Lyra 3 xmu
The LYRA 3 XMU is a versatile scanning electron microscope (SEM) designed for high-resolution imaging and analysis of a wide range of materials. It features a field emission gun (FEG) electron source, providing high-quality, high-resolution images. The LYRA 3 XMU is equipped with advanced detectors, enabling comprehensive characterization of samples.
Lab products found in correlation
8 protocols using lyra 3 xmu
Characterization of DXP-loaded Samples
Microscopic Analysis of Film Surfaces
Characterization of Polyelectrolyte Multilayers
Sensor Morphology Characterization
Multi-Technique Characterization of MoS2 Nanosheets
Analyzing Iron Content and Magnetite Dispersion
Leaf Surface Microscopy Protocol
Comprehensive Material Characterization for Electromagnetic Shielding
The EM parameters are analyzed in the test range (2.00–18.00 GHz) by using a vector network analyzer (VNA, Agilent N5245A). According to the mass ratio of sample to paraffin of 1:5, the sample are pressed into a toroidal shape (outer diameter of 7.0 mm and inner diameter of 3.04 mm). The calculated reflection loss (RL) and simulated reflection loss (RL) are calculated by the coaxial reflection/transmission method based on the NRW method and the transmission line theory, respectively.
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