X-ray diffraction (XRD) patterns were recorded on a Bruker D8 Advance X-ray diffractometer (Bruker D8, Karlsruhe, Germany) with Cu Kα radiation (λ = 1.5406 Å) at 40 kV and 2θ ranging from 10° to 80°. Transmission electron microscopy (TEM) images and high-resolution TEM (HRTEM) images were recorded with a JEOL JEM-1400 microscope (JEOL, Tokyo, Japan) and a JEOL 2100 microscope (JEOL, Tokyo, Japan). Selected-area electron diffraction (SAED) patterns were also recorded on the TEM microscopes. Scanning electron microscopy (SEM) images were collected with an FEI Quanta 450 FEG microscope (FEI, Reston, VA, USA) operated at an accelerated voltage of 20 kV and high vacuum mode. Energy-dispersive X-ray spectroscopy (EDS) analysis was conducted on the SEM microscopy equipped with an X-MaxN 50 spectrometer (Oxford Instruments, Abingdon, UK). The samples were prepared by drop-casting an appropriate amount of ethanol dispersion of the products on silicon wafers for XRD measurement, or carbon-coated copper grids for TEM and SEM imaging, followed by drying in a fume hood and at room temperature. Laser scattering of microfluidic flow was recorded using the home-built microscopic system detailed in our previous work [21 (link)].
Quanta 450 feg microscope
Manufactured by Thermo Fisher Scientific
Sourced in United States
The Quanta 450 FEG microscope is a field emission gun scanning electron microscope (FEG-SEM) designed for high-resolution imaging of samples. It features a field emission source that provides a high-brightness electron beam, enabling detailed observation of specimen surface topography and composition.
Automatically generated - may contain errors
Lab products found in correlation
2100 microscope, by JEOL (1 mentions)
X maxn 50 spectrometer, by Oxford Instruments (1 mentions)
D8 advance x, by Bruker (1 mentions)
Jem 1400 microscope, by JEOL (1 mentions)
Orius sc1000b, by Ametek (1 mentions)
Jem 1200 exii transmission electron microscope, by JEOL (1 mentions)
D8 discover diffractometer, by Bruker (1 mentions)
4 protocols using quanta 450 feg microscope
1
Comprehensive Material Characterization Techniques
2
Comprehensive Microscopic Characterization
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SEM images were obtained using a Quanta 450 FEG microscope manufactured by FEI (Eindhoven, The Netherlands). For SEM analysis, the samples were pulverized on carbon tape attached to aluminum sample holders and coated with gold by sputtering using an ES Quorum QT150. For elemental mapping, energy-dispersive X-ray spectroscopy (EDS) was recorded using an X-ray detector model 150 from Oxford attached to a Quanta 450 FEG microscope (JEOL JEM 1200EX-II Transmission Electron Microscope, Akishima, Japan) with 0.5 nm resolution that allowed for magnifications up to 600 kX. The images were recorded through a CCD Gatan camera (Bioscan, Gatan Inc., Pleasanton, CA, USA) and a high-resolution CCD Gatan camera (Orius SC1000B, Gatan Inc., Pleasanton, CA, USA).
3
Characterizing Enthesis Scaffold Morphology
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300 The morphology of the enthesis scaffolds was characterized from its nano- to macroscale, and its features were then compared with those of the tissues constituting the enthesis organ. The nanostructure of the enthesis scaffold was studied by scanning electron microscopy (SEM) imaging analysis (Quanta 450 FEG microscope, FEI, Hillsboro, Oregon, USA). The images acquired by SEM were analyzed by ImageJ software using the DiameterJ plug-in. Pore area, fiber diameter, and fiber orientation were evaluated. The PLGA fiber integrity at the mixed region level, after the PCL extrusion process, was also evaluated. The study was conducted by analyzing samples in triplicate.
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4
Metallographic Investigation of SLM Samples
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Samples for metallographic investigation were cut from the central part of SLM samples by electro-erosion cutting (cutting in running water at a voltage of 1.8 kV and a current of 150 mA). The cut was made parallel to the xy direction. Standard metallographic techniques, including grinding on SiC papers with grain sizes ranging from 60 to 2000 (grains/cm2) and polishing with Al2O3 suspension with particle size changing from 1 to 0.3 µm, were applied. The samples were studied by optical microscopy (OM) on an Olympus GX 51 (Olympus Corporation, Shinjuku, Japan) microscope and scanning electron microscopy (SEM) in back-scattered electron (BSE) mode using a Quanta 450 FEG microscope (FEI Company, Fremont, CA, USA) equipped with an energy-dispersive X-ray spectrometer (EDS). XRD analysis was carried out using a Bruker D8 DISCOVER diffractometer (Bruker, Billerica, MA, USA) equipped with an X-ray tube with a rotating Cu anode operating at 12 kW. All measurements were performed in parallel beam geometry with a parabolic Goebel mirror in the primary beam. Diffraction patterns were measured within an angular range of 20–70° of 2 Ɵ with an exposition time of 5 s and step size of 0.05°. The Rietveld method was used to estimate the amount of phases.
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