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Axis 165 x ray photoelectron spectrometer

Manufactured by Shimadzu

The Axis 165 is an X-ray photoelectron spectrometer manufactured by Shimadzu. It is designed to analyze the chemical composition and electronic structure of solid surfaces and thin films. The instrument uses X-ray photons to eject photoelectrons from the sample, and the kinetic energy and number of these photoelectrons are measured to determine the elemental composition and chemical state of the material.

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6 protocols using axis 165 x ray photoelectron spectrometer

1

XPS Characterization of MXene Thin Films

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X-Ray photoelectron spectroscopy (XPS) measurements of Ti3C2Tx and Ti2CTx MXene thin films were performed using a KRATOS AXIS 165 X-Ray photoelectron spectrometer with a monochromatic Al X-Ray source.
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2

Characterization of Grafted Materials

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The samples were characterized by Fourier transform infrared spectroscopy (FTIR) using a Nicolet Magna 550 FTIR spectrometer to verify successful formation of the grafted material. Each spectrum was determined by averaging the data obtained in 32 scans, each having a resolution of 4 cm−1. The transmittance spectra were collected for both the entire 125-µm thick film and for 10-µm microtome slices.
X-ray photoelectron spectroscopy (XPS) was performed using a Kratos Axis 165 X-ray photoelectron spectrometer operating in hybrid mode with monochromated aluminum Kα X rays (1,486.6 eV) at 300 W. Charge neutralization was used to minimize sample charging and the pressure of the system was maintained at 1 × 10−8 Torr (1.3 × 10−6 Pa) or lower throughout the measurement. Survey spectra and highresolution spectra were collected at pass energies of 160 eV and 20 eV, respectively. Some sample degradation was noted during XPS data collection, as reflected in a gradual decrease in the C/F ratio, accompanied by changes in the C 1s peak shape and yellowing of the sample with increased analysis time (35 ). Therefore, the XPS data presented here were collected from samples that were X-ray irradiated for a maximum of 20 min to ensure minimal changes to the C/F ratio.
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3

Comprehensive Characterization of Nanomaterials

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SEM and low-magnification TEM imaging were carried out using a Hitachi S-5200 field-emission SEM system at an accelerating voltage of 30 kV. HR-TEM experiments were conducted on a JEOL 2100 field emission TEM system at an accelerating voltage of 200 kV. Raman spectroscopy was performed using a Thermo-Nicolet-Almega dispersive Raman spectrometer with 532 nm excitation. Optical absorption spectra were obtained using a Perkin-Elmer Lambda 900 UV/vis/NIR spectrometer. FT-IR spectra were acquired on a Thermo-Nicolet FT-IR 300 spectrometer equipped with a Thunderdome Swap-Top single reflection attenuated total reflectance (ATR) module. XPS data were obtained on a Kratos Axis 165 X-ray photoelectron spectrometer operating in hybrid mode using monochromatic Al KR X-rays (1486.7 eV). TGA data was collected on a Netzsch TG 209 F1 Libra thermogravimetric analyzer at 10 °C/min in air.
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4

Surface Characterization of Nanocoated Stainless Steel

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X-ray photoelectron spectroscopy (XPS) was used to determine surface chemical composition of coated stainless steel coupons. A Kratos AXIS 165 X-ray Photoelectron Spectrometer (Kratos Analytical Inc., Chestnut Ridge, NY) utilizing a monochromatic Al Kα X-ray (1486.6 eV) source operating at 150 W was utilized to characterize the coatings to a depth of about 10 nm. The X-ray source take-off angle was set at 90° relative to the coupon surface, and the spot size was about 200 μm × 200 μm.
Fourier transform infrared spectroscopy (FTIR) was carried out in order to determine chemical groups within plasma nanocoatings. FTIR was conducted using a Cary 660 FTIR spectrometer (Agilent Technologies, Santa Clara, CA). Scans were carried out from 4000 to 500 cm−1.
Similar to surface contact angle analysis, dry storage (25 °C) and physiological immersion in DPBS (37 °C) were utilized for nanocoated stainless steel coupons of 1 × 1 cm. The coupons were analyzed via FTIR after drying inside a desiccator for 6 hours.
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5

Advanced Physicochemical Characterization of CuO Nanoparticles

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Thermogravimetric analysis was carried out using the Q50 TGA instrument. Thermogram was run from 30 to 800°C in the presence of nitrogen gas and a heating rate of 20 C/min. X-ray photoelectron spectroscopy (XPS) was carried out using the KRATOS AXIS 165 X-ray photoelectron spectrometer to know the correct mechanism of formation of the CuO phase in TP. Information on crystalline character and phase purity was obtained from XPERT PRO, PANalytical XRD using a Cu–Kα radiation. The EPR spectrum was recorded using a Bruker EMX 10/2.7 X-Band EPR spectrometer operating at the X-band and using 100-kHz magnetic field modulation. The chemical composition of the sample was determined by EDAX attached to high-resolution SEM (FEI Quanta 200 FEG). The size of the nanoparticles was characterized using a transmission electron microscope (TEM) analyzed with Philips Tecnai 10 (Philips, Netherlands).
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6

Nanocoating Surface Analysis by XPS

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X-ray photoelectron spectroscopy (XPS) was used to determine surface composition of nanocoatings, and this was done using a Kratos AXIS 165 X-ray Photoelectron Spectrometer (Kratos Analytical, Inc., Chestnut Ridge, NY) utilizing a 150 W Mg X-ray source. Survey spectra were obtained using a pass energy of 80 eV. Scans were able to characterize to a depth of about 10 nm within the coating. The X-ray source take-off angle was set at 90° with respect to the wafer surface, and the standard spot size (200 μm × 200 μm) was utilized for analysis.
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