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Go solution

Manufactured by Merck Group
Sourced in United States

The GO solution is a laboratory product offered by Merck Group. It serves as a core function within the scientific research and analysis processes. The solution provides a standardized and consistent medium for various experimental procedures, enabling researchers to obtain reliable and accurate results.

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4 protocols using go solution

1

Synthesis of GO-PAH Nanocomposite

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The titanium (iv) isopropoxide (C12H28O4Ti, 98%), polyvinylpyrrolidone (PVP, Mw = 1,300,000), dimethylformamide (DMF, anhydrous, 99.8%), GO solution (2 ml mg−1) and Poly(allylamine hydrochloride) (PAH, Mw = 900,000) were purchased from Sigma-Aldrich. Acetic acid (CH3COOH, 99.9% (m/m)) was purchased from Junsei. We used all materials without further purification.
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2

Synthesis of Reduced Graphene Oxide Using EGCG

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The technique for converting GO into rGO involved heating it in a solution containing EGCG (BMG Inc., Kyoto, Japan). The procedure began by diluting the commercial GO solution (Sigma-Aldrich, St. Louis, MO, USA) to a concentration of 1 mg mL−1 in sterilized deionized (DI) water. Next, EGCG powder was added to the solution to achieve a final concentration of 10 mg mL−1. As shown in Figure 1a, the resulting mixture was tightly sealed and heated at 80 °C for 8 h. After heating, the mixture was sonicated for 1 h and gradually cooled down in water over a period of 12 h. Atlantic bluefin tuna (Thunnus thynnus) bone (Dongwon, Seoul, Republic of Korea) was cleansed thoroughly by washing with DI water to remove organic components. The bones were then boiled for 20 min and treated with 0.1 N NaOH, followed by rinsing with DI water. To purify HAp, the bones were calcined at 800 °C (Figure 1b). For the control, commercially available water-soluble HAp powder (Dentis Co., Ltd., Daegu, Republic of Korea) was used.
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3

Fabrication of RGD-Functionalized Electrospun Mats

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The functionalization of RGD peptides into the electrospun fiber mats was accomplished by utilizing RGD-M13 phages as reported in our previous studies [3 (link), 30 (link)]. The RGD peptides were expressed on the side wall of M13 phage by genetic engineering. Briefly, an inverse polymerase chain reaction cloning method was conducted to express RGD peptides on major coat proteins of M13 phages, as describe elsewhere [5 (link), 23 (link), 30 (link)].
RGD-GO-PLGA mats were produced by electrospinning technique. The electrospinning solution was prepared by dissolving PLGA (lactide/glycolide molar ratio = 75/25, molecular weight = 70 000–110 000 Da, 200 mg/ml, Evonik Industries, Essen, Germany) and RGD-M13 phages (10 mg/ml) in 1, 1, 1, 3, 3, 3-hexafluoro-2-propanol (Sigma-Aldrich Co., St Louis, MO, USA), and then GO solution (2 mg/ml, Sigma-Aldrich Co.) in water was blended with RGD-M13 phage and PLGA blend solution. Electrospinning was conducted by loading the RGD-M13 phage, GO and PLGA blend solution in a syringe attached to a 21-gauge needle. A voltage of 14 kV was applied and the blend solution was injected at a feeding rate of 0.2 ml/h. A steel rotating wheel covered by aluminum foil was placed 11 cm from the needle tip to collect the nanofibers. After then, RGD-GO-PLGA mats were kept in vacuum for at least 8 h at room temperature in order to eliminate all remaining solvent.
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4

Graphene Oxide Patterning Protocol

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A GO solution was purchased from Sigma-Aldrich Co. (St. Louis, MO, USA). To prevent the defects of GO during photolithography, 25 mm × 75 mm slide glass was pre-treated by placing it into a piranha solution (H2SO4:H2O2 = 3:1) for 30 min. The deposition plate was placed on the coating substrate at an angle of 30°. The 120-μL GO solution (4 mg/mL in distilled water) was injected into the wedge between the plate and slide glass. The deposition plate was moved linearly in a back-and-forth motion at a constant speed of 15 mm/s in a 35% humidified atmosphere to deposit the GO on the substrate. After the coating process, GO-coated slide glass was dried in a vacuum oven at 80 °C for 30 min.
Positive photoresists (PRs, az5214e) were spin-coated on the GO-coated slide glass and soft baked at 95 °C for 5 min. Next, the substrates were exposed to 20 mW of ultra-violet (UV) lights for 6 s through a micropatterned chrome mask. During the developing step, the exposed PRs were dissolved by a developer (AZ 300 MIF, AZ Electronic Materials, Branchburg, NJ, USA). Then, 100 sccm of O2 plasma was applied to the remaining GO between the PRs and the slide glass for 6 min. After all of these steps, the substrates were washed with acetone and dried under N2 gas to remove the PRs.
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