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Supra 40 field

Manufactured by Zeiss

The Supra 40 field is a high-resolution scanning electron microscope (SEM) developed by Zeiss. It is designed to provide detailed imaging and analysis of a wide range of samples at the nanoscale level. The Supra 40 field features a field emission electron gun, advanced optics, and a range of detectors to capture high-quality images and data.

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4 protocols using supra 40 field

1

Scanning and Transmission Electron Microscopy

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Scanning Electron Microscopy (SEM) observations were carried out by a Zeiss Supra 40 field emission scanning electron microscope (SEM) equipped with a Bruker Z200 EDX microanalysis.
Transmission Electron Microscopy (TEM) analysis was performed by using a Philips CM200 microscope operating at 200 kV and equipped with a LaB6 filament. Samples for TEM observations were prepared by depositing the polycorannulene film on a commercial TEM grid covered with a thin carbon film following the procedures as reported in the ESI.All details concerning other characterization methods used in this work are reported in the ESI.
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2

Scanning Electron Microscopy Analysis of Biofilm on Ti Disks

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Six Ti disks were analyzed with scanning electron microscopy (SEM) (one MAC and one SLA for each group: 3MIX, GYPAP, and 3MIX + GYPAP) to visualize the presence of biofilm on the surface after 3 different decontamination treatments. Two positive controls were analyzed for each MAC and SLA group. Specimens were fixed in 2.5% glutaraldehyde overnight at 4 °C and then dehydrated through a graded sequence of ethanol at different concentrations. MAC and SLA disks were examined using SEM (Emission Scanning Electron Microscopy, Zeiss Supra 40 Field) with different magnifications.
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3

SEM Analysis of Mechanically Aged Specimens

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Twelve specimens, two for each subgroup, were randomly selected after mechanical aging and cleaned in an ultrasonic bath with alcohol (TUC-150; Telsonic AG, Bronschhofen, Switzerland) for three minutes and then air-dried. Polyvinylsiloxane impressions were taken (Flexitime Light Flow, Heraeus Kulzer) and poured with epoxy resin (EpoFix; Struers) to produce replicas, which were mounted on aluminum stubs and sputter-coated (100 s, 50 mA) with gold/palladium by use of a sputter coating device (Balzers SCD 050; Balzers, Liechtenstein). Replicas were examined under a scanning electron microscope (Emission Scanning Electron Microscopy, Zeiss Supra 40 Field). Different magnification (66×; 150×; 500×; 1000×) images were obtained with following settings: WD = 10 mm, aperture size = 30.00 μm, EHT = 5.00 kV, signal A = In Lens, stage at T = 0°.
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4

Pulsed Laser Deposition of Carbon Foams

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Carbon Foams showed in Fig. 1(c) are produced through the Pulsed Laser Deposition (PLD) technique using the parameters described by Zani et al.41 (link). To obtain the images, the Zeiss Supra 40 field emission Scanning Electron Microscope (SEM) is exploited with an accelerating voltage of 5 kV.
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