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Quantax eds system

Manufactured by Bruker
Sourced in Germany

The Quantax EDS system is an energy-dispersive X-ray spectrometer (EDS) designed for elemental analysis in a scanning electron microscope (SEM) or electron probe microanalyzer (EPMA). It provides rapid and accurate identification and quantification of elements present in the sample. The system includes a high-performance X-ray detector, advanced electronics, and sophisticated software for data acquisition and analysis.

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11 protocols using quantax eds system

1

Characterization of LM Nanocapsules

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The structure and morphology of the prepared LM nanocapsules were observed using
high-resolution TEM (EM-002B; Topcon, Tokyo, Japan) with an accelerating voltage
of 120 kV. A small droplet of sample placed on a grid or
10 μl of sample solution (LM concentration:
100 μg ml−1) were
irradiated using a fibre-coupled CW laser at 785 nm for
3 min (spot diameter, ∼4 mm; maximum power:
1 W,
∼80 mW mm−2;
BRM-785-1.0-100-0.22-SMA; B&W Tek, Newark, DE, USA). The polymer shell
structure of nanocapsules and STEM/EDS mapping were performed by Nanoscience Co.
in Evans Analytical Group Company, Inc. (Tokyo, Japan). The samples were imaged
with a FEI Tecnai TF-20 FEG/TEM operated at 200 kV in bright-field
TEM mode, high-resolution (HR) TEM mode, and high-angle annular dark-field
(HAADF) STEM mode. The STEM probe size was 1–2 nm nominal
diameter. EDS mapping were acquired on Oxford INCA, Bruker Quantax EDS
system.
The hydrodynamic diameter of LM nanocapsules was examined by DLS (Photal
FPAR-1,000; Otsuka Electronics, Osaka, Japan). DLS diagram of laser-induced LM
nanocapsules was also measured. A 100 μl of sample solution
(LM concentration:
100 μg ml−1) was
irradiated using a fibre-coupled CW laser (maximum power: 1 W,
∼80 mW mm−2) at
785 nm for 1 h before DLS measurements.
The concentration of LM and carmofur in nanocapsules was estimated with a
ultraviolet–visible–NIR spectrophotometer (V-730 BIO; Jasco,
Tokyo, Japan).
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2

Scanning Electron Microscopy Analysis

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The composition of the sample mixture prior to loading in the DAC was analyzed by means of scanning electron microscopy using the JOEL JSM-IT500HR scanning electron microscope (JEOL USA, Inc., Peabody, MA, United States). The chemical composition was checked at 15 kV using energy-dispersive X-ray spectroscopy (EDS) of QUANTAX EDS System with XFlash 6160 detector (Bruker Nano GmbH, Berlin, Germany). No impurities or traces of any other elements were found. The detailed summary is shown in Supplementary Figure S1.
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3

Characterization of Activated Carbons

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N2 adsorption isotherms were obtained on all ACs at 77 K, on Quadrasorb gas adsorption manometric equipment (Quantachrome Instruments), to evaluate their surface area, pore volume and mean pore size. The conditions used can be found in previous work [29 ]. The acquired data were analyzed using the Dubinin–Radushkevich (DR) equation and the Brunauer–Emmett–Teller (BET) and alfa-s (αs) methods. The surface of the ACs was analyzed by SEM–EDX, using a Quanta 3D FEG-FEI, model HITACHI S-4800, with a Bruker Quantax EDS System.
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4

Microscopic Examination of Cladophora Epiphytes

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Cladophora-epiphyte assemblages were examined using light microscopy (Olympus BX-41) and scanning electron microscopy (SEM) in combination with elemental mapping (Hitachi S-4800 SEM with Bruker Quantax EDS system). In 2006 samples, Si incorporation into algal assemblages was examined by incubating algae for 2–4 days at 18 oC, with ~30 μmol photons m-2 s-1 irradiance and 100 μM of the bSi incorporation label [2-(4-pyridyl)-5{[4-dimethylaminoethlamino-carbamoyl)-methoxy]phenyl}oxazole] (PDMPO, LysosensorTM Invitrogen, Carlsbad, CA) and samples examined using epifluorescence microscopy [22 (link)].
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5

Transmission Electron Microscopy Imaging

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Transmission and scanning transmission microscopy images were recorded on a FEI TITAN 80/300 equipped with a Quantax EDS system from Bruker. Samples and TEM grids were dried under vacuum before use, to minimize contamination.
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6

Comprehensive Material Characterization Techniques

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Scanning electron microscope analyses were obtained using a field emission scanning electron microscope (Carl Zeiss ΣIGMA 500, Germany). The roughness analyses were performed by a commercial atomic force microscopy (Dimension Icon, Bruker Inc). Optical analyses were imaged by an optical microscope (Motic china group CO., Ltd. China). The XRD were obtained by a Ragiku Smartlab Diffractometer using Cu Kα radiation. Infrared spectral measurements were performed on a FT‐IR spectrometer (IRTracer‐100, Shimadzu) coupled to an infrared microscope (AIM‐900, Shimadzu). EDS analysis was carried out using a Bruker Quantax EDS system with an XFlash Silicon Drift Detector. Photolithography was performed by a Nikon I‐line stepper NSR‐2205 i‐12D. A magnetron sputtering system (FHR. Micro. 200, FHR Inc) was used to deposit Au and Ti layers. BET surface area, CO2 and CH4 adsorption isotherms were measured by using a volumetric adsorption analyzer (Micromeritics ASAP 2020, USA).
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7

Scanning Electron Microscopy Analysis of Material

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The sample was decompressed to ambient pressure and recovered after the experiment. The composition of the sample was analyzed by means of scanning electron microscopy (SEM) using the JOEL JSM-IT500HR scanning electron microscope (JEOL USA, Inc., Peabody, MA, USA). The chemical composition was checked at 15 kV using energy-dispersive X-ray spectroscopy (EDS) of QUANTAX EDS System with XFlash 6,160 detector (Bruker Nano GmbH, Berlin, Germany). The SEM image is shown in Figure 1A, and the resulting spectrum is shown in Figure 1B.
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8

Comprehensive Analytical Techniques for Material Characterization

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Optical analyses were imaged by an optical microscope (Motic china group CO., Ltd. China). SEM analyses were obtained using a field emission SEM (Carl Zeiss ΣIGMA 500, Germany). The XPS spectra were obtained by an XPS (Thermo Scientific Escalab 250Xi). The film thickness analyses were performed by a commercial atomic force microscopy (Dimension Icon, Bruker Inc). The EDS analysis was carried out using a Bruker Quantax EDS system with an XFlash Silicon Drift Detector. Infrared spectral measurements were performed on a FTIR spectrometer (IRTracer‐100, Shimadzu) coupled to an infrared microscope with a liquid‐nitrogen‐cooled mercury cadmium telluride (AIM‐900, Shimadzu). Photolithography was performed by a Nikon I‐line stepper NSR‐2205 i‐12D. A magnetron sputtering system (FHR. Micro. 200, FHR Inc) was used to deposit Au and Ti layers.
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9

Winchcombe Meteorite Microanalysis Using SEM

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On 11 March 2021, 17 fragments (~0.5 to 8 mm in size, from site 1) of the Winchcombe meteorite were mounted using cleaned stainless-steel tweezers onto carbon-based electrically conductive, double-sided adhesive discs, also known as Leit tabs, stuck to the flat surface of two aluminum SEM pin stubs. The uncoated and unpolished fragments were then quickly transferred to an FEI Quanta 650 FE-SEM at the IAC of the NHM.
The FE-SEM is equipped with a Bruker Quantax EDS system with a high-sensitivity, annular, four-channel Bruker FlatQUAD SDD inserted between the pole piece and sample within the main chamber of the SEM. The annular geometry allows sufficient data collection on uncoated, beam-sensitive, and nonconductive samples with substantial surface topography using ultralow beam currents under high vacuum (65 ). An accelerating voltage of 6 and 9 kV and a beam current of 30 to 190 pA were used, resulting in an input count rate up to 55 kcps. Several of the fragments were initially mapped at 3- and 4-μm pixel resolution using automated stage control to identify features of interest, which were then further analyzed at a pixel resolution down to 16 nm. Follow-up SEM imaging of the features of interest was carried out in the variable pressure mode of the SEM using a low-vacuum cone.
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10

TEM Characterization of FIB-Prepared Samples

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The TEM-ready samples were prepared using the in-situ FIB lift out technique on a FEI Dual Beam FIB/SEM. The samples were capped with sputtered C and e-Pt/I-Pt prior to milling. The TEM lamella thickness was ~100 nm. The samples were imaged with a FEI Tecnai TF-20 FEG/TEM operated at 200 kV in bright-field (BF) TEM mode, high-resolution (HR) TEM mode, and high-angle annular dark-field (HAADF) STEM mode. The STEM probe size was 1–2 nm nominal diameter. EDS spectra were acquired on Oxford INCA, Bruker Quantax EDS system.
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