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Xrd system

Manufactured by Rigaku

The XRD system is a laboratory instrument used for the analysis of crystalline materials. It operates by directing a beam of X-rays onto a sample and measuring the pattern of the diffracted X-rays. The resulting data can be used to identify the atomic and molecular structure of the material being analyzed.

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4 protocols using xrd system

1

Thin Film Deposition and Characterization of Ex-DPP Molecules

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The studied Ex-DPP molecules, Ex-DPP1 and Ex-DPP2, were synthesized according to the previously reported routes.36 (link) All reagents and solvents of the best grade available were purchased from commercial suppliers and used without further purification. Thin films were prepared by the vapor deposition method on a sapphire substrate at a rate of 0.2–0.3 Å s−1 under a vacuum of 1 × 105 mbar. X-ray diffraction (XRD) was carried out in the reflection mode at room temperature using a 2 kW Rigaku XRD system. Grazing incidence wide-angle X-ray scattering (GIWAXS) measurements were performed on a Xeuss 3.0 SAXS/WAXS system using a Cu X-ray source (1.542 Å) with incidence angles of 0.18° at the Vacuum Interconnected Nanotech Workstation (Nano-X).
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2

Comprehensive Materials Characterization Protocol

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The structural morphology and the in-detail inter-stacked structure of the samples was examined by FE-SEM (JSM 6701F, JEOL) and TEM (FEI Tecnai G2, PHILIPS). Atomic force microscopy (AFM) images were obtained using MFP3D microscope (Asylum Research). For the preparation of TEM and AFM samples, the powder sample was sonicated in ethanol for 5 min and the suspension was dropped on a Cu grid for TEM and on the freshly carved mica for AFM sample. The crystal structures of the materials were determined by a Rigaku XRD system equipped with Cu K α radiation (λ = 0.15406 nm). Pore structure of the samples was characterized by physical adsorption of N2 at 77 K using a BELSORP-max nitrogen adsorption apparatus (Japan Inc.). The specific surface area was calculated with Brunauer-Emmett-Teller (BET) method from the N2 adsorption isotherm. The electrical conductivity of the samples was measured using the four-point probe method (Keithley 2400) using pelletized samples.
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3

Characterization of Multilayer Samples

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Structural properties of the samples were characterized using a Rigaku XRD system with Cu Kα radiation. XPS was performed on PHI Quantera II XPS Scanning Microprobe from Ulvac-PHI with a beam spot size of 50 μm. In addition, high-resolution scanning transmission electron microscopy (STEM, a JEOL ARM200F) was employed to directly image the multilayer samples. Magnetic properties were characterized using a quantum design vibrating sample magnetometer (VSM) with the samples cut into a size of 4 mm × 3 mm. The resolution of the system is better than 6 × 10−7 emu. The electrical measurements were also performed using the same Quantum Design system at a bias current of 100 μA.
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4

Characterization of Mn-doped Hollow Mesoporous Silica Nanoparticles

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TEM images were obtained using a JEOL 1400-PLUS with 60 kV field emission. Nitrogen adsorption-desorption isotherms, surface areas, and pore size were measured at 77.3 K using a Quantachrome NovaWin2 system and determined by the BET (Brunauer–Emmett–Teller) method. Size and surface zeta potential analysis was performed using a Nano-ZS90 Zetasizer (Malvern Instruments Ltd.). The Mn content in MnOx@HMSN and the release of Mn ions were measured by Perkin-Elmer Nexion 2000 Inductively-coupled plasma mass spectrometry (ICP-MS). The percentages of Mn2+/3+/4+ were measured by using a Rigaku XRD system. UV–vis spectra were recorded on Agilent Cary 60 spectrophotometer.
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