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F 4700 fluorescence spectrometer

Manufactured by Hitachi
Sourced in Japan

The F-4700 fluorescence spectrometer is a high-performance analytical instrument designed for the measurement of fluorescence intensity. It features a high-intensity xenon lamp, a monochromator for wavelength selection, and a photomultiplier tube detector to capture the emitted fluorescence signal. The F-4700 provides accurate and reliable data for a wide range of applications requiring fluorescence analysis.

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5 protocols using f 4700 fluorescence spectrometer

1

Fluorescence Spectroscopy of Cav1-TDD Interactions

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All fluorescence spectra of the Cav1-TDD system were collected on the F-4700 fluorescence spectrometer (Hitachi, Japan). Working voltage and scanning speed were controlled at 700 V and 240 nm/min. The Cav1 concentration was kept at 5.0 × 10−9 mol/L, while varying the TDD concentration (0, 1.0 × 10−7, 2.0 × 10−7, 3.0 × 10−7, 4.0 × 10−7 and 5.0 × 10−7 mol/L) at 298 K and 310 K. The excitation wavelength was set at 280 nm and the emission wavelength was performed from 300 nm to 420 nm. The excitation and emission slit widths were fixed at 5 nm.
The three-dimensional (3D) fluorescence spectra of Cav1 (5.0 × 10−9 mol/L) were recorded at 298 K in the absence and presence of TDD (5.0 × 10−7 mol/L) was measured on the F-4700 fluorescence spectrometer (Hitachi, Japan). The emission wavelength was performed between 300 nm and 420 nm with 5 nm interval. The excitation wavelength was recorded between 200 nm and 300 nm with 5 nm interval.
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2

Nanoscale Characterization of Quantum Dots

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The XRD pattern
of the powder samples was obtained using a Rigaku Miniflex-600 diffractometer
having a Cu (Kα, λ = 1.5418 Å) source.
TEM images were obtained by a JEOL-2100F electron microscope (operating
voltage 200 KeV) by drop-casting the dispersed sample in toluene on
a carbon-coated copper grid (300 mesh). Raman spectra were obtained
by a Wi-Tec alpha300 RA system having an Ar laser source with wavelength
532 nm. For this measurement, QDs were dispersed in toluene solution
and drop-cast on a glass substrate. EDX analysis was carried out by
SEM, Zeiss EVO40 microscope in which an energy dispersive X-ray analyzer
was attached. UV–vis absorption spectra were observed using
a Hitachi U-3900 UV–vis spectrophotometer. PL and PLE spectra
were obtained by a Hitachi F-4700 fluorescence spectrometer. Fluorescence
decay spectra were acquired by time-correlated single-photon counting
(TCSPC) FL920, Edinburg Instruments, U.K. setup.
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3

Comprehensive Materials Characterization

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Transmission electron microscopy (TEM) was performed using a Tecnai G2 F20 S-TWIN transmission electron microscope (FEI, USA) operated at an accelerating voltage of 200 kV. X-ray photoelectron spectroscopy (XPS) measurements were made on an ESCALAB250Xi spectrometer (ThermoFisher Scientific). Fourier transform infrared (FT-IR) spectra were collected with the aid of a Thermo Scientific FT-IR spectrophotometer (Nicolet iS50 FT-IR). UV-vis absorption spectra were recorded with Shimadzu UV-1800 spectrometer (Shimadzu Inc., Kyoto, Japan). Fluorescence measurements were obtained by using a Hitachi F-4700 fluorescence spectrometer (Hitachi. Ltd., Japan).
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4

Characterization of CDs and CDs@Eu–AMP Nanomaterials

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The morphologies of CDs and CDs@Eu–AMP nanomaterials were characterized by Transmission Electron Microscopy (TEM, JEM-2100, Japan) and Scanning Electron Microscopy (SEM, Su8220 Hitachi, Japan). The spectroscopic characteristics were obtained by UV-visible absorption spectroscopy (PerkinElmer, U.K.) and Fourier Transform Infrared (FT-IR) spectroscopy (Nicolet, USA). The X-ray diffraction (XRD) spectrum was performed with AXS-D8 X-ray diffraction (Bruker, Germany). The elemental composition of prepared samples was characterized by X-ray photoelectron spectroscopy (XPS, ESCALAB 250xi). Fluorescent measurements were carried out on an F-4700 fluorescence spectrometer (Hitachi, Japan). The centrifugal process was used by Xiangyi H1650 table top highspeed centrifuge (maximum centrifugal acceleration 18 930×g). The photographs were taken with a smartphone under a 310 nm UV lamp.
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5

Comprehensive Material Characterization Protocol

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Transmission electron microscopy (TEM) was performed using a Tecnai G2 F20 S-TWIN transmission electron microscope (FEI, USA) operated at an accelerating voltage of 200 kV. X-ray photoelectron spectroscopy (XPS) measurements were made on a ESCALAB250Xi spectrometer (ThermoFisher Scientific). Absorbance were recorded with BioTek Microplate Reader (ELx800, USA). Fluorescence measurements were obtained by using a Hitachi F-4700 fluorescence spectrometer (Hitachi. Ltd., Japan). X-ray diffraction (XRD) patterns were recorded on a XRD-6000 using Cu Kr radiation (λ=1.5418 Å) at a step rate of 2° s -1 .
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