X-ray diffraction (XRD) analysis was performed using an X-ray diffractometer (Rigaku, Japan). The analyses were performed in the scanning range of 2θ = 10–60° and at a scanning speed of 2.0° min−1. Electron microscopes were used to carry out the morphological studies. A high-resolution transmission electron microscope (HRTEM JEOL, JEMCXII, Japan) was used to visualize the physical attributes of nanocomposites and their components at an operating voltage of 200 kV after coating the sample on a carbon-coated copper grid with 400 mesh (Ted-Pella Inc.). A Thermo Fisher Scientific (UK) ESCALAB Xi+ X-ray photoelectron spectrometer (XPS) was used in the study of the elemental state of the nanoparticles.
400 mesh
Manufactured by Ted Pella
Sourced in United States
400 mesh is a type of laboratory screen or sieve used for particle size analysis and separation. It has a mesh size of 400 openings per square inch, with each opening measuring approximately 37 micrometers in diameter. This product is primarily used for precise particle size fractionation and filtration applications in various scientific and industrial settings.
Automatically generated - may contain errors
Lab products found in correlation
Cu rh grid, by Ted Pella (2 mentions)
Oneview digital camera, by Ametek (2 mentions)
Jemcxii, by JEOL (1 mentions)
Escalab xi x ray photoelectron spectrometer xps, by Thermo Fisher Scientific (1 mentions)
X ray diffractometer, by Rigaku (1 mentions)
Neoarm, by JEOL (1 mentions)
Tem grid, by Ted Pella (1 mentions)
Ethanol solution, by Thermo Fisher Scientific (1 mentions)
Lacey carbon grid, by Ted Pella (1 mentions)
Jem 2100f tem, by JEOL (1 mentions)
Zetasizer ultra, by Malvern Panalytical (1 mentions)
Uranyl acetate, by Polysciences (1 mentions)
Talos l120c, by Ametek (1 mentions)
Talos 120c, by Thermo Fisher Scientific (1 mentions)
7 protocols using 400 mesh
1
Characterization of Nanocomposites via XRD, TEM, and XPS
2
Amylin Analog Aggregation Inhibition
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Samples containing 80 μM concentrations of WT-amylin and the three analogs were incubated without agitation at a temperature of 37°C in 20 mM phosphate buffer (pH 7.4). For the inhibition reactions, samples contained WT-amylin at an 80 μM concentration, together with 160 μM of Arg-1, Arg-2, or Mem-T analogs. Aliquots from the reactions were removed after 2 days for TEM imaging. The aliquots were blotted onto carbon-coated 400-mesh Maxtaform copper grids (Ted Pella Inc. Redding, CA) for 1–3 min, followed by negative staining with 1% uranyl acetate. TEM images were recorded on an FEI Tecnai G2 Spirit BioTwin transmission electron microscope equipped with an AMT XR-40 camera.
3
Electron microscopy analysis of nanostructures
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Sample solutions were drop cast on a continuous carbon-coated copper grids with 400 mesh (Ted Pella). The grids were then dried with filter paper and sealed away from moisture before experiments. JEOL NEOARM was operated at 80 kV in low beam conditions. A spot size of 5 and low screen brightness was combined to perform TEM studies with minimum radiation damage from the electron beam. Image J was used to extract plot profiles from the TEM images and make measurements on domain sizes. Ten measurements were performed for each sample.
4
Cu Thin Film Deposition on SiO2
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SiO2 and Cu substrates
with native oxides were prepared by Intel Co. Electron-beam evaporation
was performed to deposit 7.7 ± 0.1 nm thick Cu films onto SiO2 substrates. For patterning, 400 mesh TEM grids (Ted Pella,
Inc., USA) were used as deposition masks. Cu was evaporated in a vacuum
with a base pressure below 4 × 10–6 Torr (Scheme S1 ). All substrates were precleaned by
0.5 wt % potassium hydroxide (KOH) solution at room temperature for
5 min and then sonicated by 70% ethanol solution (Fisher Scientific,
USA) and DI water for 10 min.
with native oxides were prepared by Intel Co. Electron-beam evaporation
was performed to deposit 7.7 ± 0.1 nm thick Cu films onto SiO2 substrates. For patterning, 400 mesh TEM grids (Ted Pella,
Inc., USA) were used as deposition masks. Cu was evaporated in a vacuum
with a base pressure below 4 × 10–6 Torr (
0.5 wt % potassium hydroxide (KOH) solution at room temperature for
5 min and then sonicated by 70% ethanol solution (Fisher Scientific,
USA) and DI water for 10 min.
5
Characterization of Polyacrylic Acid Micelles
6
Transmission Electron Microscopy of EVs
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A 5 μL suspension of EVs in 2% formaldehyde in PBS was added onto a carbon coated 400 mesh Cu/Rh grid (Ted Pella Inc., Redding, CA) and stained with 1% uranyl acetate (Polysciences, Inc, Warrington, PA) in ddH2O. Stained grids were examined with a Thermo Fisher Talos L120C transmission electron microscope and photographed with a Gatan OneView digital camera.
7
Transmission Electron Microscopy Imaging
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Place 3 µL of sample onto carbon coated 400 mesh Cu/Rh grid (Ted Pella Inc, Redding, CA) and stain with 1% uranyl acetate in distill water (polysciences, Inc, Warrington, PA). Stained grids were examined under FEI Talos120C transmission electron microscope and photographed with a Gatan OneView digital camera.
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