Ti och ch3 2 4
Ti(OCH(CH3)2)4 is a chemical compound with the formula Ti(OCH(CH3)2)4. It is a colorless, volatile liquid that is used as a precursor in chemical vapor deposition (CVD) processes for the deposition of titanium-based thin films.
Lab products found in correlation
8 protocols using ti och ch3 2 4
Synthesis of Titanium-based Nanocomposites
Hydrothermal Synthesis of BaTiO3 Nanostructures
Synthesis of Pure TiO2 and Ag/TiO2
Synthesis and Analysis of S-Met and TiO2 NPs
Synthesis of Metal Oxide Nanoparticles
Perovskite Solar Cell Fabrication
Synthesis of Amino-Functionalized MIL-125(Ti)
Example 1
Synthesis of NH2-MIL-125(Ti)
On the basis of the following literature: S.-N. Kim et al., Catalysis Today 2013, 204, 85-93
A solution of 3 mmol of titanium isopropoxide (Ti[OCH(CH3)2]4, Aldrich, 97%) and 6 mmol of 2-aminoterephthalic acid (H2BDC—NH2, Aldrich, 99%) in 50 mL of N,N-dimethyl formamide/methanol (1:1, v/v) was produced. Said solution was transferred to a 250-mL steel autoclave (DAB-3 from Berghof) having a PTFE insert. The autoclave was held at 150° C. for 16 h by means of a convection oven. After cool-down to room temperature, the yellow powder was filtered, washed twice with DMF, and then washed with ethanol.
The yield was 760 mg.
Synthesis of TiOx via Sol-Gel Method
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