E 1010 ion sputtering device
The E-1010 is an ion sputtering device manufactured by Hitachi. It is designed to deposit thin films of materials onto substrates using the process of sputtering. The device utilizes an ion beam to bombard a target material, causing atoms from the target to be ejected and deposited onto the substrate surface.
5 protocols using e 1010 ion sputtering device
Characterizing PTFE Nanofiber Membranes
Scanning Electron Microscopy of Rice Powder
PTFE Hollow Fiber Membrane Morphology Investigation
Heart Valve Microstructure Characterization
Scanning Electron Microscopy of Juvenile Anatomy
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