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Tecnai g2 20 microscope

Manufactured by Philips

The Tecnai G2 20 microscope is an electron microscope designed for high-resolution imaging and analysis of a wide range of materials. The microscope operates at an accelerating voltage of 200 kV and features a field-emission gun source, providing high-brightness and high-coherence illumination. The Tecnai G2 20 offers advanced imaging and analytical capabilities, including TEM, STEM, and EDS functionalities.

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3 protocols using tecnai g2 20 microscope

1

Multimodal Optical Characterization of Nanoparticles

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Absorption spectra were recorded by a Varian Cary 100 UV-visible spectrophotometer (Agilent Technologies, USA) with a 1 cm quartz cell and a data interval setting of 1 nm with a scan speed of 600 nm min−1 within 200–900 nm. Fluorescence and excitation-emission-matrix spectra were recorded by a Nicolet-6700 FT-IR spectrometer (Thermo Ltd, USA) within 300–700 nm with a scan speed of 2400 nm min−1. Transmission electron microscopy (TEM) images were obtained by using an H7560 microscope (Hitachi Ltd, Japan) operated at 80 kV and a Tecnai G2 20 microscope (Philips, Holland) operated at 200 kV. The surface charges of materials were acquired with a Malvern Zetasizer Nano ZS-ZEN3690 (Malvern, England). A Near-Infrared Ray (NIR) laser of 808 nm (Changchun New Industries Optoelectronics Technology Ltd, China) was used as a light source with adjustable power.
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2

Characterization of Crystalline Powder Samples

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XRPD investigation was carried out on the dry samples, using a PW3050/60 X’Pert Powder X-Ray Diffractometer (Malvern Panalytical, Malvern, UK) in a spinner configuration to eliminate the preferential orientation of the powder (1 rotation/s). Diffractograms were collected between 5–120° (2θ), using Cu-Kα radiation at 45 kV and 40 mA, a step size of 0.015°, a time per step of 200 s, and a scan speed of 0.0106°/s. The Rietveld refinement [49 ] of the measured diffraction patterns was performed with Materials Analysis Using Diffraction (MAUD) software [50 (link)]. The instrumental function was determined using the LaB6 NIST standard (660b).
The crystallinity was also checked by High Resolution Transmission Electron Microscopy (HR-TEM) analysis of the particles that were dispersed and deposited on a Cu grid, as described above. The instrument used was a Philips Tecnai G2 20 microscope, with a LaB6 source, operating at 200 keV. TEM micrographs were analyzed using the software ImageJ to individuate the d-spacing of the crystal lattice.
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3

Nanomaterial Characterization Techniques

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SEM images were obtained on an FESEM Hitachi S4800 microscope. TEM imaging was carried out on an FEI Tecnai G2 20 microscope operating at 200 kV. XRD patterns were acquired on Philips X’ Pert system equipped with Cu K α radiation (λ = 1.5419 Å, scanning rate = 1.0°/min). The HRTEM were taken on Tecnai G2 20 S-TWIN operated at 200 kV accelerating voltage. XPS was measured on a Thermo ESCALAB 250 system. The extinction spectra of the Au NCs were acquired on a Hitachi U-3900 with cuvettes with a 0.5-cm optical path length. ICP-AES was conducted by Optima 5300 DV (Perkin Elmer).
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