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Kratos axis ultra dld

Manufactured by Shimadzu
Sourced in United Kingdom, Japan

The Kratos Axis Ultra DLD is a versatile X-ray photoelectron spectroscopy (XPS) system designed for advanced materials characterization. It features a dual anode X-ray source, a high-resolution electron energy analyzer, and a delay-line detector (DLD) for high-speed data acquisition. The system is capable of providing detailed information about the chemical composition and electronic structure of solid surfaces and thin films.

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17 protocols using kratos axis ultra dld

1

X-ray Photoelectron Spectroscopy Analysis Protocol

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XPS analyses were
carried out with a Kratos Axis Ultra DLD (Kratos Ltd., Manchester,
UK) using a monochromatic Al Kα X-ray source (1486.6 eV, emission
current: 10 mA, anode voltage: 15 kV). The instrument base pressure
remained below 8.0 × 10–10 Pa. The instrument
work function was calibrated to a binding energy of 84.0 eV for metallic
gold (Au 4f7/2). The charge neutralizer was used for all
analyses (filament current: 2.1 A, charge balance: 3.45 V, and filament
bias: 1.5 V). The charge neutralization was monitored with the help
of the C 1s peak for adventitious carbon. Survey spectra were acquired
at a pass energy of 80 eV with 20 sweeps and an energy step of 1 eV.
The high-resolution spectra were acquired at a pass energy of 20 eV
with 10 sweeps and an energy step of 0.1 eV. The analysis area was
300 μm × 700 μm. Data were processed using the commercial
software CasaXPS (version 2.3.16, Casa Software Ltd., Chichester,
UK). All spectra were recorded in the spectroscopy mode utilizing
the hybrid lens mode. For each sample, at least three independent
measurements were performed. The binding energies were calibrated
using the C 1s peak for adventitious carbon at a binding energy of
284.8 eV, with an associated error of ∼0.1–0.2 eV.38 (link) No argon ion sputter cleaning has been performed
prior to analysis.
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2

Graphene Oxide Characterization Techniques

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The produced NPs were characterized using various characterization techniques to confirm the functionalization and to explore its effects on GO properties. XPS measurements were conducted over a 0–1200 eV range on a Kratos AXIS Ultra DLD (Kratos Analytical Ltd, Manchester, UK) with Al-Kα source and X-ray power of 15 Kv and 20 mA. The elemental compositions of GO and GO-PDA were analyzed using FLASH 2000 elemental analyzer (Thermo Scientific™, Waltham, MA, USA). XRD measurements were carried out using EMPYREAN PANalytical diffractometer (Malvern Panalytical B.V., Eindhoven, Netherlands) equipped with a Cu-Kα radiation source (λ = 1.5406 Å). FTIR-UATR spectra were determined using FTIR Perkin Elmer 2000 in the range of 400–4000 cm−1 to study the surface functional groups of pristine GO and GO-PDA.
Raman spectra of the prepared NPs were obtained with DXR Raman Spectrometer operated with a 532 nm laser and a 10× objective (Thermo Scientific™). Moreover, the morphological structure of GO and GO-PDA NPs was investigated using SEM analysis that was conducted using the JEOL model JSM-6390LV. TGA analysis was conducted to assess the thermal stability of both samples using Pyris 6 TGA (PerkinElmer, Waltham, MA, USA) under nitrogen gas at a 10 °C/min heating rate and over a temperature range of 30–800 °C.
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3

X-ray Photoelectron Spectroscopy Characterization

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A Kratos Axis Ultra DLD (Kratos Analytical Ltd., U.K.) instrument, equipped with a hemispherical analyzer and a monochromatic AlKα (1486.6eV) X-ray source in spectroscopy mode, was used to analyze the samples. The emission angle between the analyzer axis and the normal sample surface was 0° or 60° (sampling depth of approximately 10 or 2–3 nm [22 (link)]). The following core lines were acquired: O 1s, C 1s, N 1s, S 2p and Au 4f. The quantification, reported as a relative elemental percentage, was performed by using the integrated area of the fitted core lines (after Shirley background subtraction) and by correcting for the atomic sensitivity factors through a dedicated software [23 (link)]. This procedure provided a quantitative analysis, which was useful for the chemical characterization of the surface at different modification steps.
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4

XPS Characterization of Material Surfaces

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The XPS spectra were gathered using a Kratos Axis Ultra DLD electron spectrometer (Kratos Analytical Ltd, Manchester, UK) using a monochromated Al Kα source operated at 150 W.
Survey spectra were gathered at binding energies ranging from 1100 to 0 eV, at pass energy of 160 eV, and high-resolution spectra for photoelectron lines N 1s, C 1s, and Au 4f were gathered at pass energy of 20 eV. In addition, the binding energy (BE) scale was referenced to the Au 4f7/2 photoelectron line, set at 84.0 eV. The spectra were handled with the Kratos software (version 2.2.9).
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5

Characterization of Nanomaterial Properties

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The XRD patterns were characterized using an X-ray diffraction crystallography equipment (D8, Bruker, Germany) under Cu Kα X-ray irradiation with λ = 1.5406 Å. The Raman spectra were recorded by a Raman spectrophotometer (Labram Soleil, Horiab, France) with an excitation wavelength of 514.4 nm. The XPS was measured by a UHV spectrometer (Kratos Axis Ultra DLD, Kratos Analytical, Japan) equipped with an Al Kα X-ray irradiation source (1486.6 eV). The ICP element analysis was obtained through an inductively coupled plasma-optical emission spectrometer (ICP-OES, Avio 500, Perkin Elmer, America). The morphologies and EDS were observed by using filed-emission scanning electron microscopy (Supra 40, Carl Zeiss, Germany), high-resolution transmission electron microscopy and scanning transmission electron microscopy (JEM-2100F, JEOL, Japan).
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6

Comprehensive Physicochemical Characterization

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Transmission electron microscopy (TEM) was carried out on a JEOL-2010 TEM at 200 kV. Fourier transform infrared (FTIR) spectra were recorded using a FTIR2500 spectrometer (KBr disk). Raman spectra were collected on a LabRam-1B Raman spectroscope equipped with a 632.8 nm laser source. X-ray diffraction spectra (XRD) were determined on a Holland PANalytical X'Pert PRO X-ray diffractometer with Cu Kα (λ = 1.54056 Å) as radiation source in the 2θ range of 5–80°. X-ray photoelectron spectroscopy (XPS) measurements were made on Kratos AXIS UltraDLD (Kratos Analytical Ltd.) with mono Al Kα radiation ( = 1487.71 eV) at a power of 75 W. Emission spectra were collected using a Varian Cary 100 spectrometer. Fluorescence life time of the products were determined using a FLS980 fluorometer (Edinburgh Instruments Ltd.). Absorption spectra were recorded on a UV-3600 UV-vis-NIR spectrophotometer (Shimadzu). Fluorescence quantum yield (QY) was detected using quinine sulfate as the standard (QY = 54% in 0.1 M H2SO4). Confocal laser-scanning microscopy (CLSM) images were recorded on a Zeiss LSM 710 CLSM (Zeiss LSM710, Germany). The zeta potential of Mn(ii)-NGQDs and NG were measured by a Zetasizer Nano ZS90 (Malvern Instruments).
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7

Elemental Analysis by X-ray Photoelectron Spectroscopy

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Elemental analysis was studied by X-ray Photoelectron Spectroscopy (XPS) (Kratos Axis-Ultra DLD, Kratos Analytical, Manchester, UK).
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8

Multimodal Characterization of Nanomaterials

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Scanning electron microscopy (SEM, JSM-7100F; JEOL, Tokyo, Japan) was used to examine surface morphology, while transmission electron microscopy (TEM, FEI TecnaiF30; FEI, Hillsboro, OR, USA), atomic force microscope (AFM, Agilent 5500; Agilent Technologies, Santa Clara, CA, USA), and energy-dispersive X-ray spectroscopy (EDS) were employed, respectively, to examine the microstructures and elemental distribution.
The crystal structures of the samples were confirmed by X-ray diffraction (XRD, Rigaku RINT2400; Rigaku, Tokyo, Japan) and Raman (LabRAMHR Evolution; Horiba, Kyoto, Japan) analysis.
Chemical states of the as-synthesized nanomaterials were investigated with X-ray photoelectron spectroscopy (XPS, Kratos AXIS ULTRADLD; Kratos Analytical, Manchester, UK), and the relative curves were calculated with C 1s (284.8 eV).
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9

X-ray Photoelectron Spectroscopy of Nanofibrous Mats

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XPS studies were done using Kratos AXIS UltraDLD (Kratos Analytical Ltd., Wharfside, Manchester, UK) in ultrahigh vacuum (~10−9 Torr) using a monochromatic Al-Kα X-ray source (1,486.71 eV). In-depth analysis of different nanofibrous mats for various chemical states was executed by recording their high-resolution elemental spectra. The high-resolution spectra were deconvoluted during the analysis using different Gaussian–Lorentzian components with Shirley mode used to subtract the background.
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10

Characterization of Aluminum Alloy Surfaces by XPS and SEM

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XPS. The chemical states of the aluminum alloy following the treatment were investigated by X-ray photoelectron spectroscopy (XPS), using a Kratos Axis Ultra DLD (Kratos Analytical, Manchester, UK) at a takeoff angle of 45°, with monochromatic Al Kα radiation (hν = 1486.6 eV) at 150 W and 1.0 × 10−8 mbar at a pass energy of 23.5 eV. The energy resolution that was used was 0.2 eV. Samples were survey scanned for relevant elements (pass energy = 100 eV, energy step = 0.5 eV). The 1s elemental peak was from carbon (285 eV). The data was processed with CasaXPS, version 2.3.17 (House Software, Sanderland, UK).
SEM. The morphologies of the uncoated and coated aluminum alloy surfaces were investigated by scanning electron microscopy (SEM) using a Philips XL30 (Philips, Amsterdam, Netherlands) at an acceleration voltage of 5 kV. Cross-sections of the coated samples were cut by ultramicrotomy to characterize the surface-coating interface.
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