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Lyra 3 xmu

Manufactured by TESCAN
Sourced in United States

The LYRA 3 XMU is a versatile scanning electron microscope (SEM) designed for high-resolution imaging and analysis of a wide range of materials. It features a field emission gun (FEG) electron source, providing high-quality, high-resolution images. The LYRA 3 XMU is equipped with advanced detectors, enabling comprehensive characterization of samples.

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8 protocols using lyra 3 xmu

1

Characterization of DXP-loaded Samples

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The EDX analysis of dry DXP-loaded samples was carried out using scanning electron microscope Lyra 3 XMU (Tescan, Brno, Czech Republic), operating at 10 kV, coupled with an electron backscatter diffraction detector and EDX analysis system (Quantax 200, Bruker, Billerica, MA, USA). Prior to the analysis, the samples were covered with carbon (~10 nm thickness).
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2

Microscopic Analysis of Film Surfaces

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A scanning electron microscope (LYRA3 XMU; Tescan, Warrendale, PA, USA) was used to obtain microscopic images of the surface and cross-section of the films at an accelerating voltage of 5.0 kV and magnification of 3000×.
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3

Characterization of Polyelectrolyte Multilayers

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The morphology of the obtained polyelectrolyte multilayer structures was examined by means of SEM. A scanning electron microscope Lyra 3XMU (Tescan, Brno, Czech Republic) was employed. The working voltage was 30 kV. Prior to the measurements, the samples were covered with a thin film of gold (about 30 nm).
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4

Sensor Morphology Characterization

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The morphology of the sensor was observed via focusing ion beam field emission scanning electron microscopy (Tescan, LYRA 3 XMU, Prague, Czech) and a laser confocal microscope (Carl Zeiss, LSM800, Berlin, Germany). The surface of the sensor was sputtered with a layer of gold using an ion sputtering machine (Vacuum, MSP-1S, Tokyo, Japan) before the sample was observed using an electron microscope. At the same time, the sensing area of the sensor was observed using a laser confocal microscope, whose excitation light was 488 nm.
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5

Multi-Technique Characterization of MoS2 Nanosheets

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The pristine as well as SHI irradiated nanosheets were characterized by X-ray Diffraction (XRD), Field Emission Scanning Electron Microscopy (FESEM), Raman Spectroscopy and scanning Kelvin probe microscopy (SKPM) for structural, morphological, optical and surface electronic studies respectively. XRD measurement was done in a PANalytical X’pert pro set up with CuKα radiation (1.54 Å). FESEM images were taken using Tescan Model LYRA 3 XMU. Raman spectroscopic measurements were carried out by using WiTec Model alpha 300 having 532 nm excitation. The work function of pristine and SHI irradiated MoS2 were obtained using SKPM from KP Technology, United Kingdom. In addition, Transmission Electron Microscope (TEM, JEOL 2100 F) studies were carried out on suspended MoS2 nanosheets (on TEM grids) before they were deposited on the Si-substrate.
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6

Analyzing Iron Content and Magnetite Dispersion

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To determine the iron content as well as the magnetite particles’ dispersion within the composites, the fractured surface of dry samples was covered with a thin carbon film (~10 nm). The samples were examined under a scanning electron microscope Lyra 3 XMU (Tescan), operating at 10 kV and coupled with EBSD and EDX analysis systems (Quantax 200, Bruker, Billerica, MA, USA).
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7

Leaf Surface Microscopy Protocol

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The surfaces of leaves were examined by using a Zeiss Scope.A1 microscope equipped with the AxioCam MRc 5 camera and ZEN lite 2012 software (Carl Zeiss MicroImaging GmbH, Jena, Germany). The samples preparation was done by following the next steps: peel the epidermis from the backside of the leaf, mount the sample on a glass slide in distilled water, fix with a coverslip, and observe under the microscope at 40× magnification. For scanning electron microscopy (SEM), leaves were mounted on stubs using carbon double-sided adhesive tape without any treatment. The samples were examined and photographed using LYRA3 scanning electron microscope (LYRA3 XMU, Tescan, Brno, CzechRepublic) with Low Vacuum Secondary Electron Tescan Detector (LVSTD), at 15 kV and magnification 800×.
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8

Comprehensive Material Characterization for Electromagnetic Shielding

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The crystal phase is recorded on X-ray powder diffraction (XRD, X'pert powder, Philips), while using Cu Kα1 (λ = 1.540 Å) radiation. The microstructure and morphology are determined using scanning electron microscopy (FIB-SEM, Tescan LYRA 3 XMU), and scanning transmission electron microscopy (STEM). The shape and size of the particles were determined from high-magnification transmission electron microscopy (HRTEM, FEI Tecnai G2 F30). The degree of graphitization was confirmed by Micro-Raman spectroscopy (Jobin–Yvon Horiba HR800) using argon ion laser (k = 532 nm) in the range of 800–1800 cm−1. The pore-size distribution is investigated by Brunauer–Emmett–Teller measurement (BET, ASAP 2020 Micromeritics), and the magnetic properties were carried out by vibrating sample magnetometer (VSM Lake-Shore 7404, USA) in room temperature.
The EM parameters are analyzed in the test range (2.00–18.00 GHz) by using a vector network analyzer (VNA, Agilent N5245A). According to the mass ratio of sample to paraffin of 1:5, the sample are pressed into a toroidal shape (outer diameter of 7.0 mm and inner diameter of 3.04 mm). The calculated reflection loss (RL) and simulated reflection loss (RL) are calculated by the coaxial reflection/transmission method based on the NRW method and the transmission line theory, respectively.
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