software.
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2

Measuring DPPC Bilayer Defects by AFM

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The atomic force microscopy was performed with an Asylum Research Cypher ES Atomic Force Microscope (Oxford Instruments) in amplitude modulation mode (AM-AFM). All samples were imaged in 8 mM NaCl solution. In liquid environments, cantilevers with a given resonance frequency of 2000 kHz (Nanosensors, product name: Arrow UHFAuD) were used. For measuring in air, silicon cantilevers with resonance frequency of about 330 kHz (Nanosensors, product name: PPP-NCHAuD) were applied. For both cantilever types the back side was gold coated for photothermal excitation (blueDrive mode). For data processing and analysis of the topography data, the Asylum software package was used. For image levelling, second order polynomial fitting was applied. The variation of hole depth of the DPPC bilayer on mica support was based on the analysis of 74 defect structures in 5 different areas of the same sample.
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