6890 agilent gc with 5975 ms detector

A 6890 Agilent GC with 5975 MS detector equipped with a split/splitless injector was used for the analysis as previously described^{25 (link)–29 (link)}. The GC column used for the analysis was an Agilent HP- 5 ms UI capillary column (30 m × 0.25 mm id × 0.25 μm film thickness). Ultra-high purity helium, at 0.8 mL/min, served as the carrier gas. The inlet was operated in pulsed splitless mode (25 psi for 1 min, followed by a 50 mL/min purge flow), with the injector temperature set at 250 °C and the injection volume was 1 μL. The oven temperature program was as follows: 40 °C, held for 3 min, increased at 8 °C/min to 300 °C, held for 3 min. The MS ion source and quadrupole temperatures were 230 °C and 150 °C, respectively. Electron ionization (EI) was used with an ionization energy of 70 eV. The MS was operated to scan from m/z 29 to 600 in 0.4 s with a solvent delay of 3.5 min.

A 6890 Agilent GC with 5975 MS detector equipped with a split/splitless injector was used for the analysis as previously described [40 (link)–43 (link)]. The GC column used for the analysis was an Agilent HP- 5ms UI capillary column (30 m × 0.25 mm id × 0.25 μm film thickness). Ultra-high purity helium, at 0.8 mL/min, served as the carrier gas. The inlet was operated in pulsed splitless mode (25 psi for 1 minute, followed by a 50 mL/min purge flow), with the injector temperature set at 250°C and the injection volume was 1 μL. The oven temperature program was as follows: 40°C, held for 3 min, increased at 8°C/min to 300°C, held for 3 min. The MS ion source and quadrupole temperatures were 230°C and 150°C, respectively. Electron impact (EI) was used with an ionization energy of 70 eV. The MS was operated to scan from m/z = 29 to 600 in 0.4 sec with a solvent delay of 3.5 min.