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Xeuss 2.0 system

Manufactured by Xenocs
Sourced in France

The Xeuss 2.0 system is a state-of-the-art laboratory equipment designed for high-performance X-ray scattering and diffraction analysis. It features a modular and flexible architecture, allowing for customization to meet specific research requirements.

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5 protocols using xeuss 2.0 system

1

X-ray Characterization of Structural Transitions

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The structural characterization was performed
in the 1W2A beamline
of the Beijing Synchrotron radiation Facility (BSRF). Selected samples
were previously fractionated in a Linkam THMS600 hot stage connected
to a liquid nitrogen station. The final heating was performed from
25 to 140 °C at 5 °C/min in a Linkam TST350 hot stage, and
the WAXS patterns were taken simultaneously. An exposure time of 25
s was used, and the patterns were taken every 30 s (i.e., every 2.5
°C). A Pilatus 1M detector collected the scattering patterns
with a resolution of 981 × 1043 pixels (pixel size = 79 ×
79 μm2). The sample-to-detector distance was 121.8
mm, and the wavelength was 1.54 Å.
WAXS experiments, on
selected samples, were performed with transmission geometry at RT.
These experiments were performed on a Xeuss 2.0 system (Xenocs SA),
equipped with a microfocus Cu Kα X-ray source (GeniX3D, 50 kV,
0.6 mA), generating X-ray radiation of a wavelength of 1.54 Å.
The detector used was a Pilatus 300K (DECTRIS, Swiss) with a resolution
of 487 × 619 pixels (pixel size = 172 × 172 μm2). The sample-to-detector distance was 138.61 mm, and exposure
time of 1800 s. The 1D intensity profiles were integrated from background-corrected
2D WAXS patterns with an azimuthal angle range of 0–90°.
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2

SAXS Analysis of HCC Protein Variants

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SAXS studies of reference samples (wt-HCC and its variants) were performed using a laboratory SAXS/WAXS XEUSS 2.0 system (XENOCS, France). X-ray radiation (λ = 0.134 nm) was generated by the MetalJet microfocus X-ray source with a liquid metal (gallium alloy) target (Excillum AB, Sweden) and collimated using a Fox 3D Ga ultra-low divergence mirror. The HCC samples were measured using a low-noise flow cell and a PILATUS 3 R 1 M hybrid photon counting detector with an active sensor area (width × height) of 169 × 179 mm2 (DECTRIS AG, Switzerland). The sample-to-detector distance was 1200 mm, which in the high-flux mode of X-ray optics, covers the scattering vector range 0.08 < s < 4.7 nm−1. The X-ray photon flux on the sample was 2 × 108 photons/s. For each sample, 15 frames (600 s/frame) were collected. The collected frames were checked for radiation damage and processed using FOXTROT33 (link),34 , and the buffer scattering was subtracted using PRIMUS28 (link). The low-resolution parameters (Rg, pair distance distribution functions) were then analysed from the SAXS data using the software described above.
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3

SAXS Analysis of Polymer Lamellar Structure

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The SAXS experiment was conducted on the Xeuss 2.0 system (Xenocs,
France) equipped with a multilayer focused Cu Kα X-ray source
(λ = 0.154 nm). The sample-to-detector distance was fixed at
2500 mm, which provided the effective scattering vector q (q = (4π sin θ)/λ)) range from
0.05 to 1.15 nm–1. The long period of the lamellae
(Lp) was determined from Bragg’s
law35 (link) where qmax is the maximum scattering vector of the relevant intensity
profile. The lamellar thicknesses (Lc)
and amorphous thicknesses (La) are computed
in terms of the following equations where ρc (1.003
g/cm3), ρa (0.855 g/cm3), and
ρ are the densities of the PE crystalline phase, PE amorphous
phase, and tested sample, respectively.36 (link) Moreover, it should be noted that the equations assume a much larger
lateral extent of the crystalline lamellae as compared with thickness.
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4

WAXD Characterization of PBS/PLA Composites

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WAXD experiments of neat PBS and PBS/PLA composites were conducted on a Xenocs Xeuss 2.0 system with an Excillum MetalJet-D2 X-ray source and a detector (Pilatus 3R 1M, Dectris, Baden, Switzerland). The sample-to-detector distance of 222.069 mm and a wavelength of 0.134144 nm were used.
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5

2D-WAXS Characterization of Thin Films

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2D-WAXS measurements were carried out on a Xeuss 2.0 system (Xenocs SA, Sassenage, France) with Cu Kα radiation. The detector was set perpendicular to the film surface with a distance of 183.71 mm and an exposure time of 5 min. All 2D WAXS patterns were corrected by the Fraser method to compensate the detection of a flat-plat detector.
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