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Avs 310

Manufactured by Schott
Sourced in Japan

The AVS 310 is a vacuum deposition system designed for the controlled thin-film coating of materials. It is capable of depositing a variety of materials, including metals, dielectrics, and organic compounds, onto a substrate through the process of physical vapor deposition (PVD).

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2 protocols using avs 310

1

Comprehensive Analytical Techniques for Compound Characterization

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A Gallenkamp melting point apparatus (MP-D) was used to determine the melting point through an open capillary method. FTIR analysis was performed using a Bruker FT-IR Bio-Rad-Excalibur Series Mode No. FTS 300 MX spectrometer. The 1H NMR and 13C NMR spectra were recorded on a Bruker 300 MHz NMR spectrometer in deuterated DMSO and CDCl3 solutions with tetramethylsilane (TMS) as an internal reference. HPLC-MS analysis was achieved by an LC Agilent system 1200 series instrument and the elemental analyses were conducted using an LECO-183 CHNS analyzer. A UV-visible spectrophotometer (Shimadzu-1800; TCC-240, Japan), with temperature controller to maintain a required temperature of the sample (in quartz cuvette) and an automated Schott Gerate digital viscometer (Model; AVS 310) were used for DNA binding experiments.
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2

DNA Binding Affinity of Complexes

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UV–visible spectral studies were performed to measure the
DNA binding constants of the complexes using calf thymus (ct) DNA
following reported methods.56 (link),57 (link) DNA binding by the
ethidium bromide (EB) displacement method and viscosity method were
also carried out (vide the Supporting Information). A Schott Gerate AVS310 automated viscometer fitted with a thermostatic
bath of 37 °C was used. The details on photocleavage experiments
are given in the Supporting Information.
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