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Ethos nx5000

Manufactured by Hitachi
Sourced in Japan

The Ethos NX5000 is a versatile laboratory equipment designed for various analytical applications. It features advanced technology and reliable performance to meet the demands of modern research and testing laboratories.

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4 protocols using ethos nx5000

1

Cryo-SEM Visualization of Biofilm

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An area of high contrast within an osmium-stained menstrual cup was excised and securely mounted on a holder with an equal mixture of OCT compound and colloidal graphite. The mounted sample was flash-frozen in liquid nitrogen slush and transferred under vacuum into a Quorum PP3010T cryo-prep chamber. Additional sublimation was performed on the sample at −85°C for 10 min and sputter-coating with a layer of Pt for 100 s to mitigate sample charging. Scanning electron microscopy (SEM) imaging was performed using a Hitachi Ethos NX5000. The use of cryo-SEM is recognized as an invaluable tool in the visualization of biofilm that can reveal details about biofilm structure and topography that other microscopy techniques cannot (64 , 65 (link)). This tool, while limited in use due to the expense of equipment and a skill set necessary to operate the equipment and interpret the images, avoids the complication associated with complex chemistry-driven methodologies (e.g., microscopy such as FISH probes) that require oxygen to work rendering them inconducive to visualization of L. gasseri which requires anaerobic environmental conditions.
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2

Characterization of MXene Nanomaterials

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The optical absorption spectra of the dispersion sample were recorded on an ultraviolet–visible spectrophotometer (V-770, JASCO). Raman spectra in the radial-breathing mode region were recorded on an inVia Raman Microscope (Renishaw) excited by 785-nm laser light. A single-monochromator micro-Raman spectrometer was employed in the back-scattering configuration. The sample dispersions were drop-casted onto a silicon wafer before the measurement. X-ray photoelectron spectroscopy (XPS) data were obtained using an ESCALAB XI + spectrometer (Thermo Fisher Scientific) using 300 W Al–Ka radiation. To exclude the substrate signals, a highly concentrated MXene dispersion was drop-coated several times onto a Si/SiO2 wafer to form a thick MXene film (>10 nm). Atomic force microscopy (AFM) measurements were acquired using a Dimension Fastscan AFM with a NanoScope V stage controller (Bruker). The samples for AFM observation were prepared by spin-coating the Si/SiO2 wafer with 10 µl of the MXene dispersion at 400 rpm for 60 s, followed by 1,000 rpm for 60 s and 1,600 rpm for 60 s. Scanning electron microscopy (SEM) measurements were conducted in an S-4300 (Hitachi) or an ETHOS NX5000 (Hitachi). X-ray diffraction (XRD) spectra were obtained by a SmartLab (Rigaku) through Cu Kα radiation.
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3

Micro-scale Crystalline Specimen Preparation

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The specimen of single-crystalline sapphire was prepared from a commercial sapphire C-plane single-crystal substrate using a FIB system (Hitachi-FB2000). The specimen of polycrystalline AlN was microfabricated using a FIB system (Hitachi Ethos NX-5000). The bulk sample of AlN was synthesized using spark plasma sintering of high-purity AlN powder (grade E, Tokuyama Corporation) in the N2 atmosphere. The grain size is observed in the range between 0.5 and 1 μm. Following microfabrication, each specimen was attached to a constantan tip by a W deposition inside the FIB system and then placed on a Cu attachment for stabilizing with the TEM holder (refer to fig. S1). The single-crystalline sapphire specimen has dimensions of ~20 μm (length) by ~430 nm (width) by ~430 nm (thickness), and the polycrystalline AlN specimen has dimensions of ~20 μm (length) by ~2.8 μm (width) by ~200 to 350 nm (thickness).
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4

Cross-sectional Imaging of Pr–Ge via FIB-TEM

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To acquire the cross-sectional image of Pr–Ge, the GT resonator was thinned using a focused ion beam system (FIB, Ethos NX5000, Hitachi, Tokyo, Japan). The TEM (Tecnai G 530 S-Twin, FEI Co., Hillsboro, OR, USA) was used to investigate the prepared specimen.
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