Avs 310
The AVS 310 is a vacuum deposition system designed for the controlled thin-film coating of materials. It is capable of depositing a variety of materials, including metals, dielectrics, and organic compounds, onto a substrate through the process of physical vapor deposition (PVD).
2 protocols using avs 310
Comprehensive Analytical Techniques for Compound Characterization
DNA Binding Affinity of Complexes
DNA binding constants of the complexes using calf thymus (ct) DNA
following reported methods.56 (link),57 (link) DNA binding by the
ethidium bromide (EB) displacement method and viscosity method were
also carried out (vide the
bath of 37 °C was used. The details on photocleavage experiments
are given in the
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