The Ag/Ag2S/CdS heterostructures were characterized using various techniques such as X-ray diffraction (XRD) with a Bruker D2 phaser system (Billerica, MA, USA), field-emission scanning electron microscopy (FESEM) with a JEOL JSM 6700F microscope (Tokyo, Japan), field-emission transmission electron microscopy (FETEM) with a JEOL 2100F microscope (Tokyo, Japan), X-ray photoelectron spectroscopy (XPS) with a ULVAC-PHI PHI 5000 Versaprobe II system (Chigasaki, Japan), photoluminescence spectroscopy (PL) with an MRI532S instrument from Protrustech (Tainan, Taiwan), and UV–vis spectrophotometry with a U-2900 instrument from Hitachi (Tokyo, Japan). These techniques were employed to study the crystal structure, morphology, microstructures, chemical composition, and optical properties of the Ag/Ag2S/CdS heterostructures.
D2 phaser system
Manufactured by Bruker
Sourced in United States
The D2 phaser system is a compact and versatile X-ray diffractometer (XRD) designed for routine phase analysis and material characterization. It provides accurate and reliable phase identification and quantification of crystalline materials. The system features a sealed X-ray tube, a goniometer, and a detector, allowing for efficient data collection and analysis.
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Lab products found in correlation
5 protocols using d2 phaser system
1
Characterization of Ag/Ag2S/CdS Heterostructures
2
Characterization of PEDOT Solar Cells
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The thickness of the PEDOT film was measured by ellipsometry (Woollam
Vase). The current–density–voltage characteristics (J–V curves) were measured with a
Keithley 2420 source unit in the dark and under AM1.5 G solar simulation
(xenon arc lamp with a spectral-mismatch factor of 0.988) with a scan
rate of 50 mV/s. The light intensity was measured using a calibrated
Si reference cell (NREL) with KG5 filter. EQE measurements were performed
by using a monochromater to select wavelengths from a QTH lamp. The
intensity at each wavelength was calibrated with a Si detector using
a chopper and lock-in amplifier. A Bruker D2 phaser system was used
to collected XRD data (Cu Kα, 0.154 nm). Impedance measurements
were collected with an impedance analyzer (μAutolabIII FRA2)
in the frequency range from 105 to 0.01 Hz in logarithmic
steps (dark, 0.6 V forward bias). All the device and structural measurements
were collected on un-encapsulated devices/samples in air. SEM images
were collected using a field-emission SEM (Carl Zeiss Auriga Dual
Column FIB SEM).
Vase). The current–density–voltage characteristics (J–V curves) were measured with a
Keithley 2420 source unit in the dark and under AM1.5 G solar simulation
(xenon arc lamp with a spectral-mismatch factor of 0.988) with a scan
rate of 50 mV/s. The light intensity was measured using a calibrated
Si reference cell (NREL) with KG5 filter. EQE measurements were performed
by using a monochromater to select wavelengths from a QTH lamp. The
intensity at each wavelength was calibrated with a Si detector using
a chopper and lock-in amplifier. A Bruker D2 phaser system was used
to collected XRD data (Cu Kα, 0.154 nm). Impedance measurements
were collected with an impedance analyzer (μAutolabIII FRA2)
in the frequency range from 105 to 0.01 Hz in logarithmic
steps (dark, 0.6 V forward bias). All the device and structural measurements
were collected on un-encapsulated devices/samples in air. SEM images
were collected using a field-emission SEM (Carl Zeiss Auriga Dual
Column FIB SEM).
3
Comprehensive Structural Characterization of MOF Films
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Crystallinity was evaluated
using X-ray diffraction (XRD) with a Bruker D2 PHASER system set in
traditional Bragg–Brentano geometry using Cu Kα radiation.
The morphology and phase assemblage were characterized using a Zeiss
GeminiSEM scanning electron microscope operating with an accelerating
voltage of 3 kV and a working distance of 5.8 mm. A layer of Au–Pd
was sputtered onto samples to minimize the effects of sample charging.
Energy-dispersive X-ray spectroscopy (EDS) was performed during scanning
electron microscopy (SEM) analysis, using an accelerating voltage
of 10 kV and working distance of 10.9 mm and a Bruker XFlash 6 | 60
EDS detector.
The MOF films were removed from the IDE and loaded
into polyimide capillaries for synchrotron-based structure analysis.
High-energy X-ray scattering data suitable for PDF and diffraction
analysis were collected at beamline 11-ID-B of the Advanced Photon
Source at Argonne National Laboratory using an X-ray wavelength of
0.2113 Å. Two dimensional X-ray scattering images were calibrated
and reduced to one-dimensional diffraction patterns using GSAS-II.
X-ray PDFs were obtained within the xPDFsuite.
using X-ray diffraction (XRD) with a Bruker D2 PHASER system set in
traditional Bragg–Brentano geometry using Cu Kα radiation.
The morphology and phase assemblage were characterized using a Zeiss
GeminiSEM scanning electron microscope operating with an accelerating
voltage of 3 kV and a working distance of 5.8 mm. A layer of Au–Pd
was sputtered onto samples to minimize the effects of sample charging.
Energy-dispersive X-ray spectroscopy (EDS) was performed during scanning
electron microscopy (SEM) analysis, using an accelerating voltage
of 10 kV and working distance of 10.9 mm and a Bruker XFlash 6 | 60
EDS detector.
The MOF films were removed from the IDE and loaded
into polyimide capillaries for synchrotron-based structure analysis.
High-energy X-ray scattering data suitable for PDF and diffraction
analysis were collected at beamline 11-ID-B of the Advanced Photon
Source at Argonne National Laboratory using an X-ray wavelength of
0.2113 Å. Two dimensional X-ray scattering images were calibrated
and reduced to one-dimensional diffraction patterns using GSAS-II.
X-ray PDFs were obtained within the xPDFsuite.
4
Comprehensive Characterization of Nanoparticle Phases
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The phase components of the nanoparticles were characterized by X-ray diffraction (XRD). It was performed by a Bruker D2Phaser system with Cu-Kα radiation (λ = 1.5405 Å) in Bragg–Brentano configuration using a LynxEye detector. Refractive indices and extinction coefficients of the materials were measured by ellipsometry (VASE ellipsometer, J.A. Woollam). Scanning electron microscope cross-section images were obtained by SUPRA 55 (Carl Zeiss) at 2 kV. Focused ion beam (Zeiss Crossbeam 1540 EsB) was used for milling the sample to enable SEM image acquirement. Transmittance and reflectance were measured with a spectrophotometer (Lambda 1050 UV–vis–NIR, PerkinElmer) equipped with an integrating sphere. The transmittance was obtained with the normal incident angle, and the reflectance was obtained with an 8° incident angle. The surface morphology was measured by atomic force microscope (AFM) (NanoWizard, Bruker Nano), and the surface RMS roughness was analyzed with the software Gwyddion.
5
XRD Analysis of ITO/2PACz/FAPbI3 Layer
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XRD was performed on the layer stack of ITO/2PACz/FAPbI3 using a Bruker D2Phaser system with Cu-Kα radiation (λ = 1.5405 Å) in Bragg–Brentano configuration using a LynxEye detector.
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