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Escalab 250xi

Manufactured by Rigaku
Sourced in United States

The Escalab 250Xi is a X-ray photoelectron spectroscopy (XPS) system designed for surface analysis. It features a high-performance electron energy analyzer and a monochromatic X-ray source for obtaining detailed chemical information about the composition and structure of material surfaces.

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3 protocols using escalab 250xi

1

Electrical Characterization of Organic Field-Effect Transistors

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The electrical characterizations of the OFETs were carried out on a standard probe station with a Keysight B1500A semiconductor device analyzer in ambient air. Field-effect hole mobility in saturation regime (μsat) and threshold voltage (Vth) were extracted via the relation ID = −(W/2L)μFECi(VGVth)2, where W, L, and Ci are the channel width, channel length, and areal capacitance of the gate dielectric, respectively. The effective carrier mobility (μeff) was calculated by μeff = r × μsat, where r is the reliability factor defined as [38 (link)] r=IonIoff/VGmax2/WCi/2Lμsat . The dielectric spectra were measured by a Keysight E4980A LCR meter on the MIS capacitors with series resistance corrected. The luminance of the OLEDs was measured by a TOPCON BM-7AS luminance colorimeter. To characterize the material properties of the PVA layer, we used XPS (Thermo Scientific, Escalab 250Xi), XRF (Rigaku, ZSX Primus II), and Fourier-transform infrared spectroscopy (FTIR) (PerkinElmer, Frontier), and the layer thickness was measured by a stylus profiler (KLA Tencor, D-600).
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2

Characterizing Catalytic Nanoparticles via XPS, PXRD, SEM, TEM

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In this study, X-ray photoelectron spectroscopy (XPS, ESCALAB250Xi, USA) and powder X-ray diffraction (PXRD, Rigaku Miniflex600, Japan) were mainly used to identify the valence state and crystal phase composition of the metal after the reaction. Field emission scanning electron microscopy (FE-SEM, Zeiss SIGMA, UK) and transmission electron microscopy (TEM, HITACHI H-7000FA, Japan) were used to observe the micro morphology of Au, Pd, Pt and Ag driven by closo-[B6H7]. Among them, SEM adopted the InLens mode and the acceleration voltage was 5 kV, and the voltage and current of TEM were 75 kV and 4 A, respectively.
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3

Comprehensive Analysis of Reduced Graphene Oxide

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Optical images were captured by a confocal microscope (Keyence, VK-X1000). Characterizations such as SEM (Phenom, Eindhoven, Netherlands) and AFM (Bruker, Billerica, MA, USA) were performed to examine the detailed morphologies. The chemical compositions of the rGO film were analysed by XPS (Thermo Escalab 250Xi) and XRD (Rigaku SmartLab). The spatial element distribution was analysed using EDS (Phenom, Prox). The Raman spectra were measured by a spectrometer (LabRAM HR Evolution) with an excitation wavelength of 532 nm. The light absorption of the GO film and rGO-LIPSS was investigated by a UV–Vis–NIR spectrometer (Agilent, Cary 5000) over a wavelength range of 200–2000 nm. The rGO samples were illuminated by an LED light source (OPTO SIGMA, SLA-100), and the photoresponse was measured using a 4200A-SCS Parameter Analyzer (Keithley, USA). The same LED light with a power of 65 mW and an infrared camera (Image@IR 8300) were used to characterize the photothermal properties and record the temperature.
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