Hexadecane (ReagentPlus, Z99%), toluene (anhydrous, 99.8%), octadecyltrichlorosilane (Z90%), ethyl acetate (anhydrous, 99.8%), and sorbitan mono-oleate (Span s 80) were obtained from Merck. Acetone, ethanol, and isopropyl alcohol (all AnalaR, Normapur s ) were obtained from VWR International and NOA 81 (thiolenebased photoresist) was purchased from Norland Products, USA. All reagents were used as received. Poly(vinyl alcohol) (PVA) with average M w = 18, 40 and 105 kg mol À1 and degree of hydrolysis = 87-89 and 99% was used as received (Sigma Aldrich no. 363170, 348406, 363073, 363138, 363081 and 363146). Deionized water was obtained from a Centra ELGA filtration system.
Noa 81
Manufactured by Norland Products
Sourced in United States
The NOA 81 is a piece of laboratory equipment manufactured by Norland Products. It is a contact angle meter that measures the wettability of solid surfaces by determining the contact angle between a liquid and the solid surface.
Automatically generated - may contain errors
Lab products found in correlation
Reagentplus, by Merck Group (2 mentions)
Nuclepore track etched membrane, by Cytiva (2 mentions)
6cm polystyrene tissue culture dish, by BD (2 mentions)
Whatman, by Cytiva (2 mentions)
Sylgard 184 silicone elastomer kit, by Dow (1 mentions)
Pdc 002, by Harrick (1 mentions)
D limonene, by Nacalai Tesque (1 mentions)
2 propanol, by Kanto Chemical (1 mentions)
2 hydroxy 2 methyl 1 phenyl propan 1 one, by Merck Group (1 mentions)
3uv transilluminator, by Analytik Jena (1 mentions)
Cs2010, by Thorlabs (1 mentions)
Msv266, by Leica (1 mentions)
Eos 90d, by Canon (1 mentions)
Plano convex lens, by Edmund Optics (1 mentions)
Grin lens, by Edmund Optics (1 mentions)
Ethanol, by Avantor (1 mentions)
Ethyl acetate, by Avantor (1 mentions)
Isopropyl alcohol, by Avantor (1 mentions)
Span 80, by Merck Group (1 mentions)
Hipersolv chromanorm, by Avantor (1 mentions)
33 protocols using noa 81
1
Fabrication of Polymer-based Thin Films
2
Fabrication of Positive PDMS Mold with Extruded Pillars
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10:1 w/w ratio of polydimethylsiloxane (PDMS) with curing agent (SYLGARD™ 184 Silicone Elastomer Kit, Dow Corning Inc., Midland, MI, USA) was mixed and poured onto SU-8 mold before baking at 75 °C for 60 min to create a negative PDMS mold with reverse feature polarity.
After demolding, holes were created at inlet/outlet regions using 1.5 mm biopsy puncher. The negative PDMS mold was cleaned thoroughly with isopropanol and dried at 75 °C for 15 min. The negative PDMS mold and a silicon wafer were then plasma treated (PDC-002, Harrick Plasma Inc., Ithaca, NY, USA) at high power setting for 1 min before bonding the non-featured side of PDMS to the silicon wafer to form the mold for second replicate molding. The negative PDMS mold was functionalized with silane (Trichloro(1H,1H,2H,2H-perfluorooctyl)silane, Sigma-Aldrich, St. Louis, MO, USA) in a vacuum chamber for 2 hr. PDMS mixture was cast on the negative PDMS mold using same casting protocols above, and a positive PDMS mold with positive feature polarity and extruded pillars at inlet/outlet regions was created. A 50 mm x 75 mm microscopy glass slide was plasma treated for 2 min and bonded to the non-featured side of positive PDMS mold to support the mold and prevent mold bending after curing of UV glue (NOA 81, Norland Products Inc., East Windsor, NJ, USA).
After demolding, holes were created at inlet/outlet regions using 1.5 mm biopsy puncher. The negative PDMS mold was cleaned thoroughly with isopropanol and dried at 75 °C for 15 min. The negative PDMS mold and a silicon wafer were then plasma treated (PDC-002, Harrick Plasma Inc., Ithaca, NY, USA) at high power setting for 1 min before bonding the non-featured side of PDMS to the silicon wafer to form the mold for second replicate molding. The negative PDMS mold was functionalized with silane (Trichloro(1H,1H,2H,2H-perfluorooctyl)silane, Sigma-Aldrich, St. Louis, MO, USA) in a vacuum chamber for 2 hr. PDMS mixture was cast on the negative PDMS mold using same casting protocols above, and a positive PDMS mold with positive feature polarity and extruded pillars at inlet/outlet regions was created. A 50 mm x 75 mm microscopy glass slide was plasma treated for 2 min and bonded to the non-featured side of positive PDMS mold to support the mold and prevent mold bending after curing of UV glue (NOA 81, Norland Products Inc., East Windsor, NJ, USA).
3
Fabrication of UV Glue-based Microfluidic Devices
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UV glue (NOA 81, Norland Products Inc., East Windsor, NJ, USA) was cast on positive PDMS mold and UV cured (36W UV manicure machine, Yiwu Lidan Cosmetics Co.,Ltd. Yiwu, Zhejiang, China). The cured UV glue channel was carefully demolded without bending the channel to maintain its surface flatness. To create a UV glue coated glass slide, UV glue was dropped cast on microscopy glass slide and cured to create a thin film of UV glue. Both UV glue channel and UV glue coated glass slide were plasma treated for 1 min, pressed together and UV cured. Tygon tubing were inserted into the inlet/outlet holes and sealed with UV glue.
4
Polystyrene Multi-well Chip Fabrication
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The multi-well chip was made in polystyrene using injection molding (RnD Factory Corp.) and bonded with amine-functionalized cover glasses using a UV-curable adhesive (NOA 81; Norland Products, Inc.) (Fig. S20). For the surface modi cation, cover glasses were cleaned in piranha solution (75% H 2 SO 4 and 25% H 2 O 2 ) and, after oxygen plasma treatment, incubated overnight with 4% 3-aminopropyltriethoxysilane solution (Sigma-Aldrich, Inc.).
5
Fabrication of Tee Union Tube Fittings
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Tee union tube fittings made of clear polycarbonate (McMaster-Carr) or PTFE (Plasmatech Co.) were used for fabrication. A hole was drilled using a 0.025 in. diameter drill bit (#72, Drill bit city) and a 23 G blunt needle (337 μm I.D. and 641.4 μm O.D., Strategic applications Inc.) was inserted through the drilled hole and fixed by optical adhesive (NOA81, Norland products) and cured under UV light. Silastic tubing (VWR scientific products) or PTFE tubing (Plasmatech Co.) with inner diameters D = 3.175 mm were connected to the tee union tube fitting using a connector and adaptor (IDEX Health & Science).
6
Printed Adhesives for Flexible Electronics
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The capability of AJP to selectively print different inks was investigated, printing insulating or adhesive inks for insulating tracks or fixing SMDs. NOA 81 (Norland Products Inc., Cranbury, New Jersey, USA) is a liquid adhesive photopolymer that can be easily printed by AJP. The ink has been UV-cured during deposition by using the LED Spot type Panasonic ANUJ6180 (Panasonic, Osaka, Japan) and the lens ANUJ6423 as UV Curing System, characterized by a spot diameter of 3 mm, a peak UV intensity of 17,200 mW∙cm−2 at an irradiation distance of 8 mm. In our tests, the selected power was 5% of the maximum peak intensity. NOA 81’s specific printing process parameters are reported in Table 2 . Specifically, NOA 81 was used as insulating layer for capacitive sensors, to glue SMDs on cellulose-based substrates during placing step and to create the intermediate layer in multilayer zones of the circuit. The SMDs and IC were placed and fixed on the substrates owing to NOA 81, realizing an oblique wall on which connections between component pads and silver tracks on paper were printed. Correct placing was ensured by pads and fiducials, specifically designed for each kind of SMDs to place, as shown in Figure 4 .
7
Fabrication of Gold Nanostructures via NIL
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The gold nanostructures were fabricated using the NIL process (Figure S1 ). In this study, a cyclo-olefin polymer (COP) film (FLH230/200-120, Scivax Co., Ltd., Kanagawa, Japan) was used as the mold. We selected this structure herein because it has been previously reported by Nishiguchi et al. that plasmon excitation is possible [25 (link)]. Initially, the COP mold was cleaned with 2-propanol (Kanto Chemical Co. Inc., Tokyo, Japan) and ultrapure water, and then dried by airflow. A 200-nm-thick Au layer was thermally deposited onto the COP mold. The deposited Au layer was attached to the surface of the QCM (SEN-5P-H-10; TAMADEVICE Co., Ltd., Kanagawa, Japan) using a photocurable polymer (NOA81; Norland Products Inc., Cranbury, NJ, USA), followed by dissolution of the COP mold in D-limonene (NACALAI TESQUE, Inc., Kyoto, Japan), after which a QCM device with a gold nanostructure was obtained.
8
Thiol-Allyl Photocurable Adhesive Formulation
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Poly(ethylene glycol) diacrylate (diacrylate) with a molecular weight of 700 g·mol−1, 1,3,5-triallyl-1,3,5-triazine-2,4,6(1H,3H,5H)-trione (allyl), and pentaerythritol tetrakis(3-mercaptopropionate) (thiol) were purchased from Sigma-Aldrich (Dorset, UK) and used as received. Thiol-allyl formulation was prepared with an equimolar amount of thiol and allyl reactive groups. Monomers were added to 1 wt % photoinitiator 2-hydroxy-2-methyl-1-phenyl-propan-1-one (Sigma-Aldrich) to obtain the final photocurable reactive mixtures. The thiol-ene based optical adhesive NOA81 was obtained from Norland Products (Cranbury, NJ, USA). Sudan I dye was purchased from Sigma-Aldrich and all other chemicals were obtained from VWR Chemicals (Lutterworth, UK).
9
Fabrication of Striated Substrates
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The striated substrates were prepared as previously reported [18 (link)–22 (link)]. Briefly, a drop of optical adhesive (NOA-81, Norland Products, Cranbury, NJ) was placed on top of a coverslip. A rectangular polydimethylsiloxane (PDMS) stamp was then pressed into the optical glue to form a striated substrate with 6.5 μm wide ridges and 13.5 μm wide grooves. The optical glue was then cured under 365 nm UV light (UVP 3UV transilluminator, Upland, CA) for 1.5 minutes, at which point it was ready to be used.
10
Mica Surface Modification with Cyclodextrins
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Muscovite mica (Grade #1, S&J Trading, USA) was used as a substrate for the CD-grafted surfaces. To prepare a mica surface, freshly cleaved back-silvered mica was glued onto a cylindrical glass disc (R = 2 cm) using an optical adhesive (NOA 81, Norland Products Inc., USA).
The grafting process involved (i) GPTMS functionalization of the bare mica surface and (ii) CD–GPTMS grafting. For GPTMS functionalization, the glued mica surface was activated using air plasma for 3 min at 100 W under 20 Pa and a GPTMS solution (1 vol% in toluene) was added dropwise onto the activated mica surface for 30 min. Then, the mica surface was rinsed with toluene and dried with N2. For GPTMS–CD grafting, the GPTMS-functionalized surface was immersed in a CD solution (0.075 mg mL−1 α-, β-, or γ-CD in 0.1 mM NaOH) for 10 min. Subsequently, the surface was rinsed with DI water to remove unbound residues and dried with N2. All reactions were performed in a humidity-controlled environment (RH = 10%, T = 23 °C).
The grafting process involved (i) GPTMS functionalization of the bare mica surface and (ii) CD–GPTMS grafting. For GPTMS functionalization, the glued mica surface was activated using air plasma for 3 min at 100 W under 20 Pa and a GPTMS solution (1 vol% in toluene) was added dropwise onto the activated mica surface for 30 min. Then, the mica surface was rinsed with toluene and dried with N2. For GPTMS–CD grafting, the GPTMS-functionalized surface was immersed in a CD solution (0.075 mg mL−1 α-, β-, or γ-CD in 0.1 mM NaOH) for 10 min. Subsequently, the surface was rinsed with DI water to remove unbound residues and dried with N2. All reactions were performed in a humidity-controlled environment (RH = 10%, T = 23 °C).
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