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Pilatus silicon pixel x ray detector

Manufactured by Dectris
Sourced in Switzerland

The Pilatus silicon pixel X-ray detector is a high-performance, energy-resolving X-ray detection system. It features a large active area, high readout speed, and low noise characteristics. The detector utilizes a direct conversion technology, where incident X-rays are converted directly into electrical signals, enabling efficient and accurate X-ray detection.

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3 protocols using pilatus silicon pixel x ray detector

1

Characterization of Thin Film Surfaces

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Contact angles were measured by dropping 50 μl of test solvent onto the characterized surfaces and taking a photograph from a horizontally aligned position. The precise angles were measured using ImageJ with a plugin developed and provided by the Biomedical Imaging Group of the Ecole Polytechnique Federale de Lausanne.[33 (link)] The thicknesses and surface morphologies of the prepared thin films were characterized by a Dektak profilometer (Bruker, Billerica, MA, USA) and atomic force microscope (AFM) respectively. Grazing-incident X-ray diffraction (GI-XRD) measurements were performed at the X-ray diffraction beamline 5.2 at the Synchrotron Radiation Facility Elettra in Trieste (Italy). Two-dimensional diffraction patterns were recorded with a 2 M Pilatus silicon pixel X-ray detector (DECTRIS Ltd, Baden, Switzerland). The sample inclination to the beam was changed from ω = 0.03° to ω = 0.2° to characterize the surface (5 nm depth) and bulk properties of the samples, respectively. Detailed measurement conditions and data treatment can be found in a previously published work.[34 (link)]
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2

X-ray Diffraction Analysis of Samples

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X-ray diffraction patterns were recorded at the X-ray diffraction beamline XRD1 at the Elettra Synchrotron Radiation Facility in Trieste (Italy). The X-ray beam emitted by the wiggler source on the Elettra 2 GeV electron storage ring was monochromatized by a Si(111) double crystal monochromator, focused on the sample and collimated by a double set of slits to a spot size of 50 × 50 µm2. The experimental chamber was mounted between two copper palates connected to a programmable water bath. Circulating water was used to control the cooling rate of the chambers during treatment. Analyses were performed during cooling from 80 °C to 20 °C at 1 °C min−1 and after the samples reached 20 °C. Samples were scanned vertically and horizontally using 50 µm steps. Data were collected at a photon energy of 8.856 keV (λ = 1.4 Å) using a 2 M Pilatus silicon pixel X-ray detector (DECTRIS Ltd., Baden, Switzerland). Bidimensional patterns collected with Pilatus were calibrated using lanthanum hexaboride powder (LaB6, standard reference material 660a of NIST) and integrated using the software FIT2D49 , version 12.77. The indexing of the XRD patterns obtained by the crystalline phase was performed using the program WinPlotr50 , version July 2017.
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3

Grazing-Incidence X-Ray Diffraction Protocol

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GIXRD measurements were performed at the XRD1 beamline of the ELETTRA synchrotron facility in Trieste (Italy). The X-ray beam had a wavelength of 0.7 Å and a beam size of 200 × 200 μm2. 2D-GIWAXS images were collected by using 2 M Pilatus silicon pixel X-ray detector (DECTRIS Ltd.) positioned perpendicular to the incident beam, at a distance of 260 mm from the sample. The grazing incident angle was fixed at αi = 0.5° to probe the full thickness of the film.
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