Titanium substrates were treated as described in our previous article.31 (link) Briefly, the titanium substrates were coarse grit-blasted with 0.25–0.50 mm corundum grit at 5 bar for 1 min and were then acid-etched in hydrochloric acid/sulfuric acid (1:1) at 65°C for 30 min. Then, the substrates were ultrasonically cleaned with acetone, ethanol, and Milli-Q water for 15 min before rinsing with Milli-Q water. During the EPD process, the titanium substrates were used as the cathode, and a parallel platinum plate served as the anode. The distance between the cathode and the anode was 50 mm. EPD was performed by connecting the cathode and the anode to a direct current power supply (Model 6614C; Agilent Technologies, Santa Clara, CA, USA) at 7–8 V. Each titanium substrate was deposited for 4 min. After deposition, the electrodes were disconnected from the power supply, removed from the solution, and air-dried overnight.
Model 6614c
Manufactured by Agilent Technologies
Sourced in United States
The Agilent Model 6614C is a compact, high-performance DC power supply. It provides precise and stable output voltages and currents for a variety of laboratory and test applications.
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Lab products found in correlation
4 protocols using model 6614c
1
Titanium Substrate Surface Treatment for Electrochemical Deposition
2
Electrophoretic Deposition of Silk Fibroin Nanospheres
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Pretreated metal
substrates were used as a working electrode, and a parallel pure titanium
disk of the same size and shape was used as the counter electrode.
For each experiment, fresh 10 mL of SFN dispersion was used. The distance
between the positive and negative electrodes was 10 mm. To investigate
the EPD parametric control over SFN coating deposition, the EPD process
was first carried out by connecting both electrodes to a direct current
power supply (model 6614C, Agilent Technologies) with different concentrations
from 0.5 to 1.75 wt % at a constant electric field of 5 V/cm for 2
min. In another set of experiments, the same time of 2 min and 1 wt
% SFN suspension were applied for different electric fields (3–8
V/cm). Finally, different deposition time (1–10 min) was applied
with 1 wt % SFN suspension at a constant electric field of 5 V/cm.
During deposition, the SFN suspensions were stirred using a magnetic
stirrer (50 rpm). For following material characterization and biological
assessment SFN coating, SFN coating was deposited at 5 V/cm for 2
min from 1.0 wt % SF nanosphere suspension. After the deposition,
the Ti disks were carefully withdrawn from the solution, rinsed with
Milli-Q water three times, and slowly air-dried in a box to prevent
coating cracks. Finally, the samples were cross-linked by water vapor
annealing in a vacuum desiccator overnight at room temperature.
substrates were used as a working electrode, and a parallel pure titanium
disk of the same size and shape was used as the counter electrode.
For each experiment, fresh 10 mL of SFN dispersion was used. The distance
between the positive and negative electrodes was 10 mm. To investigate
the EPD parametric control over SFN coating deposition, the EPD process
was first carried out by connecting both electrodes to a direct current
power supply (model 6614C, Agilent Technologies) with different concentrations
from 0.5 to 1.75 wt % at a constant electric field of 5 V/cm for 2
min. In another set of experiments, the same time of 2 min and 1 wt
% SFN suspension were applied for different electric fields (3–8
V/cm). Finally, different deposition time (1–10 min) was applied
with 1 wt % SFN suspension at a constant electric field of 5 V/cm.
During deposition, the SFN suspensions were stirred using a magnetic
stirrer (50 rpm). For following material characterization and biological
assessment SFN coating, SFN coating was deposited at 5 V/cm for 2
min from 1.0 wt % SF nanosphere suspension. After the deposition,
the Ti disks were carefully withdrawn from the solution, rinsed with
Milli-Q water three times, and slowly air-dried in a box to prevent
coating cracks. Finally, the samples were cross-linked by water vapor
annealing in a vacuum desiccator overnight at room temperature.
3
Electrochemical Deposition of Hydroxyapatite Coatings
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Deposition of HA coatings was performed according to previous studies.30–32 (link) The Ca/P molar ratio was 1.67. The pH values were adjusted with ammonia. There were two ECD solutions: low concentration (2.4 mM Ca(NO3)2, 1.4 mM NH4H2PO4, PH 6.0; HA/L group) and high concentration (4.2 mM Ca(NO3)2, 2.5 mM NH4H2PO4, PH 6.0; HA/H group). One piece of the samples (3D samples and disc-shaped samples) and a platinum plate were connected to the cathode and anode electrodes respectively. The distance between the electrodes was 4 cm. The voltage was maintained at 3.0 V by a direct current power supply (Model 6614C, Agilent Technologies, Santa Clara, CA, USA) at 85 °C for 1.5 h. After deposition, the scaffolds were rinsed with ultrapure water, and dried in air overnight. Before use, the 3D scaffolds were sterilized in a steam autoclaving machine at 121 °C for 2 h.
4
Anodic Electrophoretic Deposition of Gelatin-CMC Coatings
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Before the AED, as in our previous work introduced,13 (link) Ti disks were blasted with 0.05–0.25 mm corundum grits and treated with an isometric hydrochloric acid/sulfuric acid mixture at 60 °C for 1 h. Then, anhydrous acetone, ethanol, and Milli-Q water were used to clean the disks ultrasonically, respectively. Variable weights of gelatin (0, 0.8, 1.2, and 1.6 g) were dissolved in 20 mL CMC solution at 60 °C to form the AED solution. These groups were labeled CMC, CMCG4, CMCG6, and CMCG8, respectively. Meanwhile, the negative control group was marked as pure Ti. The pH of each AED solution was detected by the digital pH meter (FE20, Mettler Toledo, Switzerland).
To perform the AED, a Ti disk and a platinum foil were assigned as the anode and the cathode, respectively. Next, the deposition process was implemented by a power source (Model 6614C, Agilent, USA) and finished after 2 minutes at 20 mA. Disks were then rinsed and dried at room temperature.
To perform the AED, a Ti disk and a platinum foil were assigned as the anode and the cathode, respectively. Next, the deposition process was implemented by a power source (Model 6614C, Agilent, USA) and finished after 2 minutes at 20 mA. Disks were then rinsed and dried at room temperature.
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