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Tenupol 5

Manufactured by Struers
Sourced in United States, Denmark

The TenuPol-5 is a laboratory equipment designed for the high-quality preparation of metallographic samples. It is a semi-automated twin-jet electropolisher that enables precise and consistent sample preparation.

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8 protocols using tenupol 5

1

Microstructural Characterization of Alloys

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The microstructure of both alloys was investigated using scanning electron microscope (SEM) FEI Quanta 200F (Hillsboro, OR, USA), equipped with EDAX energy-dispersive X-ray spectroscope (EDS) and EDAX electron backscatter diffraction (EBSD) camera (EDAX, Pleasanton, CA, USA), and transmission electron microscope (TEM) Jeol 2200FS (Tokyo, Japan) equipped with Gatan EDS. Samples for SEM were prepared by mechanical polishing with decreasing particle size down to 50 nm. Samples prepared for EBSD were subsequently ion-polished using Leica EM RES102 (Wetzlar, Germany) ion-beam milling system. Samples for TEM were mechanically thinned and subsequently electrochemically polished using Struers Tenupol 5 (Cleveland, OH, USA) in a solution of perchloric acid and methanol. The crystallographic texture was measured by X-ray diffractometer (XRD) PANalytical XPert MRD (Malvern, UK). CuK radiation and polycapillary in the primary beam were employed during the measurements. Pole figures from 6 reflections, ( 0002 ), 101¯0 , ( 101¯1 ), ( 1012¯ ), ( 101¯3 ), and ( 112¯0 ), were measured. Inverse pole figures were calculated using the MTEX toolbox implemented in the Matlab 2020a software [24 (link)].
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2

Cold-rolled Titanium Microstructure

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The materials used in this study are commercially pure Ti (99.999 at.%), and such a low level of impurity was found to have a negligible effect on HCP-FCC phase transition32 (link). The as-received materials show an equiaxed grain structure with the grain size ranging from 20 to 30 μm. Small bars with a dimension of 20 × 10 × 1 mm were cut from the as-received plates, and then were cold-rolled at room temperature for multiple times with a thickness reduction of 0.5 mm per pass to reach a thickness reduction of 50%.
The TEM specimens were prepared using a double-jet electrolytic polisher (Struers TenuPol-5) and a solution of 60% methanol +35% butanol +5% per chloric acid at −30 °C with an applied voltage of 30 V. TEM and high-resolution TEM observations were performed using a FEI Titan G2 60–300 Cs-corrected microscope operated at 300 kV.
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3

Preparing TEM Specimens by Electrolytic Thinning and Ion-Milling

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Cross-sectional slices with a thickness of ~100 μm were cut from the rods and ingots. These slices were ground to a final thickness of about 50 μm and small disks with a diameter of 3 mm were punched out. In the current study, both twin-jet electrolytic thinning and ion-milling were employed to prepare the TEM specimens. The results shown in the publication were all obtained from electrolytically thinned specimens. Twin-jet electrolytic thinning of the TEM specimens was performed in a Struers TenuPol-5 using a solution of 30 ml perchloric acid +175 ml 1-butanol +295 ml methanol at 248 K and a constant voltage of 20 V. After perforation, the TEM specimens were cleaned with ethanol. For ion-milling, the disks were dimpled using a Gatan dimpler grinder (Model 656) until the thickness of the centre reached a value of about 10 μm. The dimpled disks were then ion-milled in a Gatan 691 or Gatan 695 (PIPS II) precision ion polishing system with liquid nitrogen cooling. The disks were first ion-milled at 3.5 kV, 10 mA and an angle of 8 ° up to perforation, then the disks were ion-milled at 3.0 kV, 10 mA and an angle of 4 ° for 20 min. Additionally, the TEM samples were treated in a Fischione plasma cleaner (model 1020) for 10 min to remove possible amorphous layers at the surface, which might form during ion-milling. All TEM specimens were stored in high vacuum prior to TEM observation.
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4

Microstructural Characterization of Rolled Samples

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Optical microscopy (OM) analysis was performed along the rolling direction of the sample for mounting, grinding, polishing, and metallographic etching using 4% alcohol nitrate. The microstructural characterization using high-resolution electron backscattered diffraction (EBSD) was performed using an EDAX-TSL-OIM system with a step size of 100 nm. Transmission electron microscopy (TEM) analysis was performed on a JEOL 2100F at a working voltage of 200 kV, with energy dispersive X-ray spectrometers (EDS) by Oxford Instruments. To observe with TEM, thin foil specimens were prepared by wire cutting, mechanical polishing, and double-jet electropolishing (Denmark, Struers TenuPOL-5). The electropolishing solution was prepared by mixing 90% CH3COOH and 10% HClO3.
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5

Aluminum Substrate Activation and Polishing

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The aluminum substrates were activated
following a previously described methodology.32 (link) The square (1 × 1 cm) plates were polished via an electrolytic
process by using a TenuPol-5 (Struers) apparatus [5 °C, 40 V,
HClO4 (60%)]. The disklike (2.5 cm2) plates
were mechanically polished by using successively SiC paper (#600 and
#1200 grain size) and diamond particle suspensions (3 and 1 μm,
Buehler). After the polishing process, the plates were ultrasonicated
for 2 min in an ethanol/water (1:1) mixture and then dried in an argon
stream. The plates were then immersed in boiling water for 10 min
and dried again in an argon stream.
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6

Preparation of High-Purity Fe-Cr Alloy Samples

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The material used in this study was a high purity Fe-10wt%Cr alloy fabricated at École Nationale Supérieure des Mines (Saint-Etienne, France). The nominal concentrations of C, N, O, S, and other impurities were lower than 0.001 wt% according to the supplier. The chromium content of 9.86 wt% was in the typical range for conventional ODS steels, usually between 9 and 14 at.%. The samples were provided as cylindrical rods of about 1 cm in diameter. They were cut into slices of about 1 mm in thickness. These slices were then mechanically polished with SiC abrasives down to a thickness of about 100 μm. Disks of 3 mm in diameter were then punched out of these slices before being electro-polished for a few seconds using a twin-jet electropolisher (Struers Tenupol-5) with 10% perchloric acid and 90% ethanol solution at −20 °C. During electropolishing, one surface was protected so that only one surface was mirror-polished. This electropolished surface was the surface that faced the beam during ion implantation and was easily recognizable for subsequent cross-section thin foil preparation. No heat treatment was performed before ion implantation.
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7

Microstructural Analysis of Materials

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Prior to each observation, samples were subjected to rough grinding, fine grinding, polishing, cleaning and drying. Microstructural changes were examined using SEM (model: Zeiss Ultra Plus, resolution: 1.0 nm, max voltage: 15 kV, Zeiss, Oberkochen, Germany). Before TEM imaging (model: JEM-2100F, resolution: 0.23 nm, accelerating voltage: 180 kV, Nippon Electronics Co., Ltd, Tokyo, Japan), the samples were ground to 0.05–0.08 mm by fine grinding and then thinned to 0.06 mm with a diameter of 3 mm. A Struers TenuPol-5 electrolytic double spray instrument (electrolyte: 20% HNO3 +80% CH3OH, voltage: 25 V, Struers, Denmark) was used to reduce the thickness of the double spray.
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8

Cementite Nanoprecipitates Analysis via TEM

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TEM thin foils were prepared by grinding 3 mm-diameter discs to a thickness of 50 μm, followed by twin-jet electropolishing in a TenuPol-5 (from Struers). Good thinning conditions were achieved using an electrolyte consisting of 70 vol.% methanol, 20 vol.% glycerin, and 10 vol.% perchloric acid, flow rates between 15 and 20 and voltages of 30 V at −11 °C. HRTEM imaging was performed using an FEI Tecnai Supertwin F20 equipped with a field emission gun operating at 200 kV. The zone directions of cementite nanoprecipitates were analyzed using FFT methods.
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