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Hp 8453 uv vis spectrometer

Manufactured by Agilent Technologies
Sourced in United States

The HP-8453 UV–VIS spectrometer is a laboratory instrument designed for the analysis of samples using ultraviolet and visible light spectroscopy. It is capable of measuring the absorbance, transmittance, or reflectance of samples across a range of wavelengths in the UV and visible light spectrum.

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4 protocols using hp 8453 uv vis spectrometer

1

UV-Vis Spectroscopy for Band Gap Determination

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Absorbance measurements were performed using an Agilent/HP 8453 UV–vis spectrometer, and the band gap was determined through a Tauc plot.
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2

Fluorescent Labeling of Amphiphilic Proteins

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Poly-acrylic acid, ammonium formate, triethylamine (TEA), dicyclohexylcarbodiimide, octylamine, and isopropylamine were from Sigma-Aldrich. Methanol, dimethylformamide (DMF), and N-methylpyrrolidone were from SDS. Palladium on activated charcoal, sodium methoxide, 1-hydroxybenzotriazole, and Celite were from Acros. AF647 carboxylic acid succinimydyl ester (AF647-NHS) was from Life Technologies. A8–35 was synthesized according to the procedure described in Gohon et al. (2004 (link), 2006) (link). UV–visible spectroscopy measurements were carried out on a HP-8453 UV–VIS spectrometer (Agilent Technologies). Fluorescence spectroscopy was performed on a PTI fluorescence spectrometer (Serlabo Technologies) controlled by Felix software. NMR spectroscopyexperiments were performed on a Bruker Avance 400 MHz instrument (Bruker, Wissembourg, France).
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3

Characterization of Stimuli-Responsive Cellulose Nanocrystals

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X-ray diffraction (XRD), thermogravimetry analysis (TGA) and UV–VIS absorption spectra were used to characterize the crystalline structure, decomposition behavior, pH- and light-responsiveness of CNCs, CNCs-IBBr, and PMMAZO-grafted CNCs, respectively. XRD measurements were performed on a D8 ADVANCE wide angle X-ray diffractometer system (Bruker Corporation, Karlsruhe, Germany). The diffracted intensity of Cu Kα radiation (k = 0.1542 nm; 40 kV and 40 mA) was measured in a 2θ range between 5° and 60°. TGA was made using a seven-series thermal analysis system (PerkinElmer, Waltham, MA, USA). Samples were heated from room temperature to 600 °C at 10 °C/min in a dynamic nitrogen atmosphere at a flow rate of 25 mL/min. The UV–VIS absorption spectra were recorded using an HP-8453 UV–VIS spectrometer (Agilent, CA, USA). The number-average molecular weight (Mn) and molecular weight distribution (MWD) of the polymer cleaved from PMMAZO-grafted CNCs were measured on a GPCMax VE201 gel permeation chromatography (GPC) (Viscotek Co., Houston, TX, USA) equipped with three columns PAA-202-204-205 and three detectors: a viscometer, light scattering, and IR detector. The calibration was made with poly (ethylene oxide) standards.
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4

Characterization of Thin Film Materials

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Film thicknesses were measured using a Dektak profilometer. X-ray diffraction (XRD) measurements were performed using a Bruker D8 theta/theta XRD system with Cu Kα radiation (λ = 0.15418 nm) and a LynxEye position-sensitive detector, scanning from 2θ = 20° to 75°. UV-vis absorbance measurements were performed using an Agilent/HP 8453 UV-vis spectrometer, and the band gap determined from a Tauc plot. Atomic force microscopy (AFM) measurements were performed with a Veeco Multimode Nanoscope III system operating in tapping mode with a scan size of 2 × 2 μm. A LEO VP1530 field emission scanning electron microscope (SEM) was used for energy dispersive X-ray spectroscopy (EDX) measurements. The samples analysed were on glass substrates, and a thin layer of carbon was sputter-coated on the cross-sections to prevent charging of the samples during imaging.
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