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Multipak v8

Manufactured by Physical Electronics
Sourced in Japan

MultiPak V8.0 is a software application designed for the analysis and processing of data obtained from physical electronics equipment. The software provides a platform for users to view, manipulate, and interpret the data collected from various instruments. MultiPak V8.0 offers a range of features and tools to assist users in their research and analysis processes.

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3 protocols using multipak v8

1

Elemental Analysis of Clove Surface

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An XPS instrument (Physical Electronics, Ismaning, Germany) was used to obtain the elemental composition of the clove surface. Pieces that were approximately 4 mm × 4 mm in size and 1 mm in thickness were excised from treated and untreated cloves using a scalpel, and then freeze dried. The samples were mounted onto an XPS sample holder, and their surfaces were excited by X-ray radiation from a monochromatic Al source at photon energy of 1486.6 eV. Each sample was measured three times and the mean chemical composition was calculated. The high-energy resolution spectra were acquired with an energy analyzer operating at resolution of about 0.5 eV and a pass energy of 29 eV. The spectra were analyzed using the MultiPak V8.0 software (Ulvac-phi, Inc., Chigasaki, Japan). They were calibrated while using a C 1s peak at 284.8 eV.
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2

Seed Surface Elemental Composition Analysis

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We used an XPS instrument (Physical Electronics, Ismaning, Germany) to obtain the elemental composition of the outermost seed surface layer, expressed in atomic percent (at.%). Pieces were excised from the seed surface and placed onto the sample holder, which was placed inside the XPS and allowed to dry for an hour in the chamber before analysis. The samples were excited by X-ray radiation from a monochromatic Al source at a photon energy of 1486.6 eV. The area analyzed was 400 m2. The take-off angle was set at 45°. XPS survey-scan spectra were acquired at a pass-energy of 187 eV using an energy step of 0.4 eV. Spectra were analyzed using the MultiPak V8.0 software (Ulvac-phi, Inc., Chigasaki, Japan). The results for untreated and treated seeds are presented as the mean values of the analyses from two or three different bean seeds, respectively.
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3

Elemental Composition of Wheat Seed Surfaces

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The elemental composition of the surface layer of seeds, expressed in atomic percent (at.%), was determined by XPS. After wheat seeds were fixed and placed on the sample holder, they were left inside the XPS fore-chamber to dry for 30 min to ensure an appropriate evacuation of the XPS fore-chamber. The analyzed area of the sample was 400 μm2, excited by X-ray radiation from a monochromatic Al source at a photon energy of 1486.6 eV and a take-off angle of 45°. XPS survey-scan spectra were acquired at a pass-energy of 187 eV using an energy step of 0.4 eV. Spectra were analyzed using the MultiPak V8.0 software (Ulvac-phi, Inc., Chigasaki, Japan). All measurements were performed in duplicate, and a mean value and standard errors were calculated. The probing depth of XPS for this type of material is several nm.
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