Trimethylaluminum

Manufactured by Merck Group

Trimethylaluminum is a chemical compound used in various industrial and laboratory applications. It is a colorless, pyrophoric liquid that reacts with water and air. Trimethylaluminum is commonly used as a precursor in the deposition of aluminum thin films during chemical vapor deposition processes.

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Lab products found in correlation

6 protocols using trimethylaluminum

Atomic Layer Deposition on High-Capacity Anode

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The HCS electrodes were made through the typical slurry-making process. The slurry was stirred in N-methylpyrrolidone (Sigma-Aldrich) solvent with 3:1 HCS/polyvinylidene difluoride ratio for 6 hours and then coated onto a Cu current collector through doctor blading. The electrodes were dried in a vacuum oven overnight. Thin-film coatings were applied directly on HCS electrodes using a Savannah S100 ALD system (Ultratech/Cambridge NanoTech) operated under the exposure mode to ensure high uniformity on high–surface area substrates. The Al₂O₃ deposition consists of alternating pulse and purge of trimethylaluminum (Sigma-Aldrich) and DI water as precursors at a growth temperature of 150°C. A typical pulse, exposure, and purge sequence for trimethylaluminum and DI water was 0.015 s–15 s–40 s–0.015 s–15 s–40 s. The AlF₃ deposition consists of alternating pulse and purge of AlCl₃ (>99%, Sigma-Aldrich) and TiF₄ (grinded before use, Sigma-Aldrich) as precursors at a growth temperature of 200°C. Both AlCl₃ and TiF₄ precursors were kept at 120° to 130°C. A typical pulse, exposure, and purge sequence for AlCl₃ and TiF₄ was 1 s–15 s–30 s–1 s–15 s–30 s.

Xie J., Wang J., Lee H.R., Yan K., Li Y., Shi F., Huang W., Pei A., Chen G., Subbaraman R., Christensen J, & Cui Y. (2018). Engineering stable interfaces for three-dimensional lithium metal anodes. Science Advances, 4(7), eaat5168.

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Synthesis of Lead Halide Perovskite Nanocrystals

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All chemicals were used as received unless otherwise noted. Lead oxide (PbO, 99.999%), lead iodide (PbI₂, 99.9985%) and selenium shot (99.999%) were purchased from Alfa Aesar. Oleic acid (OA, technical grade, 90%), diphenylphosphine (DPP, 98%), 1-octadecene (ODE, 90%), anhydrous ethylene glycol (EG, 99.8%), anhydrous acetonitrile (99.99%), anhydrous hexanes (99%), anhydrous toluene (99.8%), 3-mercaptopropyltrimethoxysilane (3-MPTMS, 95%), trimethylaluminum (TMA, 97%), ammonium thiocyanate (NH₄SCN, 99.99%) and anhydrous dimethyl sulfoxide (DMSO, 99.9%) were purchased from Sigma Aldrich. Anhydrous 1,2-ethylenediamine (EDA, > 98.0%) was purchased from TCI. Trioctylphosphine (TOP, technical grade, >90%) was acquired from Fluka and mixed with selenium shot for 24 h to form a 1 M TOP-Se stock solution. 18.2 MΩ water (Milli-Q Gradient) was used for substrate cleaning and atomic layer deposition (ALD). Water for ALD was degassed with three freeze-pump-thaw cycles before use.

Kavrik M.S., Hachtel J.A., Ko W., Qian C., Abelson A., Unlu E.B., Kashyap H., Li A.P., Idrobo J.C, & Law M. (2022). Emergence of distinct electronic states in epitaxially-fused PbSe quantum dot superlattices. Nature Communications, 13, 6802.

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Synthesis and Characterization of Supported Catalysts

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Al₂O₃ (NanoDur, 30–40
m²/g) was purchased from Alfa Aesar; Zeolites β (CP811C-300)
and ZSM-5 (CBV28014) were obtained from Zeolyst International; ZSM-22
and ZSM-35 were ordered from ACS Material. K₂PtCl₄ (99.9%) was purchased from Strem Chemicals, Inc. Acetone (99.5%)
was purchased from Millipore Corporation. Phosphoric acid (H₃PO₄, 85%) was purchased from VWR. Polyethylenimine (PEI, M_w = 25000 by LS, M_n =10000 by GPC), NaBH₄ (99%), pentane (anhydrous, 99%),
dodecyldimethylchlorosilane (95%), 1-hexadecanol (99%), trimethylaluminum
(TMA, 97%), tetraethylammonium hydroxide solution (TEAOH, 40 wt %
in H₂O), aluminum-tri-sec-butoxide (97%), and LUDOX HS-30
colloidal silica (30 wt % suspension in H₂O) were purchased
from Sigma-Aldrich. Deionized water obtained from an EMD Millipore
Milli-DI Water Purification System was used in all experiments.
Ethylene (5% in N₂, UHP), isobutene (5% in N₂, UHP), hydrogen (5% in N₂, UHP), deuterium (5% in N₂, UHP), nitrogen (UHP), hydrogen (UHP), argon (UHP), helium
(UHP), CO (5% in helium, UHP), oxygen (10% in argon, UHP), air (ultra
zero) and N₂ (research plus) were provided by Airgas company.

Zhai P., Zhang L., Cullen D.A., Aireddy D.R, & Ding K. (2021). Construction of Inverse Metal–Zeolite Interfaces via Area-Selective Atomic Layer Deposition. ACS Applied Materials & Interfaces, 13(43), 51759-51766.

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Deposition of Oxide Thin Films by AP-SALD

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TiO₂, Nb₂O₅, and AlO_x films were deposited on ITO/glass substrates at 300, 300, and 150 °C, respectively, using AP-SALD. Substrates were sonicated in water, acetone, and 2-propanol prior to deposition. Titanium isopropoxide (heated to 110 °C), niobium ethoxide (heated to 205 °C), and trimethylaluminum (room temperature) (all Sigma-Aldrich) were used as the Ti, Nb, and Al precursors, respectively, with water as the oxidizing agent. Nitrogen was bubbled through the metallic precursors at 100 mL min^–1 for deposition of TiO₂ and Nb₂O₅ films, respectively, and 10 mL min^–1 for AlO_x. The bubbling rate through the water was 50 mL min^–1 for all TiO₂, Nb₂O₅, and AlO_x depositions. The resulting vapors in each bubbler were delivered to the head via separate carrier lines. For TiO₂ and Nb₂O₅ depositions a flow of 500 mL min^–1 was used in the metal carrier line, 100 mL min^–1 through the oxidizing line, and 1000 mL min^–1 through the inert purging line. For AlO_x, these flows were 100, 200, and 1500 mL min^–1, respectively. The samples were scanned underneath the head at 50 mm s^–1. Film thicknesses were measured using a Dektak profilometer.

Armstrong C.L., Price M.B., Muñoz-Rojas D., Davis N.J., Abdi-Jalebi M., Friend R.H., Greenham N.C., MacManus-Driscoll J.L., Böhm M.L, & Musselman K.P. (2015). Influence of an Inorganic Interlayer on Exciton Separation in Hybrid Solar Cells. ACS Nano, 9(12), 11863-11871.

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Atomic Layer Deposition of Alumina and Phosphate

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Divanadium pentoxide (V 2 O 5 , 99.9%, Sigma Aldrich) was sieved to the fraction of 100-200 mm prior to use as substrate. Trimethyl aluminum (Al(CH 3 ) 3 , TMA, electronic grade, 499.99%, Sigma-Aldrich) and water (H 2 O, CHROMASOLV s , for HPLC, Riedel-de Hae ¨n) served as precursor for aluminum oxide ALD and were used without further purification. Trimethoxy phosphine (P(O(CH 3 ) 3 ), TMPT, 99.99%, Sigma-Aldrich) and high purity oxygen (O 2 , 99.999%) served as precursor for phosphorous oxide ALD and were used without further purification. High purity nitrogen, argon and helium (99.999%) acted as carrier and purging gas.

Knemeyer K ., Piernavieja Hermida M ., Ingale P ., Schmidt J ., Kröhnert J ., Naumann d'Alnoncourt R ., Driess M , & Rosowski F . (2020). Mechanistic studies of atomic layer deposition on oxidation catalysts - AlO_x and PO_x deposition. Physical chemistry chemical physics : PCCP, 22(32).

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Synthesis of Palladium Catalysts

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γ-Al₂O₃ (NanoDur,
30–40 m²/g) was purchased from Alfa Aesar; SiO₂ (fumed silica, ∼200 m²/g) was purchased
from Sigma-Aldrich. Sodium tetrachloropalladate(II) trihydrate (Na₂PdCl₄·3H₂O, 99%) and ammonium tetrachloropalladate(II)
((NH₄)₂PdCl₂, 99%) were purchased
from Strem Chemicals, Inc. Poly(vinylpyrrolidone) (PVP, M_w = 55 000), polyethyleneimine (PEI, M_w = 25 000 by LS, M_n = 10 000 by GPC), l-ascorbic acid (99%), ammonium
chloride (NH₄Cl, ≥99.5%), sodium borohydride (NaBH₄, 98%), and trimethylaluminum (TMA, 97%) were purchased from
Sigma-Aldrich. Acetone (99.5%) was purchased from Millipore Corporation.
Deionized (DI) water obtained from an EMD Millipore Milli-DI Water
Purification System was used in all experiments. Acetylene (5% in
N₂, UHP), propylene (UHP), hydrogen (5% in N₂, UHP), deuterium (5% in N₂, UHP), helium (UHP), hydrogen
(UHP), carbon monoxide (5% in He, UHP), and N₂ (research
plus) were provided by Airgas.

Aireddy D.R., Yu H., Cullen D.A, & Ding K. (2022). Elucidating the Roles of Amorphous Alumina Overcoat in Palladium-Catalyzed Selective Hydrogenation. ACS Applied Materials & Interfaces, 14(21), 24290-24298.

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