SEM images were acquired on Nova NanoSEM 450 (10 kV). TEM images were examined by Tecnai G2-F20 (200 kV). X-ray photoelectron spectroscopy (XPS) measurements were carried out on a Perkin-Elmer model PHI 5600 XPS system; all peaks were standardized to C 1s line at 284.6 eV correction. Powder x-ray diffraction (PXRD) was performed on a Rigaku D/max-IIIA diffractometer (Cu Kα, λ = 1.54056 Å) at room temperature. Electrochemical experiments were conducted on a CHI 760E electrochemical workstation (Shanghai CH Instruments Co., China).
Phi 5600 xps system
Manufactured by PerkinElmer
Sourced in United States
The PHI 5600 XPS system is a versatile surface analysis instrument used for the characterization of materials. It provides high-resolution X-ray photoelectron spectroscopy (XPS) measurements to determine the chemical composition and electronic state of a sample's surface.
Automatically generated - may contain errors
Lab products found in correlation
Jsm 7000f, by JEOL (2 mentions)
D max iiia diffractometer, by Rigaku (1 mentions)
Chi 760e electrochemical workstation, by CH Instruments (1 mentions)
Tecnai g2 f20, by Thermo Fisher Scientific (1 mentions)
S 4800, by Hitachi (1 mentions)
Multimode 8, by Bruker (1 mentions)
D2 phaser, by Bruker (1 mentions)
2010f microscope, by JEOL (1 mentions)
Pw 1830 x ray diffractometer, by Philips (1 mentions)
Asap 2460, by Micromeritics (1 mentions)
Jsm 6700f, by JEOL (1 mentions)
Titanx 60 300, by Thermo Fisher Scientific (1 mentions)
Tecnai f20, by Thermo Fisher Scientific (1 mentions)
X pert pro, by Malvern Panalytical (1 mentions)
7 protocols using phi 5600 xps system
1
Characterization of Nanomaterials
2
Surface Chemical Analysis of Collagen Membranes
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The surface chemical elements of the collagen membranes, as well as the 0.1% and 1% chitosan-coated collagen membranes were analyzed with a PerkinElmer PHI 5600 XPS System (XPS, Perkin-Elmer, Eden Prairie, MN, USA) using a standard magnesium X-ray source (1253.6 eV). Emitted photoelectrons were detected at a 45° take-off angle and analyzed with a hemispheric electron energy analyzer operated at pass energy of 187.9 eV for the survey scans and 5.85 eV for the high-resolution scan. For each membrane, three locations of 0.8 × 0.8 mm2 were analyzed and averaged. The vacuum in each sample chamber was maintained at 10−10 torr during the analysis of the surface chemistry of each specimen. All of the measurements were taken on the air-exposed side of the membranes during membrane preparation. Curve fitting to the high-resolution spectrum was decomposed using a Gaussian (90%)/Lorentzian (10%) curve-fitting program (n = 4).
3
Comprehensive Material Characterization Protocol
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The microstructures and morphologies of the samples were characterized by scanning electron microscopy (SEM, Hitachi S-4800), field emission transmission electron microscopy (TEM, FEI Tecnai G2 F20), and atomic force microscopy (AFM, MultiMode8, Bruker). The crystal structures and composites were obtained using an X-ray powder diffractometer (XRD, Bruker D2 PHASER) with Cu-Kα (λ = 1.5418 Å) radiation. The chemical elements were analyzed using an X-ray photoelectron spectroscopy (XPS, PerkinElmer PHI 5600 XPS system) with a resolution of 0.3–0.5 eV from a monochromated aluminum anode X-ray source. The Brunauer–Emmett–Teller (BET) method was utilized to determine the surface area and pore size of the materials on the ASAP2460 2 MP at 77 K. A Raman spectrometer was carried out using an INVIA Raman microprobe (Renishaw Instruments) with a 532 nm laser source and a 50× objective lens. Fourier transform infrared (FTIR) spectra were obtained using a Thermo Nicolet NEXUS 670 unit in a transmission mode.
4
Comprehensive Characterization of Nanostructured Materials
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The morphologies of the samples were examined by scanning electron microscopy (SEM) using JEOL JSM-6700F at an accelerating voltage of 5 kV and transmission electron microscopy (TEM) on a JEOL 2010F microscope operating at 200 kV. The crystal phases of the samples were carried out using X-ray diffraction (XRD) performed on a Philips PW-1830 X-ray diffractometer with Cu kα irradiation (λ = 1.5406 Å). X-ray photoelectron spectroscopy (XPS) was measured on a PerkinElmer model PHI 5600 XPS system with a resolution of 0.3–0.5 eV from a monochromated aluminum anode X-ray source with Kα radiation (1486.6 eV). The Co/Ni molar ratio in the samples was determined by X-ray fluorescence spectroscopy (XRF) carried out on EAGLE III (EDAX Inc). Brunauer–Emmett–Tell (BET) surface area of the samples were obtained from nitrogen sorption isotherms at 77 K and were carried out on Micromeritics ASAP 2460 instrument.
5
Comprehensive Characterization of Synthesized Products
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Phase purity of the synthesized products was examined by X-ray powder diffraction (XRD, Panalytical X'Pert, Netherlands) carried out with Cu-Kα radiation (λ = 1.5418 Å). The morphology of the products was characterized by field-emission scanning electron microscopy (SEM, Model: JEOL JSM-7000F, Japan) and high-resolution transmission electron microscopy (HRTEM, Model: FEI Titan X 60-300, USA). FA1004 electronic balance was used to measure the weight difference between the prepared electrode and CC substrate, and the mass loading of the active material was obtained. X-ray photoelectron spectroscopy (XPS) was performed on a Perkin-Elmer model PHI 5600 XPS system, with a monochromated aluminum anode as the X-ray source. The specific surface area of the obtained products was calculated by the Brunauer–Emmett–Teller (BET) method using the nitrogen adsorption–desorption isotherm acquired from a Micrometics Tristar 3000 system.
6
Comprehensive Characterization of Synthesized Products
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The phase purity of the synthesized products was examined by X-ray powder diffraction (XRD, Panalytical X' Pert, Holland) by using Cu-Ka radiation (λ = 1.5418 Å). The morphology of the products was characterized by field emission scanning electron microscopy (SEM, Model: JEOL JSM−7000F, Japan) and high-resolution transmission electron microscopy (HRTEM, Model: FEI Titan X 60–300, USA). X-ray photoelectron spectroscopy (XPS) measurements were performed on a Perkin-Elmer model PHI 5600 XPS system with a monochromated aluminum anode as the X-ray source.
7
Comprehensive Characterization of Novel Materials
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The samples were initially measured by Fourier transform infrared (FT-IR) spectroscopy (5700, Japan) and X-ray diffraction using an X-ray diffraction (XRD) analyzer with Cu-Kα radiation (X’Pert PRO, PANalytical). The surface chemical composition of the samples was measured by X-ray photoelectron spectroscopy (XPS), using a Perkin-Elmer model PHI 5600 XPS system. The infrared spectra of the samples were recorded on a Spectrum Spotlight FT-IR Imaging System (PerkinElmer Spectrum One). Ultraviolet visible (UV-vis) diffuse reaction spectra (DRS) were recorded on a UV-vis spectrophotometer (Solidspec-3700, Japan) in the range of 200–800 nm. The more detailed structural information was determined using a field emission scanning electron microscope (FE-SEM, Libra 200), a transmission electron microscope (TEM) and a high-resolution transmission electron microscope (HRTEM, Tecnai F20, FEI). The specific surface area was determined with the BET equation using an adsorption apparatus (NOVA 3000).
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