Cellular uptake of M-PTX NPs in OSC-19 cells was analyzed by scanning transmission electron microscopy (STEM, Hitachi High Technologies HD-2700, Hitachi High Technologies Corporation., Tokyo, Japan) [6 (link)]. Bright-field (BF) and annular dark-field (ADF) TEM images were obtained to detect M-PTX NPs taken into OSC-19 cells. Energy dispersive X-ray spectroscopy (EDX) and X-ray mapping were used to analyze the composition of the particles. All TEM images, spectra and mapping images were taken at an accelerating voltage of 200 kV.
Hd 2700
Manufactured by Hitachi
Sourced in Japan, United States
The HD-2700 is a high-resolution scanning electron microscope (SEM) designed for materials analysis and inspection. It features a field emission electron source, providing high-resolution imaging capabilities. The HD-2700 is capable of imaging a wide range of samples, including metals, ceramics, polymers, and biological materials.
Automatically generated - may contain errors
Lab products found in correlation
Su8230, by Hitachi (7 mentions)
Digital micrograph software, by Ametek (3 mentions)
D8 advance diffractometer, by Bruker (3 mentions)
K alpha xps system, by Thermo Fisher Scientific (3 mentions)
Jem 2100f hrp, by JEOL (2 mentions)
Sdt q600, by TA Instruments (2 mentions)
D8 advance, by Bruker (2 mentions)
Ht7700, by Hitachi (2 mentions)
K alpha, by Thermo Fisher Scientific (2 mentions)
Axs d8 discover, by Bruker (1 mentions)
F 7000, by Hitachi (1 mentions)
Nb5000, by Hitachi (1 mentions)
Mpms xl, by Quantum Design (1 mentions)
Spectrum bx 2 ft ir spectrometer, by PerkinElmer (1 mentions)
Su8000, by Hitachi (1 mentions)
Fb 2200, by Hitachi (1 mentions)
Spectrum bx ft ir spectrometer, by PerkinElmer (1 mentions)
S 4100, by Hitachi (1 mentions)
Sta 6000, by PerkinElmer (1 mentions)
X pert powder diffractometer, by Malvern Panalytical (1 mentions)
42 protocols using hd 2700
1
Cellular Uptake of M-PTX Nanoparticles
2
Fabrication of Si3N4 Nanopores
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Cross-sectional images of the Si3N4 layers were obtained using a scanning transmission electron microscope (HD 2700, 200 kV, Hitachi High-Technologies Corp.). Observations of the top of the Si3N4 membranes and nanopore fabrication were performed using a field-emission transmission electron microscope (JEM-2100F (HRP), 200 kV, JEOL, Ltd.). The electron flux used to fabricate the nanopores was approximately 1 × 108 to 1 × 109 e− nm−2 s−1, and the irradiation time was approximately 5 seconds.
3
Nanomaterial Characterization by STEM-EDS
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The size and morphology of the samples were also evaluated by scanning transmission electron microscopy (STEM), which allowed us to obtain both TEM and SEM (scanning electron microscopy) images. Additionally, STEM was coupled to an energy-dispersive X-ray spectroscopy (EDS) for the elemental analysis of samples. The nanoparticles were suspended in ethanol and sonicated for 2 min, after which a small sample was dropped on Formvar-carbon coated grids (Electron Microscopy Sciences, Hatfield, PA, USA) and let to dry overnight. All the measurements were done on a Hitachi HD-2700, type B STEM, operated at 200 kV and the EDS was a Fisons EA1108 CHNS-O Element Analyzer, operated with the furnace at 900 °C and with a helium flow of 120 mL/min.
4
Epitaxial NdNiO3 Thin Film Synthesis
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Epitaxial NdNiO 3 thin films were deposited as precursors onto SrTiO 3 (STO) (100) substrates (Shinkosha Co., Ltd) by pulsed laser deposition (PLD) at a substrate temperature of 650 °C, an oxygen partial pressure of 13 Pa, a laser (KrF excimer, 248 nm wavelength) fluence of 2 J cm -2 , and a repetition rate of 5 Hz. The obtained precursor films were then reacted with CaH 2 powder (Wako Pure Chemical Industries, Ltd) in a Pyrex tube evacuated with a rotary pump. The reaction temperature and reaction time were varied in the ranges of 240-400 °C and 1-24 h, respectively. After the reaction, the film was ultrasonically washed with 2-butanone to remove residual powders from the surface. The crystal structures of the samples were characterized by X-ray diffraction (XRD, Bruker AXS D8 Discover) with Cu Kα radiation, as well as by high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM, Hitachi High-Technologies Co., HD-2700). The amount of hydrogen within the films was measured by dynamic secondary-ion mass spectrometry (SIMS, ULVAC-PHI PHI-ADEPT1010, primary ion: Cs + , secondary ion: H -, acceleration voltage: 1.0 kV, detection limit: 1 × 10 19 cm -3 , depth resolution: ∼3 nm).
5
Characterization of Surface-Modified SiO2 Nanoparticles
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The synthesized
SiO2 NPs were observed by using FE-TEM (Hitachi, HD-2700).
The colloidal stability of NPs was evaluated using dynamic light scattering
(DLS; Otsuka Electronics, ELS-Z2), at the particle concentrations
of approximately 0.1 vol %. N2 adsorption–desorption
isotherms of SiO2 particles were measured by a BELSORP-mini
II (Bel Japan Inc.). Thermogravimetric analysis (TGA, TG/DTA 7200,
Seiko Instruments Inc., Japan)) was carried out to estimate the amount
of modifier molecules introduced on the surface of SiO2 particles. The fluorescence spectra of Laurdan in suspensions of
SiO2 NPs were measured at an excitation wavelength of 340
nm at 22 °C by using a fluorescence spectrophotometer (Hitachi
High-Tech Corporation, F-7000).
The ratio of modifier to surface
silanol group (θ) and the volume fraction of modifier to total
particle volume (ϕR) are defined as follows; where Nmod and NSiOH represent the amount
of modifier and silanol group, respectively. VR and Vcore represent the volume
fractions of modifier and core particles, respectively.
SiO2 NPs were observed by using FE-TEM (Hitachi, HD-2700).
The colloidal stability of NPs was evaluated using dynamic light scattering
(DLS; Otsuka Electronics, ELS-Z2), at the particle concentrations
of approximately 0.1 vol %. N2 adsorption–desorption
isotherms of SiO2 particles were measured by a BELSORP-mini
II (Bel Japan Inc.). Thermogravimetric analysis (TGA, TG/DTA 7200,
Seiko Instruments Inc., Japan)) was carried out to estimate the amount
of modifier molecules introduced on the surface of SiO2 particles. The fluorescence spectra of Laurdan in suspensions of
SiO2 NPs were measured at an excitation wavelength of 340
nm at 22 °C by using a fluorescence spectrophotometer (Hitachi
High-Tech Corporation, F-7000).
The ratio of modifier to surface
silanol group (θ) and the volume fraction of modifier to total
particle volume (ϕR) are defined as follows; where Nmod and NSiOH represent the amount
of modifier and silanol group, respectively. VR and Vcore represent the volume
fractions of modifier and core particles, respectively.
6
High-Resolution Structural Characterization
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Microstructure and structural investigations were performed using a Hitachi HD-2700 high resolution scanning transmission electron microscope -HR-STEM (Naka, Japan) operating at 200 kV and equipped with X-ray energy dispersive spectroscopy system -EDS (Thermo Scientific, Waltham, MA, USA) for chemical analysis. The following STEM modes were used for acquisition of high resolution images: bright field (BF) and high-angle annular dark-field (HAADF), which provides Z-contrast. TEM examinations were performed on thin samples prepared by a Hitachi NB5000 (Naka, Japan) focused ion beam (FIB) system. The cross-sectional samples after FIB method (lamellas) were additionally thinned using low-energy argon ion milling on a Gentle Mill (Technoorg Linda Ltd., Budapest, Hungary). Samples prepared in this way were used for STEM microscopic observations.
7
Cross-Sectional Analysis of Organic Films
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The cross-sectional structure of organic films was observed by a HD-2700 (Hitachi, Ltd.) which combines an Energy Dispersive X-ray (EDX) spectroscopy Octane T Ultra W 100mm2SDD (AMETEK). For this measurement, Focused Ion Beam System FB2200 (Hitachi, Ltd.) has been used for site-specific preparation of cross sectional samples suitable for STEM analysis using the micro sampling technique.72
8
Characterization of Ferrofluid Nanoparticles
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TEM was performed on a Hitachi HD-2700 scanning transmission electron microscope (STEM), equipped with a cold field emission gun, working at an acceleration voltage of 200 kV. Images were obtained using the Digital Micrograph software from Gatan. A drop of 5 µL ferrofluid was deposited on a copper grid coated by a thin carbon film and left to dry prior to TEM analysis.
9
Epitaxial Growth and Characterization of Magnetic Thin Films
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All samples were grown in a Riber 2300P MBE system with base pressure of 3–5 × 10–10 Torr. The chamber is equipped with reflection high-energy electron diffraction (RHEED) for in-situ growth monitoring, and the samples were deposited on epi-ready c-plane (0001) sapphire substrates. High purity elemental 6N Sb, Te and 5N8 Mn sources were used. The details of the MBE growth have been previously reported20 (link).
Scanning transmission electron microscope (STEM) images were performed (EAG Laboratories) using a Hitachi HD-2700 Spherical Aberration Corrected Scanning-TEM system. Carrier density and field and temperature dependent measurements were performed in a 14 T Quantum Design physical property measurement system (PPMS) in 1 mTorr (at low temperature) of He gas or in a Lakeshore 7600 electromagnet system. Electrical contacts in the van der Pauw configuration were made with indium bonded on the edge of the thin film.
Magnetization measurements were performed with a superconducting quantum device (SQUID) magnetometer (Quantum Design MPMS—XL). The rapid scan option (rso) of the MPMS-XL was used, giving the opportunity to acquire data at a high speed (0.5 Hz) and average on 5 measurements.
Scanning transmission electron microscope (STEM) images were performed (EAG Laboratories) using a Hitachi HD-2700 Spherical Aberration Corrected Scanning-TEM system. Carrier density and field and temperature dependent measurements were performed in a 14 T Quantum Design physical property measurement system (PPMS) in 1 mTorr (at low temperature) of He gas or in a Lakeshore 7600 electromagnet system. Electrical contacts in the van der Pauw configuration were made with indium bonded on the edge of the thin film.
Magnetization measurements were performed with a superconducting quantum device (SQUID) magnetometer (Quantum Design MPMS—XL). The rapid scan option (rso) of the MPMS-XL was used, giving the opportunity to acquire data at a high speed (0.5 Hz) and average on 5 measurements.
10
Multiscale Characterization of Nanostructures
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Scanning Electron Microscopy (SEM) images and Energy Dispersive X-ray (EDX) spectrum were obtained using a cold field emission Hitachi SU8230 system operating at accelerating voltage up to 30 kV and magnifications up to ×150000. The samples were coated before analysing with a 5-nm conductive gold layer to increase the contrast level in the secondary electron images. Scanning transmission electron microscope (STEM) images were recorded using a Hitachi HD-2700, equipped with a cold field emission gun, working at 200 kV acceleration voltage and designed for high-resolution (HRTEM) imaging with a resolution of 0.144 nm. A droplet of silver colloidal suspension (each sample) was deposited and dried on a copper grid coated by a thin carbon film prior to the STEM analysis. The secondary electrons signal (surface topography) as well as the transmitted electrons signal (morphology and composition) were employed to carry out the morphological investigations.
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