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40 protocols using nanoscope iiia

1

Atomic Force Microscopy of Microvesicles

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The topography corresponding to MVs was obtained by atomic force microscopy (AFM) analysis. It was performed under tapping mode AFM (Nanoscope IIIa, Veeco, United States) applying special TM AFM tips (model RTESP-300 Bruker) with nominal radius of curvature 10 nm. A typical force constant of 21.84 N/m, and resonant frequency of 250 kHz was applied. MVs from L. casei BL23 and B. subtilis 168 were seeded onto cleaved glass. The surfaces were dried under a sterile air-flow cabinet for 30 min at room temperature. Both topography and shaded topography images were recorded using NanoScope software. Topography images were processed with Gwyddion software (Czech Metrology Institute) and NanoScope Analysis (Veeco) software (Abuin et al., 2010 (link)).
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2

Multimodal Spectroscopic Characterization

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Fourier-transform Infrared (FT-IR) spectra (KBr) were recorded on a Perkin Elmer 2000 spectrometer. Atomic force microscopy (AFM) images were obtained with a Nanoscope IIIa, VEECO Instruments. X-ray photoemission spectroscopy (XPS) spectra were measured on a SPECS Sage HR 100 spectrometer.
UV–Vis spectra were recorded on a PerkinElmer Lambda 35 UV–Vis spectrophotometer. Fluorescence spectra were recorded on a Varian Cary Eclipse fluorescence spectrophotometer. Time-resolved and differential fluorescence set-ups are detailed in the Supplementary Methods (and Supplementary Figure 13). Fluorescence time decay curve was fitted according to Supplementary Equation 1. ECD spectra were recorded using Jasco J-810. Resonance light scattering (RLS) measurements were acquired using a spectrophotometer FL11 Jobin Yvon Horiba. Vibrational circular dichroism (VCD) spectra were recorded on a Bruker PMA 50 accessory coupled to a Tensor 27 Fourier transform infrared spectrometer.
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3

Characterization of Cur-CTPP-PEG-PCL Micelles

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Marvin Nano ZS90 (Malvern, UK) was used to measure the particle size and zeta potential of Cur–CTPP–PEG–PCL micelles at a constant scattering angle of 90°. Atomic Force Microscopy (AFM) was used to observe the morphology of micelles. The samples in aqueous buffer were dispersed onto the surface of mica, dried with compressed air for 24 h. Then, samples were fulfilled by means of the tapping mode using an atomic force microscopy (Nano Scope IIIa, Veeco, USA).
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4

Characterization of Titanium Surface Topographies

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A total of 105 titanium disks, directly provided by the manufacturer (MEGAGEN Co. Ltd., South Korea), measuring 8 and 13 mm in diameter and 3 mm in thickness were used in this study. Three different titanium surfaces were investigated: machined (MCH), sandblasted with resorbable blasting medium (RBM), and sandblasted with a Ca++-incorporated nanolayer (NCA). The treatment processes are hold by the manufacturer. Surface morphology was qualitatively evaluated using a scanning electron microscope (EVO MA 10, Carl Zeiss, Oberkochen, DE) working at 25 keV. At the same time, surface chemistry was analyzed by using an energy dispersive X-ray spectrometer (EDX). Furthermore, surface roughness was assessed using an atomic force microscope (Nanoscope IIIa, Veeco, Plainview, USA); then, roughness average (Ra) and roughness peak-to-valley (Rpv) parameters were obtained. Ra measures the average surface roughness considering the peaks and the valley means. The Rpv describes the maximum observed range in a sample area, and it is given by the distance between the highest peak and the lowest valley on a measured surface.
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5

Imaging MPG1 on HOPG Surface

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A small volume (20 μL) of MPG1 solution in water (5 μg/mL) was placed onto a freshly cleaved HOPG surface and allowed to dry overnight at room temperature free from dust. The sample was then imaged using a Veeco Nanoscope IIIa (Veeco, USA) operating in tapping mode under ambient conditions. A silicon cantilever (BudgetSensors, Innovative Solutions Bulgaria) with a free resonance frequency of 300 kHz, spring constant of ~40 N/m and tip radius under 10 nm was used for sample imaging.
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6

Surface Wettability and Topography Analysis

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Contact angle (CA) measurements were executed in static sessile drop mode with an OCA20 device (Dataphysics Instruments GmbH, Filderstadt, Germany). A 10µL volume of deionized water was placed on polymer-modified Si wafers at a flow rate of 1 µL/s. Five drops were applied on each sample. Temperature-dependent measurements were performed either at room temperature (23 °C) or at 40° C with tempering time of 15min, respectively.
Atomic force microscopy (AFM) was performed in tapping mode with Nanoscope IIIa, Dimension 3100 (Veeco, Plainview, NY, USA). Operation in air was used to control homogeneity and roughness of the surfaces after preparation and after pre-treatment at different pH. Tips of the type BSTap (Budget Sensors, Sofia, Bulgaria) with a resonance frequency of 300 kHz and a spring constant of 40 N/m were used.
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7

Characterization of ITO Thin Films for QDSCs

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X-ray diffraction patterns (XRD) of the prepared samples were recorded with a Bruker D8 advance X-ray diffractometer using graphite monochromatized Cu Kα (λ = 1.5405 Å) radiation with a step of 0.02° in 2θ ranging from 10° to 80° (4° min−1). Scanning electron microscopy (SEM) images were taken with an FEI Nova NanoSEM200 microscope. Atomic force microscope (AFM) images were taken using a Veeco NanoscopeIIIa microscope. Resistivities of the ITO films were measured with a Lucas Labs PRO4-EEON with an ASTM F84 in line four-point probe configuration. A Keithley 2400 digital source meter (Keithley, USA) was used to measure the photocurrent density–photovoltage curves (JV) of the QDSCs under AM 1.5G illumination (100 mW cm−2) with an Oriel Sol 3A Solar Simulator (94023A, Newport Stratford Inc., USA), calibrated with a standard crystalline silicon solar cell. A solar cell quantum efficiency measurement system (QEX10, PV Measurements, Inc.) was adopted to record incident photon-to-current conversion efficiency (IPCE) curves, and was calibrated with an NREL-certified Si diode before measurement.
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8

High-resolution Imaging of Lipid Bilayers

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High-resolution imaging of bilayers was obtained by AFM after transferring them from the air/water interface to a solid oxidized silicon substrate. Mixed bilayers from the Langmuir trough were transferred onto oxidized silicon substrates at the desired Wilhelmy pressure. Bilayers transferred to substrates were imaged using the NanoScopeIIIa scanning probe microscope controller (Veeco Instruments Inc., Plainview, NY, USA) in tapping mode under ambient conditions. Aluminum probes (Budget Sensors BS Multi 75Al, Innovative Solutions Bulgaria Ltd., Sofia, Bulgaria) were used. Resonance frequency of the probe was 75 kHz, and the force constant was 3 N m-1. Images in height mode were collected simultaneously with 256 × 256 points at a scanning rate of 1.0 Hz per line. A series of AFM images were taken from different perspectives.
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9

Comprehensive Characterization of Ag Thin Films

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UV-visible absorption spectra of pristine samples were recorded using a dual beam spectrophotometer (Hitachi U3300). To investigate the surface morphology, plane-view images were obtained using field emission scanning electron microscope (FESEM, MIRA II LMH). Energy dispersive X-ray spectroscopy (EDX) was employed using energy dispersive X-ray detector (INCA PentaFET3) attached with FESEM. Atomic force microscope (AFM, Veeco: Nano Scope IIIa) with SiN tips (nominal tip radius of <10 nm) was used to investigate the grown nanostructures under ambient conditions. In IR region (400–4000 cm−1), spectroscopic measurements of the pristine and irradiated Ag thin films were carried out using the Fourier transform infrared spectrophotometer (FTIR, PERKIN ELMER Bx). The Rutherford backscattering spectroscopy (RBS) was performed using 1.7 MV 5SDH-2 Pelletron (Tandem) accelerator with 2 MeV He+ ion beam.
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10

Atomic Force Microscopy Sample Preparation

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The 30 μL of each sample (0.4 μmol/L) in an aqueous buffer was dispersed onto the surface of mica, and then dried with compressed air for 24 h. Then, samples were fulfilled by means of the tapping mode using the atomic force microscopy (Nano Scope IIIa, Veeco, USA).
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