Fluorine doped tin oxide coated glass slide

For the elaboration of the multilayer structure, FTO glass substrates of 3 mm thickness with a commercial transparent conductive oxide (SnO₂: F) coating (SIGMA ALDRICH Fluorine doped tin oxide coated glass slide 50 mm × 3 mm) were used. At first, a CdS thin film is deposited by chemical bath deposition followed by a MnS thin film deposited by the SILAR method, while the temperature was varied in the range from room temperature to 80 °C at atmospheric pressure. During CdS thin films deposition, the adsorption and reaction times were evaluated from preliminary experiments, so that a layer deposition occurred and resulted in a homogeneous thin film structure. It is worth mentioning that six samples of MnS were made under identical conditions for the diode device with a final CdS layer to ensure reproducibility. Typical layered assemblies are shown in Fig. 2. Electrical contacts of Graphite paint (SPI-Chem) were placed on MnS thin was used for with an area of 0.5 cm².Fig. 2

Samples for the device with FTO/CdS/MnS, the device configuration is superstrate and the incident light strikes the glass surface with semitransparent contact.

Fig. 2

Poly(ethyleneglycol)-block-poly (propyleneglycol)-block-poly (ethyleneglycol) (average M_n ∼5800), polyvinylidene fluoride (M_n ∼275 000), thiophosgene, 4,4′-oxydianiline, propylene carbonate, ethylene carbonate, isothiocyanates, and a fluorine-doped tin oxide-coated glass slide (L × W × D: 100 mm × 100 mm × 2.3 mm) with a surface resistivity of ∼7 Ω sq.⁻¹ were purchased from Sigma Aldrich. Methanol (anhydrous) was purchased from Merck. Triethylamine, sodium bicarbonate, and dichloromethane were purchased from AVRA synthesis Pvt. Ltd. Ruthenizer 535-bisTBA, Test cell kits and opaque adhesive stickers were purchased from Solaronix, SA, Switzerland.