The resultant products were characterized by using X-ray diffraction (XRD) (Philips X’pert-PRO, PANalytical, Almelo, The Netherlands), scanning electronic microscope (SEM, sirion 200, Thermo Fisher Scientific, Hillsboro, OR, USA) transmission electron microscope (TEM, JEOL 2010, JEOL Ltd., Tokyo, Japan). Absorption spectra of as-prepared substrates were recorded using a UV3600, MPC-3100 spectrometer (Shimadzu, Kyoto, Japan).
Sirion 200
Manufactured by Thermo Fisher Scientific
Sourced in United States, Netherlands
The Sirion 200 is a lab equipment product from Thermo Fisher Scientific. It is a high-performance electron microscope designed for advanced imaging and analysis applications. The Sirion 200 provides users with precise control and high-resolution imaging capabilities.
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Lab products found in correlation
Escalab 250, by Thermo Fisher Scientific (17 mentions)
Escalab 250xi, by Thermo Fisher Scientific (10 mentions)
D8 advance, by Bruker (8 mentions)
Nicolet 6700, by Thermo Fisher Scientific (6 mentions)
X pert pro, by Malvern Panalytical (4 mentions)
Tecnai g2 f20 s twin, by Thermo Fisher Scientific (3 mentions)
Lambda 950, by PerkinElmer (3 mentions)
Axis ultra dld, by Shimadzu (3 mentions)
Al k x ray source, by Thermo Fisher Scientific (3 mentions)
Vg multilab 2000 system, by Thermo Fisher Scientific (3 mentions)
Monochromatic, by Thermo Fisher Scientific (3 mentions)
Tecnai g2 20, by Thermo Fisher Scientific (2 mentions)
Nicolet 5700 spectrophotometer, by Thermo Fisher Scientific (2 mentions)
Uv 3600, by Shimadzu (2 mentions)
Uv 2600 spectrometer, by Shimadzu (2 mentions)
D8 discover, by Bruker (2 mentions)
Labram hr, by Horiba (2 mentions)
Tecnai g2 f30, by Thermo Fisher Scientific (2 mentions)
Multipurpose diffractometer, by Malvern Panalytical (2 mentions)
Ultima 4 x ray diffractometer, by Rigaku (2 mentions)
116 protocols using sirion 200
1
Characterization of Nanomaterial Substrates
2
Characterization of Coatings' Surface Properties
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The surface morphology of the as-prepared coatings was characterized using an optical microscope (Leica DVM2000, Leica Microsystems, Wetzlar, Germany) and a scanning electron microscope (SEM, Sirion 200, ThermoFisher Scientific, Hillsboro, OR, USA). The water contact angles were measured at ambient temperature using an optical contact angle measuring instrument (DSA 100, KRÜSS GmbH, Hamburg, Germany). The sliding angles were measured using the conventional sessile-drop method. A 5-μL deionized water droplet was dropped on the obtained surface, and the average of three measurements at different positions was regarded as the final contact angle. The angle at which the water droplet initiated to roll off the tilted surface was defined as water sliding angle. The surface chemical composition was investigated using a Fourier transform infrared spectrophotometer (FTIR, Nicolet 5700, Thermo Elecron Scientific Instruments Corp., Hillsboro, OR, USA) and an X-ray diffractometer system (XRD-6000, Shimadzu, Kyoto, Japan). In addition, the corrosion resistance of the Ti6Al4V specimen was examined with the changes of the corrosion potential and corrosion current density, which were measured using an electrochemical workstation (CHI660E, CH Instruments, Austin, TX, USA).
3
Morphological and Spectral Characterization of Nanomaterials
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The morphological images were performed on a Sirion 200 field-emission scanning electron microscope (SEM) (ThermoFisher, Waltham, MA, USA) and JEOL 2010 high-resolution transmission electron microscope (TEM) (Japan Electronics Co., Ltd, Japan). The ultraviolet visible (UV−vis) spectrum was performed on a SHIMADZU-UV-2550 spectrophotometer (Shimadzu, Kyoto, Japan). Raman spectra were carried out on a LabRAM HR800 confocal microscope Raman system (Horiba Jobin Yvon, Longjumeau, France), using a 633-nm laser excitation source. The laser power was adjusted to approximately 0.5 mW. The laser was focused by a 50/0.5 NA objective lens. All the spectra reported were the results of a single 2 s accumulation.
4
Comprehensive Material Characterization
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The morphology of materials was characterized by scanning electron microscopy (SEM, FEI Sirion 200, FEI, The Netherlands) and transmission electron microscopy (TEM, FEI Tecnai G2 F20 S-YWIN). The crystal structure of materials was investigated by powder X-ray diffraction (XRD, D/max-2600PC, Rigaku Corporation, Tokyo, Japan). The surface composition and chemical state were measured by an X-ray photoelectron spectrometer (XPS, ESCALAB 250Xi, Thermo Scientific, Waltham, MA, USA).
5
Surface Characterization and Composition Analysis
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Scanning electron microscopy (SEM, FEI Sirion 200, Eindhoven, the Netherlands) was used to characterize the surface morphology of samples. Fourier transform infrared spectroscopy (FT-IR, Thermo Nicolet 6700, Waltham, USA) and X-ray photoelectron spectroscopy (XPS, Shimadzu Axis-Ultra DLD, Tokyo, Japan) were performed in this study to acquire the material composition analysis. The metal ion concentrations before and after adsorption were confirmed by inductively coupled plasma-optical emission spectrometry (ICP-OES, PerkinElmer Optima 8000, Waltham, USA).
6
Morphological Characterization of Samples via SEM
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The superficial characteristics of samples at 1000×, 5000×, and 10,000× magnifications were explained using SEM (FEI SIRION-200, Hillsborough, USA). One mg of FVP and FFVP was fixed on a sample holder, dried by a critical point dryer (LADD 28000, Williston, USA), and coated with a thin gold layer of 3 mm by a sputter coater (JBS E5150, Austin, USA) for conductivity [43 (link)]. The morphologies of samples were observed at an accelerating potential of 15 kV.
7
Comprehensive Characterization of Novel Material
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The phase structures were identified by X-ray diffraction (XRD; D8 Advance, Bruker AXS, German) with Cu Kα radiation (λ = 1.5418 Å) at 40 kV and 50 mA in a 2θ ranging from 20 to 70°. The morphologies were observed by field emission scanning electron microscope (FE-SEM; Sirion 200, FEI, USA). The transmission electron microscopy (TEM) and high resolution TEM (HRTEM) were performed at a field emission transmission electron microscope (TEM; Tecnai G2 F20 S-TWIN, FEI, USA) with an accelerating voltage of 200 kV. UV-vis diffuse reflectance spectra (DRS) were measured at room temperature by UV-Vis spectrometer (UV-Vis; UV-3600plus, Shimadzu, Japan) with the wavelength range of 350–800 nm using BaSO4 as a reflectance. The measurements of magnetic properties were carried out by a superconducting quantum interference device magnetometer (FM, MPMS XL-7, Qunatum Design, USA). The element chemical states were characterized by X-ray photoelectron spectrometer (XPS; PHI-5300, PHI, USA) with an Al Kα X-ray radiation. The photoluminescence (PL) spectra were measured on the fluorescence spectrophotometer (PL; Hitachi F-4600, Hitachi, Japan) with the excitation wavelength of 230 nm and a 150 W xenon lamp as the light source.
8
Characterization of AuNP@mSiO2 and ZnO QDs
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The morphologies of AuNP@mSiO2 and ZnO QDs were investigated through transmission electron microscopy (TEM, Tecnai G220, FEI, Holland) and scanning electron microscope (SEM, Sirion 200, FEI, Holland). ZEN 3600 instrument (Malvern, U.K.) was used to analyze zeta potential. Fourier transform infrared (FT-IR) spectra with the frequency ranging from 4000 to 400 cm-1 were recorded on a Bruker Tensor FT-IR spectrometer (VERTEX 70, Germany). UV absorbance spectra were observed with UV 2550 spectrophotometer (UV-1801, Beijing Rayleigh Analytical Instrument). The surface area and pore size distribution were determined by Brunauer-Emmett-Teller (BET) (TriStar II 3020, Alpha Technologies, USA) and Barrett-Joyner-Halenda (BJH) methods. The removal of CTAB in AuNP@SiO2 was identified by Thermogravimetric analyzer (TGA, Pyris1, Perkinelmer, USA).
9
Structural Characterization of g-C3N4/UiO-66-NH2/CdS Photocatalysts
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The crystalline structures of the g-C3N4/UiO-66-NH2/CdS photocatalysts were assessed by XRD using a Bruker D8-ADVANCE (Bruker AXS, Karlsruhe, Germany) with Cu Kα radiation over the 2θ range of 5–60°. FTIR spectra (KBr pellets as substrate) were recorded on a Nicolet 5700 spectrophotometer (Thermo Fisher Scientific, Waltham, MA, USA) in the range from 4000 to 400 cm−1. The morphologies of the photocatalysts were examined by TEM and SEM using a Tecnai G2 F20 S-TWIN (FEI, Hillsboro, OR, USA) and Sirion 200 (FEI, Hillsboro, OR, USA). Photoluminescence (PL) spectra were acquired using a fluorescence spectrophotometer (F-380, Hitachi, Tokyo, Japan). Ultraviolet-visible (UV-Vis) absorption spectroscopy and diffuse reflectance spectroscopy (DRS) were performed using a spectrophotometer (UV-3600, Shimadzu, Kyoto, Japan) over the range of 200–800 nm. An ESCALAB 250XI (Thermo Fisher Scientific, Waltham, MA, USA) with a He I (21.22 eV) lamp was employed to perform UV photoelectron spectroscopy (UPS) to ascertain the valence band positions and work functions of the samples. Electrochemical impedance spectroscopy (EIS) was conducted with an electrochemical workstation (CHI 760E, CH Instruments, Shanghai, China) using a standard three-electrode system. The pH values of the various samples were determined using a pH meter.
10
Characterization of Nanomaterial Synthesis
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The optical absorbance spectrum was measured with a Shimadzu UV-2600 spectrometer. The morphology and microstructure of the products were observed on a field emission scanning electron microscope (FESEM, FEI Sirion 200) and transmission electron microscope (TEM, JEM-2100). X-ray diffraction (XRD) patterns were recorded on a diffractometer (X’Pert Philips) with Cu Kα radiation (0.15406 nm).
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