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Jem 2200fs tem

Manufactured by JEOL
Sourced in Japan

The JEM-2200FS TEM is a transmission electron microscope (TEM) designed and manufactured by JEOL. It is capable of high-resolution imaging and analysis of materials at the nanoscale level. The JEM-2200FS TEM provides advanced features and capabilities for researchers and scientists working in various fields, such as materials science, nanotechnology, and life sciences.

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20 protocols using jem 2200fs tem

1

Cryo-EM Imaging of Virus Particles

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Virus particles were imaged in a JEOL JEM-2200FS TEM operating at 200 keV, using low-dose conditions controlled by SerialEM (v3.5.0_beta) [32 (link)] with the use of an in-column Omega Energy Filter, operating at a slit width of 35 eV. Micrographs were recorded using a Direct Electron DE-20 camera (Direct Electron, LP, San Diego, CA, USA), cooled to −40 °C. Movie correction was performed on whole frames using the Direct Electron software package, v2.7.1 [33 (link)]. Micrographs used for single particle analysis were recorded on the DE-20 using a capture rate of 25 frames per second for a total exposure ranging from 75 to 300 frames (~35 e-2 total dose recorded at the DE-20 sensor). Cryo-EM images were acquired between 4000 and 20,000× nominal magnifications (14.7–2.61 Å/pixel, respectively). The objective lens defocus settings for single particle images ranged from 15 to 25 µm underfocus.
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2

TEM Imaging of MoO3/HOPG Samples

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TEM imaging was performed at the National
Center for High Resolution Electron Microscopy (nCHREM) at Lund University.
The MoO3/HOPG samples were a few weeks old and subjected
to exposure to an inert (Ar) atmosphere for transportation and laboratory
air (typically below 5 min) to prepare TEM-suitable specimens. The
MoO3/HOPG flakes were peeled off and mounted on a TEM grid
(lacey formvar-carbon film on 200 copper mesh, Ted Pella, Redding,
USA). The imaging was performed in a JEOL JEM-2200FS TEM at 200 keV
in a low-dose mode (total dose < 200 e Å–2), thus minimizing possible beam damage. The images were recorded
on an F416.0 camera (TVIPS), using Serial EM software.47 (link)
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3

JEOL JEM-2200FS TEM Imaging Protocol

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Conventional
STEM imaging was performed using a JEOL JEM-2200FS
TEM equipped with a field emission gun (FEG) at 200 kV, and an in-column
Omega (Ω) filter. STEM mode imaging was performed using a HAADF
detector and a dwelling time of 13 μs.
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4

Characterization of MXene Nanofilms

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SEM images were taken with a field‐emission SEM (ZEISS) at an acceleration voltage of 8 kV. The morphologies of MXene nanoflakes and cross‐sectional sample film were verified by JEOL JEM‐2200FS TEM. The sample films were cut by an FIB to provide cross‐sections for SEM and TEM characterization, performed on an FEI Helios NanoLab 600i system. The thickness (t) of MXene (/CNT) film was obtained by averaging thickness values from cross‐sectional SEM images cut by FIB at 3–5 different positions. AFM images of Ti3C2Tx flakes on Si substrate were performed using an AFM Dimension Icon scanning probe microscope.
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5

Transmission Electron Microscopy Imaging

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Overview bright-field (BF) TEM images were acquired with a JEOL JEM-1011 instrument equipped with a thermionic W source operating at 100 kV. Energy-filtered TEM (EFTEM) and high-resolution TEM (HRTEM) images were obtained using an image-Cs-corrected JEOL JEM-2200FS TEM with a Schottky emitter, equipped with an in-column image filter (Ω-type) and operating at 200 kV. The elemental maps were obtained by using the three-windows method at the O K, Fe K and Cu L23 core-loss edges. Overview high-angle annular dark field- scanning TEM (HAADF-STEM) images were acquired on a FEI Tecnai G2 F20 TWIN TMP TEM.
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6

TEM-EDX Analysis of Nanomaterials

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STEM-EDX was conducted at 200 kV with the Cs-corrected JEM 2200-FS TEM (JEOL, Tokyo, Japan) and a bright-field detector. Holey carbon-coated TEM grids of 200 mesh (Electron Microscopy Sciences, Hatfield, PA, USA) were used. In total, 50 µL of sample was put on the grid or the grid was dipped into the product and air dried before STEM analysis. Products 1 and 12 were treated three times for 15 seconds with the 1020 argon plasma cleaner (Fischione Instruments, Export, PA, USA) prior to STEM analysis, in order to reduce the carbon content from these gels. Chemical information was obtained via the combination of STEM with EDX.
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7

High-Resolution TEM Imaging of Nanoparticles

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High-resolution transmission electron
microscopy (HRTEM) was performed on a JEOL JEM-2200FS TEM with Cs
corrector and a JEOL JEM-F200 TEM, both operating at 200 kV. Samples
were made by drop-cast suspensions on the grids. The TEM grids used
were holey carbon-Cu (C200-CU) with 50 μm hole size (200 mesh).
NC sizes were determined by measuring 200 particles using the “polygon
selection” tool of ImageJ, with measurements set to “fit
ellipse”.
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8

Negative Stain TEM Specimen Preparation

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Samples for negative stain transmission electron microscopy were placed on 200 mesh formvar-carbonated copper grids with (Plano, Quantifoil #S162). Grids were glow-discharged for 30 s (Baltec, MED010) prior to sample addition. The protein solution was removed after 3 min incubation time by filter-paper and the grids washed 3 times with ddH2O (grid on top of each drop) to remove buffer salts, then followed by staining with 2% uranyl acetate for 60 s and finally removing the stain slowly with a wet-filter paper and rapid air drying. To prepare grids with microtubules for TEM, all steps were carried at out at 37 °C and with pre-warmed solutions. All specimens were analyzed at 200 kV using a JEOL JEM-2200FS TEM.
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9

Negative-Stain Electron Microscopy of Proteins

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For negative-stain EM, 4 μl of protein sample was applied onto a glow-discharged copper grid coated with a continuous carbon layer (PLANO). The protein sample was incubated for 1 min before blotting away the excess sample with a filter paper. The sample-coated side of the grid was then washed by dipping it into three individual 20-μl drops of protein buffer with a blotting step in between. Last, the sample was negatively stained with 2% uranylformiate for 30 s, the excess sample was blotted away, and the grid was air-dried. Negative-stained EM girds were imaged using a JEOL JEM-2200FS TEM operating at 200 kV.
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10

Nano-Emulsion Morphology Analysis by TEM

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Transmission electron microscopy (TEM) was used to investigate the morphology of the dispersed droplets in the NE. APC-SNEDDS were diluted 10–100 times with Milli-Q water and investigated using a JEM-2200FS TEM (JEOL, Tokyo, Japan) operated at an acceleration voltage at 200 kV. The TEM samples were prepared as follows: 10 µL of the NE was carefully dropped on a discharged 200 mesh copper grid coated with formvar and carbon (FCF-200 mesh Cu, Electron Microscopy Sciences, Hatfield, PA, USA). The excess solution was removed by filter paper and left for air-drying at ambient temperature for 5 min. The sample was subsequently stained with a 1% w/v phosphotungstic solution. After 2 min, the excess solution was removed using filter paper and the grid was then subjected into the TEM.
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