BCP micelles of PS-b-P2VP [poly(styrene-block-2vinylpyridine), Polymer Source Inc.] were pre-assembled according to the previous report,20 (link) with certain adaptations. Three molecular weights were used for this study Mw/kg mol−1 = 57-b-57 (P57), 109-b-90 (P100), and 440-b-353 (P400) to accommodate pitches ranging from ∼50–250 nm. The polymers were mixed with anhydrous m-xylene at concentrations of 0.3–0.5% w/v by gentle stirring at 75 °C overnight. Subsequently, the solutions were allowed to cool to room temperature (RT), filtered (PTFE 1 μm), and stored at 4 °C.
Ps b p2vp
Manufactured by Polymer Source
Sourced in Canada
PS-b-P2VP is a block copolymer consisting of polystyrene (PS) and poly(2-vinylpyridine) (P2VP) blocks. It is a laboratory-grade material used for research and development purposes.
Automatically generated - may contain errors
Lab products found in correlation
Selectipur, by Merck Group (2 mentions)
Ps b p4vp, by Polymer Source (2 mentions)
Vlsi selectipur, by BASF (2 mentions)
Gpr rectapur, by Avantor (2 mentions)
Pbbr2, by Merck Group (1 mentions)
Zncl2, by Merck Group (1 mentions)
Toluene, by Honeywell (1 mentions)
Chloroauric acid haucl4 h2o, by Merck Group (1 mentions)
Toluene, by Merck Group (1 mentions)
Selectipur, by BASF (1 mentions)
N n dimethylformamide (dmf), by Merck Group (1 mentions)
N methyl pyrrolidone (nmp), by Merck Group (1 mentions)
Glycidyl methacrylate, by Merck Group (1 mentions)
Gptms, by Merck Group (1 mentions)
Ethanol, by Samchun (1 mentions)
Chloroform, by Biosolve (1 mentions)
Reagentplus, by Merck Group (1 mentions)
Mowiol 4 88, by Merck Group (1 mentions)
Mineral oil, by Merck Group (1 mentions)
Ethanol, by Merck Group (1 mentions)
12 protocols using ps b p2vp
1
Micelle Fabrication of PS-b-P2VP Polymers
2
Polystyrene-block-Poly(2-vinylpyridine) Thin Films
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Standard
∼500 μm thick single-sided
polished electronic-grade boron-doped ⟨100⟩ Si wafers
purchased from ITME, Poland, were used as polymer substrates. Cylinder-forming
polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP) with PS majority block and the composition 33.3
kg/mol-b-11.0 kg/mol (PDI = 1.05), 79.0 kg/mol-b-36.5 kg/mol (PDI = 1.05), 135 kg/mol-b-53 kg/mol (PDI = 1.18), 185 kg/mol-b-90 kg/mol
(PDI = 1.10) were obtained from Polymer Source. In correspondence
to the their cylindrical morphology and total molecular weight, they
are abbreviated as C45, C116, C188, and C275, respectively.
∼500 μm thick single-sided
polished electronic-grade boron-doped ⟨100⟩ Si wafers
purchased from ITME, Poland, were used as polymer substrates. Cylinder-forming
polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP) with PS majority block and the composition 33.3
kg/mol-b-11.0 kg/mol (PDI = 1.05), 79.0 kg/mol-b-36.5 kg/mol (PDI = 1.05), 135 kg/mol-b-53 kg/mol (PDI = 1.18), 185 kg/mol-b-90 kg/mol
(PDI = 1.10) were obtained from Polymer Source. In correspondence
to the their cylindrical morphology and total molecular weight, they
are abbreviated as C45, C116, C188, and C275, respectively.
3
Fabrication of PS-b-P2VP Hybrid Materials
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Polystyrene-b-poly(2-vinyl pyridine), PS-b-P2VP, was purchased from Polymer Source. The number average molecular weight is 55 000 g mol−1 for PS and 50 000 g mol−1 for P2VP. The polydispersity index is 1.05. PbBr2, CsBr, and ZnCl2 were purchased from Sigma-Aldrich. ZnI2 was acquired from Alfa Aesar. All solvents and chemicals were used as received.
4
Au Nanoparticles via Reverse Micelle
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Au nanoparticles with regular periodicity (d) and a particle size of 9.0 AE 0.9 nm were prepared using the reverse micelle method. 16 Block-copolymer PS-b-P2VP (Polymer Source Inc.) was dispersed in toluene (Riedel de Haën, 99.5%) at a concentration of 5 mg ml À1 , and stirred for one week to achieve complete dissolution. Subsequently, chloroauric acid (HAuCl 4 $H 2 O, Sigma-Aldrich, 99.999%) was added to the micelle-toluene solution. The metal loading took place in a nitrogen-lled glovebox with relative humidity below 10% to avoid phase separation. This nal solution was stirred for another week and then ltered through a 1 mm (Glass Fibre GF100/25) and 2 mm lter (PTFE O-20/25), both from Macherey Nagel, to remove any polymer aggregates.
5
Polymer-Based Nanoparticle Synthesis
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Poly(styrene-block-4-vinylpyridine)
(PS-b-P4VP, Mn = 58k-b-25.5k, PDI: 1.1), poly(styrene-block-2-vinylpyridine)
(PS-b-P2VP, Mn = 44.0k-b-18.5k, PDI: 1.07), and (homo)polystyrene (hPS, Mn = 12.5k, PDI: 1.04) were purchased from Polymer
Source Inc., Canada. The organic solvents used were N,N-dimethylformamide (DMF, ≥99.8%, AnalaR
NORMAPUR ACS, Reag. Ph. Eur.), tetrahydrofuran (THF, ≥99.8%,
BHT stabilized, EMSURE ACS, Reag. Ph. Eur.), methanol (VLSI Selectipur,
Merck), toluene (Selectipur, Merck), acetone (GPR Rectapur, VWR),
and 2-propanol (IPA, GPR Rectapur, VWR). In the seeded growth procedures
hydrogen tetrachloroaurate (III) trihydrate (HAuCl4 ·
3 H2O, ≥99.99%, ≥49.0% Au basis, ACS reagent,
Alfa Aesar), hydrogen tetrachloroaurate (III) trihydrate (HAuCl4·3H2O, ACS reagent, ≥49.0% Au basis,
Fluka), trisodium citrate dihydrate (Na3C6H5O7·2H2O, ≥99%, Alfa Aesar),
hydrogen peroxide (H2O2, 31% VLSIn Selectipur,
BASF), potassium hydroxide (KOH, 50%, Selectipur, BASF), and deionized
(DI) water were used. Aqua regia was prepared using hydrochloric acid
(HCl, 36% VLSI Sel., BASF) and nitric acid (HNO3, 69% VLSI
Selectipur, BASF). As substrates, 4″ Si(100) wafers (prime
grade, SSP, n-doped, ρ = 1–10 Ω·cm, University
Wafers) were used.
(PS-b-P4VP, Mn = 58k-b-25.5k, PDI: 1.1), poly(styrene-block-2-vinylpyridine)
(PS-b-P2VP, Mn = 44.0k-b-18.5k, PDI: 1.07), and (homo)polystyrene (hPS, Mn = 12.5k, PDI: 1.04) were purchased from Polymer
Source Inc., Canada. The organic solvents used were N,N-dimethylformamide (DMF, ≥99.8%, AnalaR
NORMAPUR ACS, Reag. Ph. Eur.), tetrahydrofuran (THF, ≥99.8%,
BHT stabilized, EMSURE ACS, Reag. Ph. Eur.), methanol (VLSI Selectipur,
Merck), toluene (Selectipur, Merck), acetone (GPR Rectapur, VWR),
and 2-propanol (IPA, GPR Rectapur, VWR). In the seeded growth procedures
hydrogen tetrachloroaurate (III) trihydrate (HAuCl4 ·
3 H2O, ≥99.99%, ≥49.0% Au basis, ACS reagent,
Alfa Aesar), hydrogen tetrachloroaurate (III) trihydrate (HAuCl4·3H2O, ACS reagent, ≥49.0% Au basis,
Fluka), trisodium citrate dihydrate (Na3C6H5O7·2H2O, ≥99%, Alfa Aesar),
hydrogen peroxide (H2O2, 31% VLSIn Selectipur,
BASF), potassium hydroxide (KOH, 50%, Selectipur, BASF), and deionized
(DI) water were used. Aqua regia was prepared using hydrochloric acid
(HCl, 36% VLSI Sel., BASF) and nitric acid (HNO3, 69% VLSI
Selectipur, BASF). As substrates, 4″ Si(100) wafers (prime
grade, SSP, n-doped, ρ = 1–10 Ω·cm, University
Wafers) were used.
6
Diblock Copolymer Surface Modification
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PS-b-P4VP (number-average molecular weights MnPS = 233 kg/mol and MnP4VP = 133 kg/mol; dispersity Mw/Mn, 1.13; domain spacing, 90.93 nm) and PS-b-P2VP (number-average molecular weights MnPS = 440 kg/mol and MnP2VP = 353 kg/mol; dispersity Mw/Mn, 1.19) diblock copolymers were purchased from Polymer Source and were used without further purification. GPTMS (98%, Sigma-Aldrich) and glycidyl methacrylate (97%, Sigma-Aldrich) were used as surface energy–modifying agents. NMP (99%, Sigma-Aldrich) and DMF (anhydrous, Sigma-Aldrich) were used to dissolve the BCPs, and ethanol (99.9%, Samchun Pure Chemical Co. Ltd.) was used as the nonsolvent.
7
Block Copolymer Thin Film Fabrication
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PS-b-P2VP was purchased from Polymer Source, Inc. and used as received: P5742-S2VP, Mn (PS) = 133 kg mol−1, Mn (P2VP) = 132 kg mol−1, Mw/Mn = 1.15. Toluene Biosolve Chemicals (Biosolve BV, Valkenswaard, The Netherlands), >99.7%) and chloroform (Biosolve Chemicals, >99.9%) were used as received Silicon substrates (Prime CZ-Si wafer, thickness = 625 ± 20 μm, (100), 1-sidepolished, p-type (Boron) TTV < 10 μm, 15–25 Ohm) were supplied by Micro Chemicals GmbH, Ulm, Germany.
8
Polymer Thin Film Fabrication
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The PS-b-P2VP, with Mn (PS) = 102.0 kg mol−1 and Mn (P2VP) = 97.0 kg mol−1, was purchased from Polymer Source Inc. and used as received. Acid tetrachloroauric (HAuCl4) (99.999% trace metals basis) and propylene glycol monomethyl ether acetate (PGMEA) (Reagent Plus, ≥99.5%) were purchased from Sigma-Aldrich and Merck respectively, and used without further purification. (100) silicon wafers were purchased from Si-Mat silicon materials and cut to appropriate dimensions (approximately 1 × 1 cm2). Silicon substrates were chemically modified by spin coating (2000 rpm) a 1.5 wt% solution of a polystyrene-stat-poly(methyl methacrylate) (PS-stat-PMMA) copolymer (ϕPS = 0.63) in PGMEA with a subsequent annealing at 240 °C for 10 minutes to promote the grafting, then rinsed several times with pure PGMEA to remove the non-grafted chains and dried under N2 flow. 100 nm thick silicon nitride membranes prepared for TEM studies were purchased from Agar Scientific.
9
Seed-Mediated Gold Nanoparticle Growth
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Poly(styrene-block-2-vinylpyridine) (PS-b-P2VP, Mn = 44.0-b-18.5 kg·mol–1, PDI = 1.07) and homopolystyrene (hPS, Mn = 12.5 kg·mol–1, PDI = 1.04) were purchased from Polymer Source Inc., Canada. PS-b-P2VP and hPS were dissolved in toluene
(Selectipur, Merck), while acetone (GPR Rectapur, VWR) and 2-propanol
(IPA, GPR Rectapur, VWR) were used for sample cleaning. Hydrogen tetrachloroaurate(III)
trihydrate (HAuCl4 · 3H2O, ACS reagent,
≥49.0% Au basis, Fluka), trisodium citrate dihydrate (Na3C6H5O7 · 2H2O, ≥99%, Alfa Aesar), hydrogen peroxide (H2O2, 31%, VLSI Selectipur, BASF), PVA (Mw∼31 kg·mol–1, Mowiol 4-88, Sigma-Aldrich),
deionized (DI) water, and Si(100) substrates (SSP, n++)
were used in various seeded growth procedures. Aqua regia was prepared
using hydrochloric acid (HCl, 36% VLSI Sel., BASF) and nitric acid
(HNO3, 69% VLSI Selectipur, BASF).
(Selectipur, Merck), while acetone (GPR Rectapur, VWR) and 2-propanol
(IPA, GPR Rectapur, VWR) were used for sample cleaning. Hydrogen tetrachloroaurate(III)
trihydrate (HAuCl4 · 3H2O, ACS reagent,
≥49.0% Au basis, Fluka), trisodium citrate dihydrate (Na3C6H5O7 · 2H2O, ≥99%, Alfa Aesar), hydrogen peroxide (H2O2, 31%, VLSI Selectipur, BASF), PVA (Mw∼31 kg·mol–1, Mowiol 4-88, Sigma-Aldrich),
deionized (DI) water, and Si(100) substrates (SSP, n++)
were used in various seeded growth procedures. Aqua regia was prepared
using hydrochloric acid (HCl, 36% VLSI Sel., BASF) and nitric acid
(HNO3, 69% VLSI Selectipur, BASF).
10
Synthesis and Characterization of PS-b-P2VP
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PS-b-P2VP (Mn(PS)=101,000 g mol−1; Mn(P2VP)=29,000 g mol−1; Mw/Mn (PS-b-P2VP)=1.60) was obtained from Polymer Source Inc., Canada and used as received. Mineral oil, tetrahydrofuran and ethanol were purchased from Sigma-Aldrich.
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