Ppp nclr

The transistor characterization measurements were carried out in the dark and under ambient conditions using an Agilent 4155 C Semiconductor Parameter Analyzer. AFM and SKPM measurements were taken using an Asylum MFP-3D Bio AFM (Asylum Research, USA) in ambient atmosphere (the identification of commercial equipment or vendor is not intended to imply recommendation or endorsement by NIST, nor is it intended to imply that the materials or equipment identified are necessarily the best available for the purpose). For AFM, a silicon cantilever (Nanosensors PPP-NCLR, force constant: 21–98 N m⁻¹, resonance frequency: 146–236 kHz) was used in tapping mode with a feedback setpoint of 500 mV, and 1 µm × 1 µm images were taken at a rate of 0.5 Hz. SKPM measurements used a silicon cantilever with a Ti/Ir coating (Oxford Instruments ASYELEC.01-R2, force constant: 1.4–5.8 N m⁻¹, resonance frequency: 58–97 kHz) at a nap height of 5 nm, and 20 µm × 20 µm images were taken at a rate of 1 Hz.

The topographical study of the DNA samples and its complexes was conducted with Innova (Bruker, Billerica, MA, USA) atomic force microscope (AFM) in air environment. Immediately after drying process in about 23 °C, each sample prepared on mica substrate was probed in the AFM intermittent contact mode with the PPP-NCLR silicon cantilever (Nanosensors, Neuchatel, Switzerland). The data were collected with up to 1024 px resolution and analyzed using Gwyddion software [58 (link)].

The bioadhesive oral film’s morphology was obtained via atomic force microscopy (AFM). The AFM measurements were registered with an AFM XE-100 (Park Systems Corporate, Suwon, Korea) assisted with flexure-guided, crosstalk eliminated scanners in non-contact mode to minimize the tip–sample interaction. AFM images were registered with sharp tips (PPP-NCLR, from NANOSENSORS™, Neuchatel, Switzerland) having the following characteristics: less than 10 nm radius of curvature, 225 mm mean length, 38 mm mean width, ~48 N/m force constant, and a resonance frequency of 190 kHz. An XEI program (v 1.8.0—Park Systems Corporate, Suwon, Korea) was carried out to process the AFM images and to evaluate the roughness. The surface profile of the scanned samples (the dimensions of the selected particles indicated with red arrows along the selected line) shows the representative line scans presented below the AFM images in the so-called “enhanced contrast” mode.