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22 protocols using uv 3100pc

1

Spectrophotometric Analysis of Benzoic Acid

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The concentrations of benzoic acid in aqueous solutions were detected by spectrophotometer UV (UV-3100PC, Shimadzu, Kyoto, Japan) in the range 300–1100 nm.
The adsorption measurements were repeated three times and the values were averaged. The thermo-analytical measurements were performed on the automatic TG/DTA instrument (Shimadzu-60, Shimadzu, Kyoto, Japan) under air flow (50 cc/min with heating rate of 10 °C min−1). The morphology of the products were examined on a scanning electron microscope (FEI, Hillsboro, OR, USA). The sample preparation relied on the classical method. About 10 mg of CNTs was suspended in 3 mL ethanol, and the suspension was then deposited on a carbonated Cu-Rh grid. The pH values were measured by portable pH-meter (Bicasa, Monza Brianza, Italy).
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2

Layer-by-Layer Deposition of AGA/PBA-PAMAM and CMC/PBA-PAMAM Films

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LbL films were prepared on the surface of a quartz slide (50 × 9 × 1 mm3) (Yazawa Co., Sendai, Japan), which had been cleaned in a mixture of sulfuric and chromic acids (Wako Pure Chemicals Industries, Ltd., Osaka, Japan). The quartz slide was alternately immersed in a 0.1 mg·mL−1 AGA or CMC solution and a 0.1 mg·mL−1 PBA-PAMAM solution for 20 min to deposit AGA/PBA-PAMAM or CMC/PBA-PAMAM films on the surface of the quartz slide. The PBA-PAMAM and polysaccharides solutions were prepared using 10 mM N-cyclohexyl-2-aminoethanesulfonate (CHES) buffer at pH 9.0, 10 mM 1-[4-(2-hydroxyethyl)-1-piperadinyl]ethanesulfonic acid] (HEPES) buffer at pH 7.0–8.0, and 10 mM 2-(N-morpholino)ethanesulfonic acid (MES) buffer at pH 6.0. All buffer solutions (Nacalai Co., Kyoto, Japan) contained 150 mM NaCl (Wako Pure Chemicals Industries, Ltd., Osaka, Japan). The quartz slide was rinsed in the working buffer for 5 min twice after each deposition. UV absorption spectra of the film-coated quartz slide were recorded in the working buffer on a UV-visible absorption spectroscope (UV-3100PC, Shimadzu, Kyoto, Japan) after each deposition of PBA-PAMAM and AGA or CMC.
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3

Comprehensive Spectroscopic Characterization Methods

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UV–vis
spectra were recorded
using a Shimadzu UV3100PC at room temperature. The XPS measurements
were carried out on a Quantera-SXM spectrometer at room temperature.
Binding energies were measured relative to the C 1s peak (284.8 eV)
of an internal hydrocarbon. The diffuse reflectance spectra were recorded
on a Hitachi U-4000 spectrophotometer over the range from 200 to 2500
nm at room temperature. The infrared spectra were recorded on a PerkinElmer
Spectrum 400 over the range from 400 to 4000 cm–1 at room temperature. Cyclic voltammetric measurements were conducted
at room temperature using a BAS CV-50W or BAS 617E electrochemical
analyzer. Cyclic voltammograms were recorded with CH3CN
or CH2Cl2 solutions containing 0.1 M Bu4NPF6 as the supporting electrolyte. Conventional
three-electrode arrangement consisting of glassy carbon or Pt working
electrode, Ag/Ag+ reference electrode, and Pt wire counter
electrode was used. EPR spectra were measured on a JEOL TE-200 spectrometer. 1H NMR were conducted on a JEOL ECA-600.
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4

Physicochemical Characterization of Materials

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UVVis spectra were recorded at 20 °C using Shimadzu UV-3600 and UV-3100PC spectrometers with a quartz cell having an optical length of 1 cm. XPS spectra were measured with a PHI 5000 VersaProbe (Ulvac-Phi, Inc.). Al Kα (15 kV, 25 W) radiation was used as the X-ray source. The beam was focused on a 100 μm2 area. Samples were sputtered with an Ar ion gun to remove the oxidized surface prior to the measurements. The spectra were analyzed with the MultiPak software (Physical Electronics), and were standardized according to the Au 4f7/2 peak at 84.0 eV. Background subtract, peak smoothing and fitting were used to estimate peak areas. STEM images were obtained using a transmission electron microscope (JEOL, ARM-200F) and the HAADF method. STEM samples were deposited on a super high-resolution carbon film with a Cu mesh (Okenshoji Co.). Cyclic voltammetry was performed using a BAS ALS750B analyzer. A glassy carbon disc electrode and platinum wire were used as the working and counter electrodes, respectively. An Ag+/Ag (0.01 M AgNO3 in 0.1 M Bu4NClO4/acetonitrile) electrode was used as the reference electrode. NaPF6 (0.05 M) was used as the electrolyte.
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5

Synthesis and Characterization of Tribromo-TOT Derivative

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A detailed synthetic method for the tribromo-TOT derivative 3a is described in our previous work [56 (link)]. DMF, used for the synthesis and solution state DPV/CV measurements, was purified by distillation from CaH2. Melting and decomposition points were measured with a hot-stage apparatus with a melting point measuring device MP-J3 (Yanako, Kyoto, Japan) and were uncorrected. Elemental analyses were performed at the Graduate School of Science, Osaka University (Toyonaka, Japan). 1H NMR spectrum was obtained on an ECA-500 spectrometer (JEOL, Akishima, Japan) with DMSO-d6 using Me4Si as an internal standard. Infrared spectrum was recorded on an FT/IR-660 Plus spectrometer (JASCO, Hachioji, Japan) using a KBr plate (resolution 4 cm−1). UV-Vis absorption spectra were measured on a UV-Vis scanning spectrophotometer UV-3100PC (Shimadzu, Kyoto, Japan). High-resolution mass spectra (FAB-MS) were measured on a double-focusing magnetic sector mass spectrometer JMS-700 (JEOL, Akishima, Japan). XRD measurement was performed on a SmartLab X-ray diffractometer (Rigaku, Akishima, Japan) using Cu Kα radiation at 45 kV and 200 mA (λ = 1.5415 Å) at room temperature.
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6

Cu Grid Electrode Characterization and Capacitor Sensor Fabrication

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Scanning electron microscopy (SEM) images were obtained on a JSM-7400F scanning electron microscope (JEOL, Japan) at 10 kV. The samples were coated with a thin Pt layer before observation. The pattern heights were measured using a stylus surface profiler, Dektak XT-(ULVAC, Japan). Optical images of the surfaces were taken using a VW-9000/VW-600c digital microscope (KEYENCE, Japan). The optical transmittance of the Cu grid electrodes was measured using a UV-vis spectrometer, UV-3100PC (SHIMADZU, Japan); a baseline correction was performed using the bare PEN substrate, which was also used as a reference. For sheet resistance measurements, Au electrode pads with a gap distance of 5 mm were modified on the Cu grid electrodes by a simple sputtering deposition before the measurements. The sheet resistance of the Cu grid electrodes was measured by the four-probe method using a KB-100 (KB-esi, Germany). More than three measurements were performed for each sample, and the results were averaged. As for evaluation as a capacitor sensor, the sensor was fabricated by putting two grid electrodes together in a face to face manner as shown in the inset of Fig. 7. Capacitance data of the sensor was collected by a precision LCR meter, 4284 A (Agilent Technologies, USA) when pressure was added by an autograph, AGS-X (Shimadzu Corporation, Japan).
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7

Evaluation of Complexation Efficiency

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Complexation efficiency was evaluated based on the three factors: recovery yield (RY), embedding fraction (EF), and loading capacity (LC) calculated using Equations (1)–(3) as follows.
RY (%)= weight of recovered ICs (g)initial host material weight (g)+initial HEO weight (g)× 100,
EF (%)=weight of embedded HEO (g)initial HEO weight (g) × 100
LC (%)=weight of embedded HEO (g)weight of recovered ICs (g) × 100
The weight of embedded HEO was determined as follows: a calibration curve showing the correlation of the HEO concentration and its absorbance at a wavelength of 240 nm was previously constructed using an ultraviolet-visible spectrophotometer (UV-3100 PC, Shimadzu Corporation, Kyoto, Japan) according to the methodology described in our former study [28 (link)]. A total of 0.04 g ICs were extracted with 40 mL ethanol via a vortex mixer (HS120214, Heathrow Scientific, LLC, Vernon Hills, IL, USA) at 3000 r min−1 for 10 min, followed by centrifugation at 1700× g for 10 min. Then, the supernatant was filtered and its absorbance at 240 nm was measured. Finally, the weight of HEO embedded in the ICs was calculated using the calibration curve.
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8

Characterization of Spin-Coated Films

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Optical absorption
spectra of the
spin-coated films were recorded with a UV–vis–NIR spectrophotometer
(UV-3100PC; Shimadzu) at room temperature. XRD patterns were obtained
over a 2θ range of 1.5–35° with an X-ray diffractometer
(SmartLab; Rigaku) in conjunction with a Ni-filtered copper Kα
target, operating at 45 kV and 200 mA. DSC was performed using DSC
7200 (Hitachi) under a nitrogen flow of 40 mL min–1.
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9

Optical Characterization of Nd:FAP Ceramics

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For the powder and the sintered body, the crystal structures were characterized by X-ray diffraction (XRD; Ultima IV, Rigaku, Japan), and the microstructures were examined using a field-emission scanning electron microscope (FE-SEM; JSM-6701F, JEOL, Japan). The grain size was determined from an average area per grain, counted for >300 grains in the FE-SEM micrographs under an assumption of spherical grains. The grain size was used to estimate the scattering coefficient of the Nd:FAP ceramics using the Rayleigh-Gans-Debye theory as formulated by Apetz and Bruggen19 (link).
The optical in-line transmittance spectra T(λ) of the ceramics was measured using a UV/VIS/NIR spectrometer (UV-3100PC, Shimadzu, Japan). The scattering coefficient γ(λ) was estimated under an assumption of γ = δ by using T(λ)=[1Rav(λ)]2exp[δ(λ)t], where t is the sample thickness, Rav(λ) is the theoretical reflectance obtained from the refractive index dispersion nav(λ) as Rav = (1 − nav)2/(1 + nav)2. Here nav is an average of the refractive indices of ordinary and extraordinary waves, and the dispersion can be obtained using a Sellmeier equation. For calculating the transmitted spectra in the Nd:FAP ceramics using the analysed scattering coefficient, the absorption lines by an electron transition of Nd3+ was ignored.
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10

Comprehensive Spectroscopic Characterization

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UV–vis spectra were recorded
using a Shimadzu UV3100PC (range 200–1400 nm) at room temperature.
Infrared spectra were recorded using a Perkin Elmer Spectrum 400 (range
400–2000 cm–1) at room temperature. XPS measurements
were performed using a Quantera-SXM spectrometer at room temperature.
Binding energies were measured relative to the C 1s peak (284.8 eV)
of internal hydrocarbons. EPR spectra were measured on a JEOL TE-200
spectrometer. Diffuse reflectance spectra were recorded using a Hitachi
U-4000 spectrophotometer (range 200–2500 nm) at room temperature.
Obtained reflectance spectra were converted to absorption spectra
using the Kubelka–Munk function F(R). Cyclic voltammetric measurements
were conducted at room temperature using a BAS 617E electrochemical
analyzer. Cyclic voltammograms were recorded with THF or MeCN solutions
containing 0.1 M Bu4NPF6 as a supporting electrolyte.
Conventional three-electrode arrangement consisting of a glassy carbon
working electrode, Ag/Ag+ reference electrode, and Pt wire
counter electrode was used.
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