AFM images were recorded using a Sample Scanning-Nano Explorer AFM system (SS-NEX, RIBM, Tsukuba) with a silicon nitride cantilever (resonant frequency: 1.5 MHz, spring constant: 0.1 N/m, Olympus) under the tapping mode. Before imaging, the samples were purified [to get rid of the ligase, ATP, and staple strands (if any)] and buffer-exchanged into 1× origami buffer using sephacryl column. Then, the purified samples were incubated discretely from 25 to 90°C for 10 min, and rapidly cooled down and stored on ice until AFM images were recorded. A 2 μl of sample (1–2 nM) was incubated on a freshly cleaved mica surface (ϕ 1.5 mm) for 5 min at RT, the surface was gently washed using 1× origami buffer, and images were recorded in the same buffer.
Silicon nitride cantilever
Manufactured by Olympus
Sourced in Japan
Silicon Nitride cantilevers are specialized laboratory equipment used in various scientific applications. They are composed of a silicon nitride material and designed to function as probes in techniques such as atomic force microscopy (AFM). The core function of these cantilevers is to detect and measure surface topography, adhesion, and other physical properties at the nanoscale level.
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Lab products found in correlation
6 protocols using silicon nitride cantilever
1
Thermally Induced Conformational Changes in DNA Origami
2
Hybrid-Silica Film Morphology Characterization
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Morphologies of hybrid-silica films were investigated by a DI Dimension atomic force microscopy (Digital Instrument, Santa Barbara, CA, USA) in tapping mode at room temperature with a silicon nitride cantilever (Olympus, Shinjuku, Tokyo, Japan), which had a resonant frequency of 265 kHz and a spring constant of 25.5 N/m; 10 μm × 10 μm images were acquired, rms roughness (R q ) calculated for each surface, and then averaged over three independent investigations.
3
Nanoscale Surface Characterization by AFM
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Contact-mode atomic force microscopy (AFM), lateral force microscopy (LFM) and ultrasonic force microscopy (UFM) were performed using Brucker Multimode III (Santa Barbara, CA) (AFM/LFM) and NANOTEC (Madrid, Spain) (AFM/LFM and UFM [7 (link)]) instruments). For UFM, ultrasonic frequencies of ~3.8 MHz and modulation frequencies of 2.4 KHz were applied from a piezoelectric element placed under the sample. Typically, Olympus Silicon Nitride cantilevers with a nominal spring constant of 0.06 N/m and a nominal tip radius of 20 nm were used. The measurements were performed in air, at ambient conditions. Data analysis was performed with WSxM software (Madrid, Spain) [23 (link)].
4
Atomic Force Microscopy of Biomolecules
5
Atomic Force Microscopy Techniques
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Contact-mode atomic force microscopy (AFM), lateral force microscopy (LFM) and ultrasonic force microscopy (UFM) were performed using a NANOTEC (Madrid, Spain) instrument. The modification of the AFM equipment for the incorporation of UFM facilities is described in [25 (link)]. For UFM, ultrasonic frequencies of ~3.8 MHz and modulation frequencies of 2.4 KHz were applied from a piezoelectric element placed under the sample. Typically, Olympus Silicon Nitride cantilevers with a nominal spring constant of 0.06 N/m and a nominal tip radius of 20 nm were used. The measurements were performed in air, at ambient conditions. Data analysis was performed with WSxM 4.0 Beta 9.3 software (Madrid, Spain).
6
Atomic Force Microscopy of Biomolecules
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AFM images were obtained using a MultiMode VIII SPM (Bruker) equipped with a liquid cell. 2 μL of sample was applied onto the surface of highly ordered pyrolytic graphite (HOPG), which was pretreated with ultraviolet-ozone for 30 seconds. The 50 μL of TAE buffer (12.5 mM Mg2+, 5 mM Ni+) was added into the liquid cell. And images were collected using silicon nitride cantilevers (Olympus).
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