Chromasolv plus
Chromasolv Plus is a high-purity solvent used in analytical and chromatographic applications. It is designed to provide consistent and reliable performance in various laboratory procedures.
Lab products found in correlation
21 protocols using chromasolv plus
Lipid Preparation for Fluorescence Imaging
Metabolome extraction from co-cultured S. costatum and K. algicida
Solid phase extraction cartridges (Chromabond easy, Macherey-Nagel, Düren, Germany) were equilibrated with 4 mL of methanol (Chromasolv © Plus, Sigma-Aldrich, Munich, Germany) and 4 mL of water (Chromasolv © Plus, Sigma-Aldrich, Munich, Germany) before the filtrate (170 mL) was applied using vacuum with a flow rate < 1 L h -1 . The cartridge was washed with 4 mL water, air-dried and then extracted via gravity flow using 2 mL of methanol followed by 2 mL of methanol/tetrahydrofuran 1:1 (tetrahydrofuran HiPerSolv, VWR, Dresden, Germany). This extract was frozen until further chemical analysis.
Spectroscopic Characterization of HOCl-Modified Proteins
Extraction and Analysis of Marine Exudates
GC-MS Sample Preparation Protocol
Molecular Weight Characterization of NHP407 and SHP407
Synthesis of Organic Electrolytes for Energy Applications
The ethanol and TEOS were purified by distillation.
Et4NBF4 was obtained by mixing an aqueous solution of Et4NOH (30–35%) with HBF4 for to a neutral indicator reaction. Et4NBF4 precipitated from the reaction mixture as white crystals, which were separated by filtering. The powder salt was further recrystallized from diethyl ether and dried for 2 to 3 days in a vacuum at 55 °C for dehydration.
Adhesive Leaf Mounting for LAAPPI-MS
water (Merck Millipore, Molsheim,
France) was used to adhere leaves onto microscope glass slides (see
below), whereas toluene (CHROMASOLV Plus, Sigma-Aldrich, Steinheim,
Germany) was used as a spray solvent in the negative ion LAAPPI-MS
measurements.
Zinc Surface Modification Protocols
Matrimid 5218 Spin-Coating on Silicon Wafers
(ReagentPlus, ≥99%,
Sigma-Aldrich), toluene (EMPLURA, >99%, Merck), n-hexane (EMPLURA, >95%, Merck), toluene anhydrous (99.8%, Sigma-Aldrich),
and n-hexane anhydrous (95%, Sigma-Aldrich) for the
BDS experiments were used as received.
Silicon wafers (100,
front side polished,
CZ test grade, Silchem) were used as a substrate for the spin-coated
layer. The wafers were stored under clean-room conditions until being
cut. Prior to use, the wafers were cleaned with acetone (Chromasolv
plus, for HPLC 99.9%, Sigma-Aldrich).
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