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Ex 24065jgt

Manufactured by JEOL

The EX-24065JGT is a high-performance electron microscope designed for advanced materials analysis. It features a powerful electron beam, high-resolution imaging, and versatile analytical capabilities. The core function of this product is to provide detailed characterization of a wide range of materials at the micro and nanoscale level.

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3 protocols using ex 24065jgt

1

Transmission Electron Microscopy Analysis of Particulate Matter

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During experiments, nvPM was collected directly on TEM grids, in parallel with cell exposures. Two types of TEM grids were used in the current study: i) Cu-supported holey carbon film grids for detailed study of soot and ii) ultra-thin carbon film grids for better optical contrast facilitating observation of ash particles. TEM imaging was performed with a JEOL 2200FS microscope fitted with an Omega filter, a Schottky field emission gun at 200 kV, and a 0.23 nm point-to-point resolution (Electron Microscopy Center of Empa, Dübendorf, Switzerland). The TEM instrument is equipped with an EDX detector (JEOL EDX detector: EX-24065JGT), which was used for the elemental analysis of the inorganic, ash particles. Gatan DigitalMicrograph® was used for image analysis.
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2

Advanced Microscopy Techniques for Material Analysis

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A field emission TEM (FE-TEM, JEM-2100F, JEOL, operating at 200 kV) and a monochromated field emission, energy filtering TEM (FE-EFTEM, Libra MC, Carl Zeiss, operating at 60 kV–200 kV) were employed to obtain the TEM micrographs, SAED patterns, HRTEM images, and EDS data. The specifications for instruments used for SAED and EDS analysis are: (i) JEM-2100F: side CCD (sensor size: 2048 x 2048, pixel size: 14 μm) for SAED (beam stopper used); EDS detector (EX-24065JGT, JEOL) and software (Analysis station version 3.63.01, JEOL); (ii) Libra MC: side CCD (sensor size: 2048 x 2048, pixel size: 7.4 μm) for SAED (beam stopper not used); EDS detector (X-Max 80T, Oxford) and software (Aztec version v2.2 SP2, Oxford). TEM micrograph processing, measurements of the SAED patterns and HRTEM/FFT images were done with the software Digital Micrograph version 1.72.53 (Gatan).
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3

Transmission Electron Microscopy Analysis of Particulate Matter

Check if the same lab product or an alternative is used in the 5 most similar protocols
During experiments, nvPM was collected directly on TEM grids, in parallel with cell exposures. Two types of TEM grids were used in the current study: i) Cu-supported holey carbon film grids for detailed study of soot and ii) ultra-thin carbon film grids for better optical contrast facilitating observation of ash particles. TEM imaging was performed with a JEOL 2200FS microscope fitted with an Omega filter, a Schottky field emission gun at 200 kV, and a 0.23 nm point-to-point resolution (Electron Microscopy Center of Empa, Dübendorf, Switzerland). The TEM instrument is equipped with an EDX detector (JEOL EDX detector: EX-24065JGT), which was used for the elemental analysis of the inorganic, ash particles. Gatan DigitalMicrograph® was used for image analysis.
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