Two-photon absorption polymerization was induced by a focused laser beam from a 780 nm femtosecond laser in a commercial DLW workstation (Photonic Professional, Nanoscribe GmbH, Eggenstein-Leopoldshafen, Germany). We used a pulsed erbium doped femtosecond (120 fs) fiber laser source at a center wavelength of 780 nm with a repetition rate of 100 MHz integrated in a commercial system Nanoscribe GmbH (Nanoscribe Photonic Professional). The laser beam was tightly focused through an immersion oil objective (Plan Apocromat, NA 1.3, Carl Zeiss, Oberkochen, Germany) into a cell.
Photonic professional
Manufactured by Nanoscribe
Sourced in Germany
The Photonic Professional is a high-precision 3D printing system developed by Nanoscribe. It utilizes two-photon polymerization technology to fabricate micro- and nanostructures with extremely high resolution and accuracy. The core function of the Photonic Professional is to enable the creation of complex 3D structures at the micro- and nanoscale.
Automatically generated - may contain errors
Lab products found in correlation
Immersol 518f, by Zeiss (2 mentions)
1.4 numerical aperture oil immersion objective, by Zeiss (2 mentions)
Jeffamine d230, by Merck Group (2 mentions)
Sylgard 184, by Dow (2 mentions)
Plan apocromat, by Zeiss (1 mentions)
Su 8 developer, by MicroChem (1 mentions)
Plan apochromat, by Zeiss (1 mentions)
Trimethoxy octadecyl silane, by Merck Group (1 mentions)
Sylgard 184 silicone elastomer base, by Dow (1 mentions)
Ip dip, by Nanoscribe (1 mentions)
Ip l 780, by Nanoscribe (1 mentions)
14 protocols using photonic professional
1
Two-Photon Absorption Polymerization Technique
2
Electromagnetic Steering of Janus Particles
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To steer the Janus particles, we integrated an electromagnetic coil setup in a commercially available direct laser writing system (Photonic Professional, Nanoscribe GmbH, Germany), as shown in fig. S1. The electromagnetic coil setup is composed of five independent electromagnets controlled by custom electronics. The coils are able to apply the magnetic field up to 18 mT at the center (the origin of the global coordinate system). The coil setup can be fixed onto a sample holder for the Nanoscribe system. The out-of-plane field electromagnet can be loaded from the top in the Nanoscribe system. Furthermore, the coil setup allows using 12 mm by 12 mm glass substrates for fabrication, but the printing space is limited by a polydimethylsiloxane (PDMS) (with 15:1 w/w ratio of the monomer and the cross-linking agent) well on the substrate that produces a closed environment with another disk glass on the top (8-mm diameter) to prevent evaporation of the printing material precursor.
3
3D Printed Magnetic Micromachines
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3D printing of the micromachines was performed using a turn-the-key direct laser writing system (Photonic Professional, Nanoscribe GmbH, Germany) equipped with piezo scanners and galvanometric mirrors for high precision and microfabrication speed. A 63× oil-immersion objective (numerical aperture, 1.4) was used to achieve submicron size features. After the printing, the micromachines were developed with ultrapure water, and they were stored at 4°C underwater until further use. The polymerization of precursor solutions was performed in a closed channel to minimize solvent evaporation. During the 3D printing, we applied a uniform magnetic field in the direction normal to the rotation axes of the micromachines (Fig. 1 ). This uniform field helped form self-assembled chains of magnetic iron oxide nanoparticles to increase the micromachines’ net magnetization, hence the applied torque for magnetic actuation (39 ).
4
Fabrication of Magnetically Actuated Microstructures
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The fabrication platform of the MAC consists of a commercially available 2PP-based direct laser writing system (Photonic Professional, Nanoscribe GmbH, Germany) and a 5-coil electromagnetic coil setup (fig. S1 ) (45 ). A 63× 1.4 numerical aperture oil-immersion objective (Carl Zeiss AG, Germany) was used for 3D microprinting the MAC. A refractive index matching oil (Immersol 518 f; Carl Zeiss Microscopy GmbH) was applied onto the objective to successfully detect the SF solution–substrate interface. The laser power of the 2PP system was 50 mW, which produced a printing power of 20, 30, 40, and 50 mW at a laser intensity of 40, 60, 80, and 100%, respectively. Unless otherwise specified, the laser scanning speed was kept constant at 10,000 μm s–1.
5
Fabrication of Micrometric Structures via Two-Photon DLW
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Micrometric structures were fabricated by a commercially available two photon DLW system (Photonic Professional, Nanoscribe GmbH) equipped with a femtosecond-pulsed laser at 780 nm focused into a droplet of IP-L photoresist (Nanoscribe GmbH) by means of a high-numerical aperture oil-immersion objective (N.A. = 1.4). Photoresist polymerization properties were investigated at laser powers ranging from 4 mW to 16 mW. Optimized cage-like structures consisting of four cylindrical pillars and aligned ridges were thus polymerized on glass using a laser power of 13 mW for pillars and 11 mW for ridges at a scan speed of 30 μm/sec, resulting in in-plane thickness of ~0.5 μm and out-of-plane thickness ~1 μm . Mesh-grids were written at 10 μm, 5 μm or 2.5 μm periodicity. The sample was then immersed for 1h at room temperature (RT) in SU-8 Developer (MicroChem) and preserved in isopropyl alcohol until use. Isopropyl alcohol was substitute by phosphate saline buffer (PBS) and PBS was substitute by cell growth medium. Realized samples were dried only occasionally to perform SEM inspections.
6
Fabrication of Magnetically Actuated Microstructures
7
Bistable Shape Memory Stent Fabrication
8
Fabrication of 3D Microstructures by Direct Laser Writing
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The cell was
filled by capillarity
with the CLC mixture at room temperature. The filling resulted in
an aligned CLC. Localized TTP was conducted in a commercial DLW workstation
(Photonic Professional, Nanoscribe GmbH) equipped with a 170 mW femtosecond
solid-state laser (λ = 780 nm) that delivers 120 fs pulses with
an 80 MHz ± 1 MHz repetition rate. At a power scaling of 1, the
average laser output is 50 mW. The laser beam was focused with a 63×
oil objective (NA = 1.4; WD = 190 μm; Zeiss; Plan Apochromat)
into the filled cell. The sample movement was controlled by a piezo
translation stage in the z-axis and by a galvo stage
in the x- and y-axes. The fabrication
of the 3D microstructures was performed at different laser powers
(40–45%) and scan speeds (5000–10,000 μm·s–1) depending on the structure’s geometry, hatching,
and slicing values. Structure fabrication was initiated 0.5 μm
below the automatically detected glass/photonic photoresist interface.
After TPP-DLW, the structures were washed in warm isopropanol until
all the unreacted monomer had dissolved. The cell was then opened,
and the functionalized glass rinsed with isopropanol and air-dried.
The activation of the structures was performed by placing a drop of
1 M KOH solution on top of the structures for 1 min. The basic solution
was rinsed with water, and the structures were then dried by heating
at 70 °C for 10 min using a hot plate.
filled by capillarity
with the CLC mixture at room temperature. The filling resulted in
an aligned CLC. Localized TTP was conducted in a commercial DLW workstation
(Photonic Professional, Nanoscribe GmbH) equipped with a 170 mW femtosecond
solid-state laser (λ = 780 nm) that delivers 120 fs pulses with
an 80 MHz ± 1 MHz repetition rate. At a power scaling of 1, the
average laser output is 50 mW. The laser beam was focused with a 63×
oil objective (NA = 1.4; WD = 190 μm; Zeiss; Plan Apochromat)
into the filled cell. The sample movement was controlled by a piezo
translation stage in the z-axis and by a galvo stage
in the x- and y-axes. The fabrication
of the 3D microstructures was performed at different laser powers
(40–45%) and scan speeds (5000–10,000 μm·s–1) depending on the structure’s geometry, hatching,
and slicing values. Structure fabrication was initiated 0.5 μm
below the automatically detected glass/photonic photoresist interface.
After TPP-DLW, the structures were washed in warm isopropanol until
all the unreacted monomer had dissolved. The cell was then opened,
and the functionalized glass rinsed with isopropanol and air-dried.
The activation of the structures was performed by placing a drop of
1 M KOH solution on top of the structures for 1 min. The basic solution
was rinsed with water, and the structures were then dried by heating
at 70 °C for 10 min using a hot plate.
9
3D Polydimethylsiloxane Structures via Two-Photon Lithography
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We generated smooth polydimethylsiloxane (PDMS) structures via soft lithography from a master mold fabricated by two-photon polymerization (TPP)-laser lithography (Figure 1 B). The mold, having different shapes of 3D indentations (triangle, square, circle shape), was designed using SolidWorks 2019 software (Dassault Systèmes, Vélizy-Villacoublay, France). Other than geometry of the structure, we fixed other parameters (wall thickness: 60 µm; height: 60 µm). The 3D structure was fabricated using a direct laser writing system (Photonic Professional, Nanoscribe GmbH, Karlsruhe, Germany) with IP-S resin from the laser assisted nano engineering (LANE) lab at University of Nebraska–Lincoln (http://lane.unl.edu/ ). Then, the structure was exposed to vaporized trimethoxy (octadecyl)silane (Sigma-Aldrich, St. Louis, MO, USA) for 2 h to repetitively produce 3D convex PDMS structures (10:1 ratio of Sylgard 184 silicone elastomer base to curing agent; Dow Corning, Midland County, MI, USA). After the degassing step, we incubated it at 65 °C in a dry oven for 6 h and gently peeled off the final PDMS structures. For cell culture, the molded PDMS structure was sterilized with 70% ethanol washing, and subsequently exposure under ultraviolet lights for 30 min.
10
Fabricating Woodpile Photonic Crystals
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The woodpile photonic crystals were fabricated using a commercially available setup (Photonic Professional from Nanoscribe GmbH) in combination with the novel available Dip-In technique and a shaded ring filter. Structures were written on glass and CaF2 (Crystan, UK) substrates by dipping the objective directly inside a liquid negative-tone photoresist (IP-DIP, Nanoscribe, Germany) and by fine-tuning the laser power. Two successive development baths in PGMEA (propylene glycol monomethyl ether acetate) for 10 min and a consecutive bath in isopropanol for 8 min were chosen. A gentle drying of the structures is achieved by redirecting a stream of N2 through a bubbler containing isopropanol.
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