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1

Characterization of Dendritic Nanostructures

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DLS was done on a Malvern Zetasizer
Nano S equipped with a laser operating at 633 nm. The sample grids
used for electron microscopy were purchased from Electron Microscopy
Sciences (EMS, Hatfield, PA, USA). The grids were treated with a plasma
cleaner setup (20 s at 10–1 Torr) to make them hydrophilic.
For TEM measurements, samples were prepared on hydrophilic 400 mesh
carbon-coated copper grids, while 200 mesh carbon-coated copper grids
were used for the TEM tilt series. The TEM tilt series were acquired
with SerialEM, and IMOD was used for 3D reconstruction of the dendroids
from the tilt series. For cryo-TEM measurements, 400 mesh holey carbon
grids were used. For cryo-TEM, after blotting, the samples were plunged
into liquid ethane at about liquid nitrogen temperature by using a
Vitrobot system (FEI Company). Samples for (cryo-)TEM were imaged
with a 1400Plus JEOL TEM operating at 120 kV. The contrast of (cryo-)TEM
pictures was adjusted by using ImageJ-win64. Atomic force microscopy
images were recorded on a Bruker Multimode 5 using contact mode. NMR
spectra in D2O were obtained on a Bruker Avance III spectrometer
operating at 500 MHz for 1H, equipped with a 5 mm TXI probe.
Fluorescence emission spectra were acquired on a Cary Eclipse spectrophotometer.
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2

HDL-based Imaging and Characterization

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For CLSM imaging, FITC-labelled HDL was used instead of HDL. The HDL-encapsulated CaCO 3 , HDL-MPs and Au-HDL-MPs were imaged using a Leica SP8-SMD microscope. FITC was excited with l ex,max = 490 nm and emission was collected at l em,max = 525 nm. The laser intensity for HDL-encapsulated CaCO 3 and HDL-MPs was set at 50% and for Au-HDL-MPs at 60%. The images were analyzed using FIJI software.
2.3.5 Atomic force microscopy (AFM). Mica surface discs were freshly cleaved by adhesive tape detachment. A 20 mL droplet of the sample was placed onto a mica sheet surface. After 1 min, a filter paper was used to remove excess fluid. 100 mL of deionized water was used to remove excess, non-stuck particles from the mica surface. The surface was dried using filter paper, under a stream of nitrogen and dried in air overnight. AFM images were recorded on a Bruker Multimode 5 and processed using Nanoscope Analysis 1.5 software.
2.3.6 UV-Vis spectrophotometric measurements. UV-vis measurements of the Au-HDL-MPs were performed using a Hitachi U-2010 UV-visible spectrophotometer at l = 400-800 nm, using deionized water as a reference.
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3

Atomic Force Microscopy of Surface Topography

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The surface geometrical structure was measured using Bruker MultiMode V atomic force microscope (Bruker Corporation, Billerica, MA, USA), operating in the tapping mode and equipped with OTESPA scanning probe with a nominal resonance frequency of 300 kHz and an elasticity constant of 26 N/m. Scans of 10 × 10 µm (512 lines) were performed at two randomly selected locations for each of the samples. The obtained scans of the surface were pre-processed in the NanoScope Analysis software, whereas further processing and analysis were carried out with the use of the MountainsMap Premium 5.0 (Version 5, Digital Surf, Besancon, France). For each surface scan, 512 surface profiles were distinguished, which were used to determine the selected roughness parameters Ra and Rz. The amplitude (A) and wavelength (λ) of the ripples were measured manually. For each modification and scan, four profiles were distinguished, and three measurements of the measured value were made. As the extracted wrinkle wave profiles do not reflect the ideal sin (x) function, the amplitude was calculated from three measurements above and three below the mean line. In summation, the mean amplitude was calculated on the basis of 48 measurements, and the average wavelength was calculated on the basis of 24 measurements for each modification.
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4

Structural Characterization of LSCO Films

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X-ray diffraction was carried out by using X’Pert-PRO MRD (PANalytical). The 2θ − ω scans were measured in the range of 5° to 70° by using 1/4° receiving slit and 1/16° incident slit with an integration time of 1 sec at a step of 0.01°. The RSMs were performed by using with 1/2° receiving slit and 1/8° incident slit. The atomic-resolution cross-sectional scanning TEM images were obtained by Titan Cubed G2 60–300 (FEI) which operated with a double CS-corrector and a monochromator. The TEM specimen of a LSCO film was prepared by using focused ion beam (FIB) (Quanta 3D FEG (FEI)). Pt and carbon layers were deposited on the LSCO film to minimize charging effect during FIB etching process. The lift-off was performed with Ga ion beam. Surface topographic images were measured using a scanning probe microscopy (Bruker Multimode V equipped with a Nanoscope controller V) at an ambient condition.
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5

Optoelectronic Characterization of Quantum Dot LEDs

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The luminescence spectra were measured using an Agilent Cary Eclipse spectrofluorimeter. The absorption spectra were measured using an Agilent Cary 60 UV-Vis spectrophotometer. Transmission electron microscopy (TEM) images were obtained on a JEOL JEM-2100F (JEOL Ltd., Tokyo, Japan) instrument operated at 200 kV acceleration voltage. TEM specimens were prepared by drop-casting a solution of QDs in hexane onto carbon/Formvar-coated 200 mesh copper TEM grids. The voltage–current and voltage–brightness characteristics were measured with a Keithley 2601 SourceMeter 2601 (Keithley Instruments, Inc., Solon, OH, USA), a Keithley 485 picoampermeter (Keithley Instruments, Inc., Solon, OH, USA), and a TKA-04/3 luxmeter–brightness meter (Scientific Instruments “TKA”, St. Petersburg, Russia). The preparation of QDLED samples and measurements of their characteristics were performed at room temperature in an argon atmosphere. The film thicknesses were determined by ellipsometry using an MII-4 interferometer (“LOMO”, St. Petersburg, Russia) and by means of a MultiMode V (Bruker Corporation, Billerica, MA, USA) atomic force microscope.
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6

Atomic Force Microscopy of FI Morphology

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The morphology of FI was investigated using a Multimode-V (Bruker) atomic force microscope (AFM) operated in ScanAsyst mode in air. Briefly, samples were diluted with deionized water to a concentration of 0.2% (w/v) or 0.05% (w/v). 3 μL aliquot of the diluted solution was allowed to spotted onto a freshly cleaved mica surface and then dried in an electronic drying cabinet for 12 h.
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7

Optimizing Fibronectin Coating for Cell Adhesion

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Timing: 2 h

This step verifies that the immobilized fibronectin maintains a high coverage efficiency on the surface, including both the thickness and uniformity.

CRITICAL: Handle all chemicals in a fume hood.

Pause point: This step is optional. However, considering the limited depth of the holes after tight compaction with the stencil, the fibronectin coating thickness, which is closely related to the fibronectin concentration and incubation time, must be optimized. Therefore, characterization of the fibronectin coverage is recommended to verify physisorption to the substrate.

Perform AFM measurements in dry mode using an AFM (Bruker Multimode V, Germany).

Attach the fibronectin-coated PDMS membrane on a glass slide.

Place the prepared glass slide in the AFM sample stage.

Place a probe in the AFM and activate the laser and photodetector.

Use a cantilever with Bruker DNP10 (silicon nitride with elastic coefficient of 0.6N/m).

Scan the boundary of the fibronectin area in the Scanasyst air mode.

Create an AFM image of the surface line by line.

Note: Our results showed that the optimal thickness of the fibronectin layer was approximately about 550 nm (Figure 2E).

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8

Visualization of Primary Cell Wall Structure

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3-d-old dark-grown seedlings were bisected longitudinally and incubated in 2 M KOH at room temperature for 1 h and then in 1% Tween 20 for 30 min. After washing with double-distilled H2O (ddH2O) until pH 7.0 was reached, slices were placed between glass slides, and a load of 5 g was applied for 5 min. The innermost wall layer of primary cell walls was examined by scanning probe atomic force microscope (Bruker MultiMode V with NanoScope V Controller and SCANSYST-AIR probe). Contact AFM was performed in air at room temperature. Images of 2 µm2 size with 512 × 512-pixel resolution were recorded using the software NanoScope Analysis (Version 1.10). At least five areas per cell were scanned, and at least six cells from three samples were analyzed.
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9

Comprehensive Characterization of Thin Films

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The film thickness was measured with a Uvisel Ellipsometer (model LT M200AGMS HORIBA) with a xenon lamp (75 W), and the thickness values were obtained via simulation by employing a Tauc Lorentz dispersion formula. Crystallite structure information was obtained by Grazing Incidence X-Ray Diffraction (GIXRD) using an XPERT-Pro diffractometer with Cu Kα radiation (40 mA and 45 kV). The grazing incidence angle of the X-ray beam was fixed at 0.5°, and the 2-theta scanning angle was varied from 10° to 90°. Morphological analysis was performed with a Scanning Electron Microscope (SEM) model Jeol-JSM 7800 F. Finally, the surface roughness was determined by using an Atomic Force Microscope (AFM) MultiMode V equipped with a minicontroller NanoEscope V (BRUKER, USA). The chemical compositional analysis of the samples was carried out by X-ray Photoelectron Spectroscopy (XPS) using a Thermo Scientific (Waltham, MA, USA) K-Alpha instrument equipped with an Al Kα X-ray source (1486.6 eV) running at a power of 150 W. XPS narrow scans using an X-ray spot size of 400 μm2 were collected using pass energies of 200 and 20 eV for the survey and high-resolution spectra, respectively. XPS core level spectra were analyzed using XPSpeak 4.1 software and fitted using a Gaussian–Lorentzian mix function.
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10

Comprehensive Material Characterization

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The crystal structure of the as-prepared materials was identified by X-ray diffraction (XRD, Bruker D8 diffractometer with monochromatic Cu Kα radiation and wavelength of 1.5406 Å). The composition of the samples was characterized by X-ray fluorescence (XRF). The particle size distribution was measured by laser diffraction (Malvern Mastersizer 2000). The morphology was analyzed by field emission scanning electron microscopy (FEI Quanta 200, Japan) and atomic force microscopy (AFM, Bruker Multimode V, Germany).
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