Multimode afm system

Manufactured by Bruker

The MultiMode AFM system is an atomic force microscope (AFM) designed for high-resolution surface imaging and analysis. It features a robust and versatile design that enables a wide range of advanced imaging and measurement capabilities. The system utilizes a cantilever-based probe to scan the surface of a sample, allowing for the acquisition of topographical and other surface-related data at the nanoscale level.

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Lab products found in correlation

Jsm it300 scanning electron microscope, by JEOL (1 mentions) Pm100d, by Thorlabs (1 mentions) Cary 660 ftir, by Agilent Technologies (1 mentions) Alpha 300r, by WITec (1 mentions) Dektak xt, by Bruker (1 mentions) Jem 2100 transmission electron microscope, by JEOL (1 mentions)

2 protocols using multimode afm system

Controlled Temperature DNA Deposition

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This procedure is recommended if the deposition should be performed at strictly controlled temperature conditions (e.g., 0 °C or elevated temperatures).

Prepare the solution (DNA, RNA, nucleoprotein complexes) in an appropriate tube and preincubate it for 10–20 min to allow the temperature to equilibrate. The recommended concentration of DNA is between 0.8 and 0.01 μg/mL, depending on the DNA size (see Subheading 3.3.1, step 1). (See also ^{Notes 6} and ⁷). Immerse a piece of functionalized mica into the tube and leave it for a defined time (2–10 min) to allow the sample to adhere to the surface.

Remove the mica strip, rinse with water thoroughly, and dry under argon flow as described above. The sample is then ready for imaging; however, it is recommended that the specimen be stored in a vacuum cabinet under argon for an hour to allow optimum sample drying.

Two AFM microscopes, the MultiMode AFM system (Bruker Nano/Veeco, Santa Barbara, CA) and the MFP3 (Asylum Research, Santa Barbara, CA), were our primary instruments. However, the procedures described below are general and can be adapted with minimal adjustments to any AFM instrument (see^{Note 8}).

Lyubchenko Y.L., Gall A.A, & Shlyakhtenko L.S. (2014). Visualization of DNA and Protein-DNA Complexes with Atomic Force Microscopy. Methods in molecular biology (Clifton, N.J.), 1117, 367-384.

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Characterization of Graphene Oxide Thin Films

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The thickness of the thin film is monitored by profilometer (Bruker DektakXT) which is ~300 nm. Both the AFM and Raman studies are conducted on the same GO thin film, homogeneously distributed on the Si substrate. A Raman spectrometer system (Witec alpha 300 R) is used to irradiate the GO film with focused laser coming from 100X objective of a confocal microscope. An Nd:YAG continuous laser of 532 nm wavelength is used to irradiate the GO surface with varying laser power. Real time Raman signals are recorded which is discussed in detail in the manuscript. Surface deformation of the GO films is investigated by Bruker Multimode AFM system in ‘tapping mode’ which reveals in-depth information about the shape and size of the deformed surface of GO films, showing the dependence on the irradiated laser power. Laser irradiations on the GO films as well as all characterizations are conducted in an ambient environment. Laser power is calibrated with the micro-meter scale, present in the laser source, using Thorlabs optical power meter (PM100D). The calibrated laser power with the micro screw is shown in Fig. S1. The morphology of the GO sample was characterized by JEOL JSM-IT300 scanning electron microscope and JEOL JEM2100 transmission electron microscope. FTIR spectroscope (Agilent Cary 660 FTIR) was used to characterize the functionalization of the GO surface.

Kundu A., Rani R, & Hazra K.S. (2017). Graphene Oxide Demonstrates Experimental Confirmation of Abraham Pressure on Solid Surface. Scientific Reports, 7, 42538.

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