IR spectra were recorded with a JASCO FT-IR 6800 instrument. Au sputtering was performed with an ACS-4000-C3-HS instrument (ULVAC, Inc., Japan) or MSP-1S vacuum device (Japan). SEM was performed with a Phenom Pro desktop instrument. XRD patterns were recorded with a Rigaku SmartLab system. Microscopic Raman spectroscopy was performed with a Renishaw inVia™ instrument.
Smartlab system
Manufactured by Rigaku
Sourced in Japan
The SmartLab system is a multipurpose X-ray diffractometer designed for advanced materials analysis. It features a high-performance X-ray source, precision goniometer, and intelligent software to provide accurate and reliable data for a wide range of applications.
Automatically generated - may contain errors
Lab products found in correlation
Jem 2100f, by JEOL (2 mentions)
Ft ir 6800, by Jasco (1 mentions)
Uv 2600, by Shimadzu (1 mentions)
Ft ir perkin elmer spectrometer, by PerkinElmer (1 mentions)
S 4800, by Hitachi (1 mentions)
Jem 2200f, by JEOL (1 mentions)
Iris intrepid 2 xsp, by Thermo Fisher Scientific (1 mentions)
Ttk 450, by Anton Paar (1 mentions)
Cary 5000 uv vis nir spectrophotometer, by Agilent Technologies (1 mentions)
Drx 500 spectrometer, by Bruker (1 mentions)
Su 8010 field emission microscope, by Hitachi (1 mentions)
H7000 tem, by Hitachi (1 mentions)
Carry 50 scan uv spectrophotometer, by Agilent Technologies (1 mentions)
Rf 6000, by Shimadzu (1 mentions)
Lambda 35 spectrometer, by PerkinElmer (1 mentions)
Spectrum 100 ftir spectrophotometer, by PerkinElmer (1 mentions)
Jem f200, by JEOL (1 mentions)
Mpms xl, by Quantum Design (1 mentions)
Dhs900, by Anton Paar (1 mentions)
Flash 2000, by Thermo Fisher Scientific (1 mentions)
23 protocols using smartlab system
1
Characterization of Material Samples
2
Structural and Optical Characterization of Materials
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X-ray diffraction (XRD) measurements were performed on a Rigaku SmartLab system operating with Cu Kα radiation (30 mA, 40 kV) in the 2θ range from 10° to 90°. Diffraction data were recorded with a step size of 0.02° and a counting time of 1°/min over the investigated 2θ. Results of the structural analysis (unit cell parameters, crystal coherence size, microstrain values, and data fit parameters) were obtained using the built-in PDXL2 software. The microstructure of the samples was characterized by a transmission electron microscope (TEM) Tecnai GF20 operated at 200 kV. The average particle size was calculated using ImageJ software. Diffuse reflectance measurements were performed with the Shimadzu UV-2600 (Shimadzu Corporation, Tokyo, Japan) spectrophotometer equipped with an integrated sphere (ISR-2600), using BaSO4 as the standard reference. Luminescence characterization was done using a 980 nm high power (3W) solid state IR laser as an excitation source. Luminescence emissions were recorded using a FHR1000 monochromator (Horiba Jobin Yvon) and an ICCD camera (Horiba Jobin Yvon 3771). All the measurements were performed at room temperature.
3
Rigaku SmartLab X-ray Diffraction Analysis
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X-ray diffraction analyses were carried out using a Rigaku SmartLab system. The X-ray tube was operated at 20–60 kV and 60 mA with CuKα X-rays. A scan axis of 2-theta was employed, and 2-theta values in the range of 20°–80° were used with a step width of 0.02° and scan speed/duration of 1.00°/min.
4
Rigaku SmartLab X-ray Diffraction Analysis
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X-ray diffraction analysis was performed on a Rigaku SmartLab system,
equipped with a 9 kW rotating Cu anode working at 40 kV and 150 mA
and a D/teX Ultra one-dimensional silicon strip detector. XRD samples
were prepared by grinding dried NCs into a powder. The measurements
were carried out in air at room temperature using a zero diffraction
silicon substrate. The Rietveld refinement was performed with the
GSAS software.16 The refined parameters
were as follows: 16 coefficients of a Chebyshev polynomial curve for
background modeling, five profile parameters of a pseudo-Voigt profile
function (GU, GV, GW, LX, and LY), the scale factor, the zero shift,
the unit cell parameters, the atomic coordinates, the partial occupancies
of the (Cs, Cl) and Cu sites, and the isotropic thermal parameters
of all of the atoms (for a total of 31 parameters). The Cu occupancies
and the Cl occupancy of the Cu4Cl cluster at the Cs site
were constrained to be equal.
equipped with a 9 kW rotating Cu anode working at 40 kV and 150 mA
and a D/teX Ultra one-dimensional silicon strip detector. XRD samples
were prepared by grinding dried NCs into a powder. The measurements
were carried out in air at room temperature using a zero diffraction
silicon substrate. The Rietveld refinement was performed with the
GSAS software.16 The refined parameters
were as follows: 16 coefficients of a Chebyshev polynomial curve for
background modeling, five profile parameters of a pseudo-Voigt profile
function (GU, GV, GW, LX, and LY), the scale factor, the zero shift,
the unit cell parameters, the atomic coordinates, the partial occupancies
of the (Cs, Cl) and Cu sites, and the isotropic thermal parameters
of all of the atoms (for a total of 31 parameters). The Cu occupancies
and the Cl occupancy of the Cu4Cl cluster at the Cs site
were constrained to be equal.
5
Comprehensive Characterization of Nanocomposites
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The crystal structure of the composites was determined with an X-ray diffractometer (Rigaku Smart Lab system) using CuKα radiation (λ = 1.54178 Å). A field-emission scanning electron microscope (FESEM) JEOL Model JSM 6390F, (JEOL USA, Inc., Peabody, MA, USA) working in high and low vacuum from 0.5 to 30 kV accelerating voltage, equipped with an LaB6 cathode, InLens, and SE2 detectors, and an energy-dispersive X-ray spectrometer (EDX) (Bruker Nano GmbH, Berlin, Germany) were used to characterize the surface morphology of the samples. Raman and FTIR spectroscopic studies were performed in order to analyze the chemical composition in the nanocomposites employing a BRUKER-RFS27 FT-Raman spectrometer (Bruker Optik GmbH, Bremen, Germany) and a PerkinElmer FTIR spectrometer (PerkinElmer, Inc., MA, USA) respectively. A PerkinElmer LAMBDA 45 UV/Vis/NIR spectrometer (PerkinElmer, Inc., MA, USA) was used for measuring the specular transmission. The steady state PL measurements were done using 325 nm UV excitation at room temperature using an Edinburgh FL 920 photoluminescence spectrometer (Livingston, UK) with double monochromators and a 450 W Xe lamp as the excitation source.
6
Comprehensive Material Characterization
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The samples crystalline structure was examined by X-ray diffraction (XRD) on a Rigaku Corporation Smartlab system (Tokyo, Japan) with Cu-Kα radiation (λ = 0.15418 nm) source, and their morphology and structure were investigated by means of transmission electron microscopy (TEM, JEM-2100F, JEOL, Tokyo, Japan) and scanning electron microscopy (SEM, Hitachi Limited S-4800, Tokyo, Japan). Surface elemental analysis was carried out by an energy dispersive X-ray spectroscopy (EDX) attached to the SEM apparatus. X-ray photoelectron spectroscopy (XPS) measurements of the samples were recorded on a Thermo K-Aepna Ultra spectrometer (Waltham, MA, USA) with an Mg-Kα excitation source. Thermo-gravimetric (TG, SDT Q-600, TA Instruments-Waters LLC, Newcastle, PA, USA) analysis was conducted from room temperature to 1000 °C under air with a heating rate of 10 °C min−1.
7
Comprehensive Characterization of Nanomaterials
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All the reagents and solvents were commercially available and used as supplied without further purification. ICP-AES (IRIS Intrepid II XSP, Thermo Electron Corporation) was used for the analysis of metal ion concentrations. UV-Vis absorption spectra were collected by an Agilent Cary 5000 UV-Vis-NIR Spectrophotometer. TEM, HR-TEM and STEM images were measured using a JEOL JEM-2200FS with image Cs-corrector equipped (National Institute for Nanomaterials Technology (NINT), Korea). SEM images were collected by a JSM 7800F PRIME scanning electron microscope operating at 1 kV. Powder XRD patterns were obtained on a Rigaku Smartlab system equipped with a Cu sealed tube (wave length = 1.54178 Å) and a vacuumed high-temperature stage (Anton Paar TTK-450). The following conditions were used: 40 kV, 30 mA, increment = 0.01°, and scan speed = 0.3 s per step. NMR data were recorded on a Bruker DRX500 spectrometer. Small-angle X-ray scattering (SAXS) measurements were carried out using the 4C SAXS II beamline (BL) of the Pohang Light Source II (PLS II) with 3 GeV power and an X-ray beam wavelength of 0.734 Å at the Pohang University of Science and Technology (POSTECH), Korea. The magnitude of the scattering vector, q = (4π/λ) sin θ, was 0.1 nm–1 < q < 6.50 nm–1, where 2θ is the scattering angle and λ is the wavelength of the X-ray beam. All scattering measurements were carried out at 25 °C.
8
Comprehensive Materials Characterization
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Scanning electron microscopy (SEM) characterizations were performed on an Hitachi SU8010 field-emission microscope operated at 5 kV. Transmission electron microscopy (TEM) characterizations, high-resolution TEM (HR-TEM), high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM), energy dispersive spectrometry (EDS), and elemental mapping analyses were performed on a JEOL JEM-3200FS microscope at 300 kV. X-Ray diffraction (XRD) patterns were collected on a Rigaku SmartLab system (Cu Kα radiation). Inductively coupled plasma-optical emission spectrometry (ICP-OES) data for the weight concentrations of the metal elements of the as-produced solutions were obtained on a Spectro Arcos II MV instrument. X-Ray photoelectron spectroscopy (XPS) measurements were conducted on an ESCALAB-MKII spectrometer (VG Co., United Kingdom) with Al Kα X-ray radiation as the X-ray source for excitation.
9
Spectroscopic Characterization of Nanocrystals
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X-ray diffraction (XRD) measurements were taken using a Rigaku Smart Lab system with a Cu Kα1 (λ = 1.54 Å) fixed anode X-ray source operating at 40 kV and 44 mA. Nanocrystal samples were placed on a glass substrate and dried in an ambient environment before XRD characterization. Transmission electron microscopy (TEM) measurements were performed using a Hitachi H-7000 TEM at 75 kV. Nanocrystal samples for TEM measurements were prepared by diluting them in toluene and sonicating to separate the individual particles. The sample was then carefully placed onto a copper grid with a carbon film and dried in an ambient atmosphere before characterization. The UV-visible absorption spectra were measured using a VARIAN Carry 50 Scan UV-Spectrophotometer with nanocrystals in a toluene colloidal suspension. The PL spectra were measured using a Spectrofluorophotometer (Shimadzu, RF-6000) with a monochromatic xenon lamp as the excitation source while the nanocrystals remained in a colloidal suspension. The LED spectra were obtained by combining four different emissions with different ratios. The calculation of CRI and CCT were performed according to equations defined by the CIE (Commission Internationale de l'Eclairage). Four different emission spectra (blue, green, yellow, and red) were combined and the spectral data were analysed to yield the CRI, CCT, and CIE coordinates.
10
Synthesis and Characterization of Magnetic Nanoparticles
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All materials were purchased from Merck and Aldrich Chemical Co. and directly utilized as received. Spherically shaped Fe3O4 NPs with particle sizes of about 20 nm were obtained from Iranian Nanomaterials Pioneers Co. (Mashhad, Iran). The FT-IR spectra were recorded using a PerkinElmer Spectrum 100 FT-IR spectrophotometer. XRD patterns of CM@SS-BBTU and CM@SS-BBTU-Cu(ii ) were recorded using a Rigaku Smart Lab system (10–90°). The shape, size, composition, and elemental distribution of CM@SS-BBTU and CM@SS-BBTU-Cu(ii ) were determined by TEM and HRTEM (JEM-F200 JEOL), STEM (JEM-F200-TFEG-JEOL Ltd.), and EDS techniques. VSM analysis was performed at 298 K utilizing a SQUID magnetometer 20 (Quantum Design MPMS XL). The thermal studies of CM@SS-BBTU and CM@SS-BBTU-Cu(ii ) were performed using a STA 1500 Rheometric-Scientific with a ramping rate of sample 2 °C min−1 and flow rate of 120 mL min−1. The UV-Vis absorption spectra were recorded on a PerkinElmer LAMBDA35 spectrometer.
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